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    • 3. 发明授权
    • Non-volatile memory and fabricating method thereof
    • 非易失性存储器及其制造方法
    • US08587036B2
    • 2013-11-19
    • US12333315
    • 2008-12-12
    • Shih-Chen WangWen-Hao Ching
    • Shih-Chen WangWen-Hao Ching
    • H01L29/788
    • H01L27/11558H01L27/11517H01L27/11519
    • A non-volatile memory is formed on a substrate. The non-volatile memory includes an isolation structure, a floating gate, and a gate dielectric layer. The isolation structure is disposed in the substrate to define an active area. The floating gate is disposed on the substrate and crosses over the active area. The gate dielectric layer is disposed between the floating gate and the substrate. The floating gate includes a first region and a second region. An energy band of the second region is lower than an energy band of the first region, so that charges stored in the floating gate are away from an overlap region of the floating gate and the gate dielectric layer.
    • 在基板上形成非易失性存储器。 非易失性存储器包括隔离结构,浮动栅极和栅极电介质层。 隔离结构设置在基板中以限定有源区域。 浮动栅极设置在基板上并且跨过有效区域。 栅极电介质层设置在浮置栅极和衬底之间。 浮动栅极包括第一区域和第二区域。 第二区域的能带低于第一区域的能带,使得存储在浮置栅极中的电荷远离浮置栅极和栅极电介质层的重叠区域。
    • 4. 发明授权
    • Non-volatile memory unit cell with improved sensing margin and reliability
    • 非易失性存储单元,具有改进的感测裕度和可靠性
    • US08456916B2
    • 2013-06-04
    • US13541755
    • 2012-07-04
    • Hsin-Ming ChenShih-Chen WangWen-Hao ChingYen-Hsin LaiHau-Yan LuChing-Sung Yang
    • Hsin-Ming ChenShih-Chen WangWen-Hao ChingYen-Hsin LaiHau-Yan LuChing-Sung Yang
    • G11C11/34
    • H01L27/088G11C16/0458G11C16/28G11C16/3418
    • An only-one-polysilicon layer non-volatile memory unit cell includes a first P-type transistor, a second P-type transistor, a N-type transistor pair, a first and second coupling capacitors is provided. The N-type transistor pair has a third transistor and a fourth transistor that are connected. The third transistor and the fourth transistor have a first floating polysilicon gate and a second floating polysilicon gate to serve as charge storage mediums, respectively. One end of the second coupling capacitor is connected to the gate of the second transistor and is coupled to the second floating polysilicon gate, the other end of the second coupling capacitor receives a second control voltage. One end of the second coupling capacitor is connected to the gate of the second transistor and is coupled to the second floating polysilicon gate, the other end of the second coupling capacitor receives a second control voltage.
    • 唯一一多晶硅层非易失性存储单元包括第一P型晶体管,第二P型晶体管,N型晶体管对,第一和第二耦合电容器。 N型晶体管对具有连接的第三晶体管和第四晶体管。 第三晶体管和第四晶体管分别具有第一浮置多晶硅栅极和第二浮置多晶硅栅极,用作电荷存储介质。 第二耦合电容器的一端连接到第二晶体管的栅极并且耦合到第二浮置多晶硅栅极,第二耦合电容器的另一端接收第二控制电压。 第二耦合电容器的一端连接到第二晶体管的栅极并且耦合到第二浮置多晶硅栅极,第二耦合电容器的另一端接收第二控制电压。
    • 5. 发明授权
    • Method for operating one-time programmable read-only memory
    • 一次性可编程只读存储器的操作方法
    • US08089798B2
    • 2012-01-03
    • US12627244
    • 2009-11-30
    • Tsung-Mu LaiShao-Chang HuangWen-hao ChingChun-Hung LuShih-Chen WangMing-Chou Ho
    • Tsung-Mu LaiShao-Chang HuangWen-hao ChingChun-Hung LuShih-Chen WangMing-Chou Ho
    • G11C17/00
    • H01L27/112G11C17/16G11C17/18H01L27/11206
    • A method for operating a one-time programmable read-only memory (OTP-ROM) is provided. The OTP-ROM comprises a first gate and a second gate respectively disposed on a gate dielectric layer between a first doped region and a second doped region on a substrate, wherein the first gate is adjacent to the first doped region and coupled to the first doped region, the second gate is adjacent to the second doped region, the first gate is electrically coupled grounded, and the OTP-ROM is programmed through a breakdown effect. The method comprises a step of programming the OTP-ROM under the conditions that a voltage of the second doped region is higher than a voltage of the first doped region, the voltage of the second gate is higher than a threshold voltage to pass the voltage of the second doped region, and the first doped region and the substrate are at a reference voltage.
    • 提供了一种用于操作一次性可编程只读存储器(OTP-ROM)的方法。 OTP-ROM包括分别设置在衬底上的第一掺杂区域和第二掺杂区域之间的栅极电介质层上的第一栅极和第二栅极,其中第一栅极与第一掺杂区域相邻并耦合到第一掺杂区域 所述第二栅极与所述第二掺杂区相邻,所述第一栅极电耦合接地,并且通过击穿效应对所述OTP-ROM进行编程。 该方法包括在第二掺杂区域的电压高于第一掺杂区域的电压的条件下对OTP-ROM进行编程的步骤,第二栅极的电压高于阈值电压以通过 第二掺杂区域和第一掺杂区域和衬底处于参考电压。
    • 6. 发明申请
    • Logic-Based Multiple Time Programming Memory Cell
    • 基于逻辑的多时间编程存储单元
    • US20110310669A1
    • 2011-12-22
    • US12818095
    • 2010-06-17
    • Wen-Hao ChingShih-Chen WangChing-Sung Yang
    • Wen-Hao ChingShih-Chen WangChing-Sung Yang
    • G11C16/04
    • G11C16/0441G11C2216/10H01L27/11519H01L27/11524H01L29/66825H01L29/7881
    • A non-volatile memory system includes one or more non-volatile memory cells. Each non-volatile memory cell comprises a floating gate, a coupling device, a first floating gate transistor, and a second floating gate transistor. The coupling device is located in a first conductivity region. The first floating gate transistor is located in a second conductivity region, and supplies read current sensed during a read operation. The second floating gate transistor is located in a third conductivity region. Such non-volatile memory cell further comprises two transistors for injecting negative charge into the floating gate during a programming operation, and removing negative charge from the second floating gate transistor during an erase operation. The floating gate is shared by the first floating gate transistor, the coupling device, and the second floating gate transistor, and extends over active regions of the first floating gate transistor, the coupling device and the second floating gate transistor.
    • 非易失性存储器系统包括一个或多个非易失性存储器单元。 每个非易失性存储单元包括浮动栅极,耦合器件,第一浮栅晶体管和第二浮栅晶体管。 耦合装置位于第一导电区域中。 第一浮栅晶体管位于第二导电区域中,并提供在读操作期间感测到的读电流。 第二浮栅晶体管位于第三导电区域中。 这种非易失性存储单元还包括两个晶体管,用于在编程操作期间将负电荷注入浮置栅极,以及在擦除操作期间从第二浮栅晶体管去除负电荷。 浮置栅极由第一浮栅晶体管,耦合器件和第二浮栅晶体管共享,并且延伸在第一浮栅晶体管,耦合器件和第二浮栅晶体管的有源区上。