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1. 发明授权

US09235141B2 Inspection apparatus and method for measuring a property of a substrate 有权
标题翻译：用于测量基板的性质的检查装置和方法
公开(公告)号：US09235141B2
公开(公告)日：2016-01-12
申请号：US13186895
申请日：2011-07-20
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Andreas Fuchs , Martyn John Coogans , Hendrik Jan Hidde Smilde
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Andreas Fuchs , Martyn John Coogans , Hendrik Jan Hidde Smilde
IPC分类号： G03F7/20 , G01N21/95 , G01N21/956 , G03F9/00 , G01N21/47
CPC分类号： G03F7/70633 , G01B2210/56 , G01N21/4788 , G01N21/9501 , G01N21/95607 , G03F7/70616 , G03F9/70
摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.
摘要翻译：检查装置测量包括周期性结构的基板的性质。照明系统提供具有包括多个照明部分的照明轮廓的辐射束。辐射投影仪将辐射束投影到基板上。检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。处理器根据检测到的辐射来确定衬底的性质。多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

2. 发明授权

US08786825B2 Apparatus and method of measuring a property of a substrate 有权
标题翻译：测量基材性质的装置和方法
公开(公告)号：US08786825B2
公开(公告)日：2014-07-22
申请号：US12936327
申请日：2009-04-20
申请人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans
发明人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
摘要： The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.
摘要翻译：本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。特别地，正和负的第一衍射级被分离或发散，被检测并且测量它们的强度以确定衬底上的暴露层的覆盖层（或其它性质）。

3. 发明授权

US08724087B2 Inspection apparatus for lithography 有权
标题翻译：光刻检验装置
公开(公告)号：US08724087B2
公开(公告)日：2014-05-13
申请号：US12933481
申请日：2009-04-08
申请人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
发明人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
IPC分类号： G03B27/54
CPC分类号： G03F7/70616 , G01N21/47 , G01N21/9501
摘要： A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target (30) on the surface of the substrate (W) and to produce a measurement signal representative of the spectrum. The apparatus includes a beam shaper (51, 53) interposed in the radiation path between the radiation source and the detector, the beam shaper being configured to adjust the cross section of the beam dependent on the shape and/or size of the target.
摘要翻译：配置成测量衬底性质的散射仪包括被配置为提供辐射束的辐射源; 以及检测器，其被配置为检测从所述基板（W）的表面上的目标（30）反射的所述辐射束的光谱，并产生表示所述光谱的测量信号。该装置包括插入在辐射源和检测器之间的辐射路径中的光束整形器（51,53），光束整形器被配置为根据目标的形状和/或尺寸来调节光束的横截面。

4. 发明申请

US20110102753A1 Apparatus and Method of Measuring a Property of a Substrate 有权
标题翻译：测量基板特性的装置和方法
公开(公告)号：US20110102753A1
公开(公告)日：2011-05-05
申请号：US12936327
申请日：2009-04-20
申请人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans
发明人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans
IPC分类号： G03B27/54 , G01J3/28 , G01N21/47 , G03F7/20 , G03B27/52
CPC分类号： G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
摘要： The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.
摘要翻译：本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。特别地，正和负的第一衍射级被分离或发散，被检测并且测量它们的强度以确定衬底上的暴露层的覆盖层（或其它性质）。

5. 发明授权

US08908147B2 Method and apparatus for determining an overlay error 有权
标题翻译：用于确定覆盖误差的方法和装置
公开(公告)号：US08908147B2
公开(公告)日：2014-12-09
申请号：US13181932
申请日：2011-07-13
申请人： Arie Jeffrey Den Boef , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans , Kaustuve Bhattacharyya , Stephen Peter Morgan , Michael Kubis
发明人： Arie Jeffrey Den Boef , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans , Kaustuve Bhattacharyya , Stephen Peter Morgan , Michael Kubis
IPC分类号： G03F7/20 , A01H1/06 , G03B27/52 , G03B27/53 , A01G1/00 , C12N15/82
CPC分类号： A01H1/06 , A01G22/00 , C12N15/8201 , G03B27/52 , G03B27/53 , G03F7/705 , G03F7/70633
摘要： A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n′), p(n″) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.
摘要翻译：确定重叠错误的方法。测量具有过程引起的不对称性的覆盖目标。构建目标模型。修改模型，例如通过移动结构之一来补偿不对称性。使用修改的模型计算不对称引起的覆盖误差。通过从测量的重叠错误中减去不对称引起的覆盖误差来确定生产目标中的重叠错误。在一个示例中，通过改变不对称p（n'），p（n“）来修改模型，并且针对多个散射仪测量配方重复计算不对称引起的重叠误差，并且确定在生产目标使用计算的不对称引起的重叠误差来选择用于测量生产目标的最佳散射仪测量配方。

6. 发明申请

US20110255066A1 Apparatus and Method for Inspecting a Substrate 有权
标题翻译：用于检查基板的装置和方法
公开(公告)号：US20110255066A1
公开(公告)日：2011-10-20
申请号：US12996211
申请日：2009-06-04
申请人： Andreas Fuchs , Maurits Van Der Schaar
发明人： Andreas Fuchs , Maurits Van Der Schaar
IPC分类号： G03B27/74 , G03B27/32 , G01B11/14
CPC分类号： G03F7/70633
摘要： An apparatus measures properties, such as overlay error, of a substrate divided into a plurality of fields. The apparatus includes a radiation source configured to direct radiation onto a first target of each field of the substrate. Each first target (T4G) has at least a first grating and a second grating having respective predetermined offsets, the predetermined offset (+d) of the first grating being in a direction opposite the predetermined offset (−d) of the second grating. A detector is configured to detect the radiation reflected from each first target and to obtain an asymmetry value for each first target from the detected radiation. Further, a module is configured to determine an overlay value for each first target based on at least the obtained asymmetry value and the predetermined offsets and determine a polynomial fit across a plurality of first targets of a corresponding plurality of fields of the substrate for a relationship between the obtained asymmetry value and determined overlay value of each first target.
摘要翻译：一种装置测量分成多个场的衬底的性质，例如覆盖误差。该装置包括被配置为将辐射引导到衬底的每个场的第一靶上的辐射源。每个第一目标（T4G）具有至少第一光栅和具有相应预定偏移的第二光栅，第一光栅的预定偏移（+ d）在与第二光栅的预定偏移（-d）相反的方向上。检测器被配置为检测从每个第一目标反射的辐射，并且从检测到的辐射获得每个第一目标的不对称值。此外，模块被配置为基于至少所获得的不对称值和预定偏移来确定每个第一目标的覆盖值，并且确定跨越衬底的相应多个场的多个第一目标的多项式拟合，以获得关系在获得的不对称值和确定的每个第一目标的覆盖值之间。

7. 发明申请

US20110141444A1 Inspection Apparatus for Lithography 有权
标题翻译：光刻检验仪
公开(公告)号：US20110141444A1
公开(公告)日：2011-06-16
申请号：US12933481
申请日：2009-04-08
申请人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
发明人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
IPC分类号： G03B27/54 , G01N21/55
CPC分类号： G03F7/70616 , G01N21/47 , G01N21/9501
摘要： A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target (30) on the surface of the substrate (W) and to produce a measurement signal representative of the spectrum. The apparatus includes a beam shaper (51, 53) interposed in the radiation path between the radiation source and the detector, the beam shaper being configured to adjust the cross section of the beam dependent on the shape and/or size of the target.
摘要翻译：配置成测量衬底性质的散射仪包括被配置为提供辐射束的辐射源; 以及检测器，其被配置为检测从所述基板（W）的表面上的目标（30）反射的所述辐射束的光谱，并产生表示所述光谱的测量信号。该装置包括插入在辐射源和检测器之间的辐射路径中的光束整形器（51,53），光束整形器被配置为根据目标的形状和/或尺寸来调节光束的横截面。

8. 发明授权

US08749786B2 Inspection method and apparatus, and corresponding lithographic apparatus 有权
标题翻译：检验方法和装置，以及相应的光刻设备
公开(公告)号：US08749786B2
公开(公告)日：2014-06-10
申请号：US12902341
申请日：2010-10-12
申请人： Andreas Fuchs , Maurits Van Der Schaar , Scott Anderson Middlebrooks , Panagiotis Pieter Bintevinos
发明人： Andreas Fuchs , Maurits Van Der Schaar , Scott Anderson Middlebrooks , Panagiotis Pieter Bintevinos
IPC分类号： G01B11/00
CPC分类号： G03F7/70633 , G01N21/956
摘要： A method and associated apparatus determine an overlay error on a substrate. A beam is projected onto three or more targets. Each target includes first and second overlapping patterns with predetermined overlay offsets on the substrate. The asymmetry of the radiation reflected from each target on the substrate is measured. The overlay error not resultant from the predetermined overlay offsets is determined. The function that enables calculation of overlay from asymmetry for other points on the wafer is determined by limiting the effect of linearity error when determining the overlay error from the function.
摘要翻译：方法和相关设备确定衬底上的覆盖误差。光束投影到三个或更多个目标上。每个目标包括在衬底上具有预定覆盖偏移的第一和第二重叠图案。测量从基板上的每个目标反射的辐射的不对称性。确定不是从预定的覆盖偏移产生的覆盖误差。通过限制从功能确定覆盖误差时线性误差的影响，可以确定能够计算晶片上其他点不对称的叠加的功能。

9. 发明授权

US08665417B2 Apparatus and method for inspecting a substrate 有权
标题翻译：用于检查基板的装置和方法
公开(公告)号：US08665417B2
公开(公告)日：2014-03-04
申请号：US12996211
申请日：2009-06-04
申请人： Andreas Fuchs , Maurits Van Der Schaar
发明人： Andreas Fuchs , Maurits Van Der Schaar
IPC分类号： G03B27/42 , G03B27/52 , G03B27/32 , G03B27/54 , G03B27/58
CPC分类号： G03F7/70633
摘要： An apparatus measures properties, such as overlay error, of a substrate divided into a plurality of fields. The apparatus includes a radiation source configured to direct radiation onto a first target of each field of the substrate. Each first target (T4G) has at least a first grating and a second grating having respective predetermined offsets, the predetermined offset (+d) of the first grating being in a direction opposite the predetermined offset (−d) of the second grating. A detector is configured to detect the radiation reflected from each first target and to obtain an asymmetry value for each first target from the detected radiation. Further, a module is configured to determine an overlay value for each first target based on at least the obtained asymmetry value and the predetermined offsets and determine a polynomial fit across a plurality of first targets of a corresponding plurality of fields of the substrate for a relationship between the obtained asymmetry value and determined overlay value of each first target.
摘要翻译：一种装置测量分成多个场的衬底的性质，例如覆盖误差。该装置包括被配置为将辐射引导到衬底的每个场的第一靶上的辐射源。每个第一目标（T4G）具有至少第一光栅和具有相应预定偏移的第二光栅，第一光栅的预定偏移（+ d）在与第二光栅的预定偏移（-d）相反的方向上。检测器被配置为检测从每个第一目标反射的辐射，并且从检测到的辐射获得每个第一目标的不对称值。此外，模块被配置为基于至少所获得的不对称值和预定偏移量来确定每个第一目标的覆盖值，并且确定跨越衬底的相应多个场的多个第一目标的多项式拟合，以获得关系在获得的不对称值和确定的每个第一目标的覆盖值之间。

10. 发明授权

US08248579B2 Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patterns 有权
标题翻译：平版印刷设备，装置制造方法和用于校正重叠图案之间的重叠误差的装置
公开(公告)号：US08248579B2
公开(公告)日：2012-08-21
申请号：US11948801
申请日：2007-11-30
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
IPC分类号： G03B27/68
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
摘要翻译：光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真。

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