会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明申请
    • METHOD FOR MAKING A PATTERNED PERPENDICULAR MAGNETIC RECORDING DISK
    • 用于制作图案的全磁记录盘的方法
    • US20100326819A1
    • 2010-12-30
    • US12490480
    • 2009-06-24
    • Jeffrey S. LilleNeil Leslie Robertson
    • Jeffrey S. LilleNeil Leslie Robertson
    • B44C1/22
    • G11B5/82B82Y10/00G11B5/746G11B5/855
    • A method for making a patterned-media magnetic recording disk uses nano-imprint lithography (NIL) for patterning a resist layer over the magnetic recording layer. A hard mask layer is located above the magnetic recording layer and an etch stop layer is located above the hard mask layer and below the resist layer. Residual resist material in the recesses of the patterned resist layer is removed by reactive ion etching (RIE) to expose the underlying etch stop layer. The etch stop material in the recesses is then removed by RIE to expose regions of the hard mask layer. A reactive ion milling (RIM) process removes the exposed hard mask material. The RIM process causes no undercutting of the unexposed hard mask material, which allows the very small critical dimensions of the patterned-media disk to be reliably achieved when ion milling is subsequently performed through the hard mask that has been patterned by the RIM process.
    • 用于制造图案介质磁记录盘的方法使用纳米压印光刻(NIL)来在磁记录层上图形化抗蚀剂层。 硬掩模层位于磁记录层上方,并且蚀刻停止层位于硬掩模层之上和抗蚀剂层下方。 通过反应离子蚀刻(RIE)去除图案化抗蚀剂层的凹陷中的残留抗蚀剂材料以暴露下面的蚀刻停止层。 然后通过RIE去除凹槽中的蚀刻停止材料以暴露硬掩模层的区域。 反应离子研磨(RIM)工艺去除了暴露的硬掩模材料。 RIM工艺不会导致未曝光的硬掩模材料的底切,这允许当通过已经通过RIM工艺图案化的硬掩模进行离子铣削时,可靠地实现图案化介质盘的非常小的临界尺寸。