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1. 发明授权

US07494753B2 Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation 有权
标题翻译：用于改进临界尺寸计算中使用的抗蚀剂模型校准的方法，程序产品和装置
公开(公告)号：US07494753B2
公开(公告)日：2009-02-24
申请号：US11339827
申请日：2006-01-26
申请人： Jang Fung Chen , Gabriel Berger , Tamer Coskun , Sangbong Park , Ting Chen
发明人： Jang Fung Chen , Gabriel Berger , Tamer Coskun , Sangbong Park , Ting Chen
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70625 , G03F1/36 , G03F1/68 , G03F7/705 , G03F7/70516
摘要： Improved calibration of a resist model used in critical dimension (CD) calculation is disclosed. A dose function is obtained based on optical tool to be used form the resist on a wafer. The dose function indicates the amount of energy in a resist. The dose function is convolved with a convolution kernel to obtain a modified dose function. The convolution kernel has variable diffusion lengths in different directions. The convolution kernel may include multiple Gaussian kernels each having variable diffusion lengths in different directions. The modified dose function is converted into a CD value which is compared with a target value. If necessary, the diffusion lengths of the Gaussian kernels are adjusted based on the comparison result.
摘要翻译：公开了在关键尺寸（CD）计算中使用的抗蚀剂模型的改进的校准。基于晶片上的抗蚀剂使用的光学工具获得剂量函数。剂量函数表示抗蚀剂中的能量。剂量函数与卷积核卷积以获得修改的剂量函数。卷积核在不同方向具有可变扩散长度。卷积核可以包括在不同方向上具有可变扩散长度的多个高斯核。将修改的剂量函数转换为与目标值进行比较的CD值。如果需要，基于比较结果调整高斯核的扩散长度。

2. 发明授权

US08120753B2 Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process 有权
标题翻译：用于产生校准瞳孔核的方法，程序产品和装置及其在光刻仿真过程中的使用方法
公开(公告)号：US08120753B2
公开(公告)日：2012-02-21
申请号：US11979839
申请日：2007-11-08
申请人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
发明人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
IPC分类号： G03B27/32 , G03B27/54
CPC分类号： G03F7/70216 , G03F7/705 , G03F7/70675
摘要： A method of generating a model for simulating the imaging performance of an optical imaging system having a pupil. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; and defining a model equation representing the imaging performance of the optical imaging system and the process, where the model equation including a calibrated pupil kernel. The calibrated pupil kernel representing a linear model of the pupil performance.
摘要翻译：一种生成用于模拟具有瞳孔的光学成像系统的成像性能的模型的方法。该方法包括以下步骤：定义光学成像系统和由光学成像系统利用的过程; 并且定义表示光学成像系统和过程的成像性能的模型方程，其中模型方程式包括校准的瞳孔核心。校准瞳孔代表瞳孔表现的线性模型。

3. 发明申请

US20080204690A1 Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process 有权
标题翻译：用于产生校准瞳孔核的方法，程序产品和装置及其在光刻仿真过程中的使用方法
公开(公告)号：US20080204690A1
公开(公告)日：2008-08-28
申请号：US11979839
申请日：2007-11-08
申请人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
发明人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
IPC分类号： G03B27/54
CPC分类号： G03F7/70216 , G03F7/705 , G03F7/70675
摘要： A method of generating a model for simulating the imaging performance of an optical imaging system having a pupil. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; and defining a model equation representing the imaging performance of the optical imaging system and the process, where the model equation including a calibrated pupil kernel. The calibrated pupil kernel representing a linear model of the pupil performance.
摘要翻译：一种生成用于模拟具有瞳孔的光学成像系统的成像性能的模型的方法。该方法包括以下步骤：定义光学成像系统和由光学成像系统利用的过程; 并且定义表示光学成像系统和过程的成像性能的模型方程，其中模型方程式包括校准的瞳孔核心。校准瞳孔代表瞳孔表现的线性模型。

4. 发明申请

US20060208205A1 Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation 有权
公开(公告)号：US20060208205A1
公开(公告)日：2006-09-21
申请号：US11339827
申请日：2006-01-26
申请人： Jang Chen , Gabriel Berger , Tamer Coskun , Sangbong Park , Ting Chen
发明人： Jang Chen , Gabriel Berger , Tamer Coskun , Sangbong Park , Ting Chen
IPC分类号： H01J37/08 , G21K5/10 , G03B27/52 , H01L27/00 , G01N21/00
CPC分类号： G03F7/70625 , G03F1/36 , G03F1/68 , G03F7/705 , G03F7/70516
摘要： Improved calibration of a resist model used in critical dimension (CD) calculation is disclosed. A dose function is obtained based on optical tool to be used form the resist on a wafer. The dose function indicates the amount of energy in a resist. The dose function is convolved with a convolution kernel to obtain a modified dose function. The convolution kernel has variable diffusion lengths in different directions. The convolution kernel may include multiple Gaussian kernels each having variable diffusion lengths in different directions. The modified dose function is converted into a CD value which is compared with a target value. If necessary, the diffusion lengths of the Gaussian kernels are adjusted based on the comparison result.

5. 发明申请

US20100135569A1 Source Mask Optimization For Microcircuit design 有权
标题翻译：用于微电路设计的源掩码优化
公开(公告)号：US20100135569A1
公开(公告)日：2010-06-03
申请号：US12503024
申请日：2009-07-14
申请人： Gabriel Berger
发明人： Gabriel Berger
IPC分类号： G06K9/62
CPC分类号： G03F7/705 , G03F1/36 , G03F7/70125 , G03F7/70441
摘要： A method and apparatus for generating a source illuminator profile and a mask design, subsequently optimizing the source illuminator profile and mask design based upon a set of target intensity profiles. In various implementations, the Lagrange method of optimization is employed to optimize the radiation source, wherein an optimum intensity for each pixel of the source is determined. Subsequently, a continuous tone mask is generated based upon the diffraction orders of the optimized source. With various implementations, the target intensity profile is generated by deriving a set of band limited target frequencies corresponding to the optical lithographic system. Subsequently, homotopy methods may be employed to optimize the source illuminator profile and the continuous tone mask based upon the set of band limited target frequencies.
摘要翻译：一种用于产生源照明器轮廓和掩模设计的方法和装置，随后基于一组目标强度分布优化源照明器轮廓和掩模设计。在各种实施方案中，使用拉格朗日优化方法来优化辐射源，其中确定源的每个像素的最佳强度。随后，基于优化源的衍射级产生连续色调掩模。通过各种实现，通过导出对应于光学平版印刷系统的一组频带限制目标频率来产生目标强度分布。随后，可以采用同伦法来基于频带限制目标频率的集合来优化源照明器简档和连续色调掩模。

6. 发明授权

US08151223B2 Source mask optimization for microcircuit design 有权
标题翻译：微电路设计的源掩码优化
公开(公告)号：US08151223B2
公开(公告)日：2012-04-03
申请号：US12503024
申请日：2009-07-14
申请人： Gabriel Berger
发明人： Gabriel Berger
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F1/36 , G03F7/70125 , G03F7/70441
摘要： A method and apparatus for generating a source illuminator profile and a mask design, subsequently optimizing the source illuminator profile and mask design based upon a set of target intensity profiles. In various implementations, the Lagrange method of optimization is employed to optimize the radiation source, wherein an optimum intensity for each pixel of the source is determined. Subsequently, a continuous tone mask is generated based upon the diffraction orders of the optimized source. With various implementations, the target intensity profile is generated by deriving a set of band limited target frequencies corresponding to the optical lithographic system. Subsequently, homotopy methods may be employed to optimize the source illuminator profile and the continuous tone mask based upon the set of band limited target frequencies.
摘要翻译：一种用于产生源照明器轮廓和掩模设计的方法和装置，随后基于一组目标强度分布优化源照明器轮廓和掩模设计。在各种实施方案中，使用拉格朗日优化方法来优化辐射源，其中确定源的每个像素的最佳强度。随后，基于优化源的衍射级产生连续色调掩模。通过各种实现，通过导出对应于光学平版印刷系统的一组频带限制目标频率来产生目标强度分布。随后，可以采用同伦法来基于频带限制目标频率的集合来优化源照明器简档和连续色调掩模。

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