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1. 发明申请

US20110011007A1 POLISHING MATERIAL HAVING POLISHING PARTICLES AND METHOD FOR MAKING THE SAME 有权
标题翻译：具有抛光颗粒的抛光材料及其制备方法
公开(公告)号：US20110011007A1
公开(公告)日：2011-01-20
申请号：US12889553
申请日：2010-09-24
申请人： Chung-Chih FENG , I-Peng YAO , Lyang-Gung WANG , Yung-Chang HUNG , Chao-Yuan TSAI
发明人： Chung-Chih FENG , I-Peng YAO , Lyang-Gung WANG , Yung-Chang HUNG , Chao-Yuan TSAI
IPC分类号： B24D11/00
CPC分类号： B24B37/26 , B24D11/001
摘要： The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The polymer elastic body covers the base material and the polishing particles. Whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid the scratch of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.
摘要翻译：本发明涉及具有抛光颗粒的抛光材料及其制造方法。具有抛光颗粒的抛光材料包括基材，多个抛光颗粒和聚合物弹性体。基材具有用于限定多个网格空间的多根纤维。抛光颗粒分布在网格空间中。聚合物弹性体覆盖基材和抛光颗粒。由此，抛光粒子在研磨工序中均匀地分布在研磨工件的表面上。此外，基材防止抛光颗粒接触抛光工件，以避免抛光工件的划痕。此外，基材提供了用于扫掠小磨碎片的效果。

2. 发明申请

US20110177305A1 POLISHING PAD AND METHOD FOR MAKING THE SAME 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：US20110177305A1
公开(公告)日：2011-07-21
申请号：US12760062
申请日：2010-04-14
申请人： Chung-Chih FENG , Chun-Ta WANG , Kun-Cheng TSAI , Yung-Chang HUNG , I-Peng YAO , Kao-Lung YANG , Chih-Yi LIN
发明人： Chung-Chih FENG , Chun-Ta WANG , Kun-Cheng TSAI , Yung-Chang HUNG , I-Peng YAO , Kao-Lung YANG , Chih-Yi LIN
IPC分类号： B32B27/02 , B32B27/04 , B32B27/40 , B32B27/30
CPC分类号： D04H1/4334 , B24B37/24 , B24D11/001 , D04H1/435 , D04H1/488 , Y10T428/2481 , Y10T442/2008 , Y10T442/2861 , Y10T442/2885 , Y10T442/2918
摘要： The present invention relates to a polishing pad and method for making the same. The polishing pad includes a fabric substrate and a second high polymeric elastomer resin. The fabric substrate is formed by a plurality of cross composite fibers. Each composite fiber has a plurality of fine fibers and a first high polymeric elastomer resin, and the first high polymeric elastomer resin discontinuously encloses the fine fibers. The second high polymeric elastomer resin encloses the composite fibers, and the first high polymeric elastomer resin and the second high polymeric elastomer resin have the same functional group. By adjusting the degree of saturation of the first high polymeric elastomer resin and the second high polymeric elastomer resin, the fine fibers will have smaller size and will not be easily entangled. Therefore, a workpiece to be polished will not be scratched and will have excellent surface quality.
摘要翻译：抛光垫及其制造方法技术领域本发明涉及抛光垫及其制造方法。抛光垫包括织物基底和第二高分子弹性体树脂。织物基材由多个交叉复合纤维形成。各复合纤维具有多根细纤维和第一高分子弹性体树脂，第一高分子弹性体树脂不连续地包围细纤维。第二高弹性体弹性体树脂封装复合纤维，第一高聚物弹性体树脂和第二高聚物弹性体树脂具有相同的官能团。通过调整第一高分子弹性体树脂和第二高分子弹性体树脂的饱和度，细纤维的尺寸变小，不容易缠结。因此，被抛光的工件不会被划伤并具有优异的表面质量。

3. 发明申请

US20080220702A1 POLISHING PAD HAVING SURFACE TEXTURE 审中-公开
标题翻译：具有表面纹理的抛光垫
公开(公告)号：US20080220702A1
公开(公告)日：2008-09-11
申请号：US12124594
申请日：2008-05-21
申请人： Chung-Chih FENG , I-Peng YAO , Chen-Hsiang CHAO , Kun-Cheng SUNG
发明人： Chung-Chih FENG , I-Peng YAO , Chen-Hsiang CHAO , Kun-Cheng SUNG
IPC分类号： B24D11/00
CPC分类号： B24B37/26
摘要： The present invention relates to a polishing pad having a surface texture. The surface texture is disposed on the polishing surface of the polishing pad. The surface texture comprises at least one first groove, at least one second groove, and a plurality of holes. The second groove extends from a central portion of the polishing pad to the edge of the polishing pad, and the first groove(s) is intersected with the second groove(s) to form a plurality of intersection points. The holes are disposed at the intersection points, and the depth of the holes is larger than that of the first groove. Thus, the second groove(s) enables impurities suspended in the polishing slurry to be quickly removed from the polishing pad, and the holes can store the polishing slurry to delay the polishing particles in the polishing slurry from departing from the polishing pad.
摘要翻译：本发明涉及具有表面纹理的抛光垫。表面纹理设置在抛光垫的抛光表面上。表面纹理包括至少一个第一凹槽，至少一个第二凹槽和多个孔。第二凹槽从抛光垫的中心部分延伸到抛光垫的边缘，并且第一凹槽与第二凹槽相交以形成多个交点。孔设置在交点处，孔的深度大于第一槽的深度。因此，第二凹槽使得悬浮在抛光浆料中的杂质能够快速地从抛光垫移除，并且孔可以存储抛光浆料以延迟抛光浆料中的抛光颗粒从抛光垫离开。

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