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1. 发明申请

US20230010838A1 APPARATUS, SYSTEMS, AND METHODS FOR PROVIDING SURVEILLANCE SERVICES FOR UNMANNED AIRCRAFT 有权
公开(公告)号：US20230010838A1
公开(公告)日：2023-01-12
申请号：US17781324
申请日：2020-12-04
申请人： Vineet Mehta , GE Aviation Systems LLC
发明人： Szabolcs Borgyos , Vineet Mehta , Kenneth Stewart
IPC分类号： G08G5/00
摘要： Systems and methods for providing surveillance services for an unmanned vehicle are described herein. One embodiment of a method includes receiving surveilled data from a surveillance monitor regarding the unmanned aerial vehicle and at least one other aircraft, receiving trajectory data from at least one trajectory data source, and comparing the surveilled data with the trajectory data to determine whether the unmanned aerial vehicle is on path to collide with a third party aerial vehicle. In some embodiments, in response to determining that the unmanned aerial vehicle is on path to collide with the third party aerial vehicle, the method includes determining an alternate route for the unmanned aerial vehicle; and communicating at least a portion of the alternate route to the unmanned aerial vehicle.

2. 发明申请

US20220415187A1 APPARATUS, SYSTEM, AND METHOD OF PROVIDING A TRAJECTORY PLANNING ENGINE FOR UNMANNED AIRCRAFT 有权
公开(公告)号：US20220415187A1
公开(公告)日：2022-12-29
申请号：US17781256
申请日：2020-12-04
申请人： Vineet Mehta , GE Aviation Systems LLC
发明人： Szabolcs Borgyos , Vineet Mehta , Kenneth Stewart
IPC分类号： G08G5/00 , G08G5/04
摘要： Systems and methods for trajectory planning for an unmanned aerial vehicle. A mission specification for fulfillment by an unmanned aerial vehicle is received. The mission specification identifies a waypoint, an optimization criterion, and information identifying the unmanned aerial vehicle. It is determined whether candidate flight trajectories are available. Maneuvers from a motions library that defines available maneuvers are modeled to identify candidate flight trajectories to the waypoint which satisfy a restriction condition and do not conflict with a flight plan for another aerial vehicle. If candidate flight trajectories are available, desired flight trajectories are selected. A mission approval is submitted to a receiving party.

3. 发明申请

US20200089798A1 High volume-velocity time series data ingestion, analysis and reporting method and system 审中-公开
公开(公告)号：US20200089798A1
公开(公告)日：2020-03-19
申请号：US16133515
申请日：2018-09-17
申请人： Paul R Ganichot , Vineet Mehta , Jeejosh Balan , Sanjeev Verma
发明人： Paul R Ganichot , Vineet Mehta , Jeejosh Balan , Sanjeev Verma
IPC分类号： G06F17/30 , G06F9/54
摘要： A computer-implemented time-series data processing method comprises receiving high volume-velocity time-series information from one or more data emission devices concerning the occurrences of events and a desired output to be generated. A data identification and structure scheme comprised of a set of identifiers, of a set of record keys and of a set of database tables is analyzed. The information concerning the occurrences of events and associated to the set of identifiers is received at a host computer that is one of one or more host computers configured to ingest and analyze the data. The computer-implemented method processes and stores the received data using the data identification and structure scheme. The computer-implemented method further processes the stored data to generate the desired output.

4. 发明授权

US08512526B2 Method of performing physical vapor deposition with RF plasma source power applied to the target using a magnetron 有权
标题翻译：使用磁控管施加到靶的RF等离子体源功率进行物理气相沉积的方法
公开(公告)号：US08512526B2
公开(公告)日：2013-08-20
申请号：US11222248
申请日：2005-09-07
申请人： Karl M. Brown , John Pipitone , Vineet Mehta
发明人： Karl M. Brown , John Pipitone , Vineet Mehta
IPC分类号： C23C14/00 , C23C14/32 , C25B9/00 , C25B11/00 , C25B13/00 , H01B11/02 , H01B11/06 , H02G3/04 , H05K1/09
CPC分类号： H01J37/3408 , C23C14/046 , C23C14/345 , C23C14/358 , H01J37/32082 , H01J37/32706 , H01L21/2855 , H01L21/76843 , H01L21/76844
摘要： A plasma-enhanced physical vapor deposition method in which VHF power is applied to the sputter target in addition to a D.C. voltage that is also applied to the target, the VHF power level being 3.5 kW or greater, so that the D.C. target power may be reduced to less than 500 W while still attaining a very high ion fraction (in excess of 50%), permitting a very small workpiece-to-target spacing not exceeding a fraction (7/30) of the workpiece diameter to enhance the ionization fraction throughout the process region.
摘要翻译：等离子体增强的物理气相沉积方法，其中除了还施加到目标的DC电压之外，VHF功率被施加到溅射靶，VHF功率电平为3.5kW或更大，使得DC目标功率可以是降低到小于500W，同时仍然获得非常高的离子分数（超过50％），允许非常小的工件到目标间距不超过工件直径的分数（7/30），以增强离子化分数在整个过程区域。

5. 发明申请

US20130192629A1 SUBSTRATE CLEANING CHAMBER AND CLEANING AND CONDITIONING METHODS 审中-公开
标题翻译：基板清洗室和清洁和调节方法
公开(公告)号：US20130192629A1
公开(公告)日：2013-08-01
申请号：US13740083
申请日：2013-01-11
申请人： Vineet Mehta , Karl M. BROWN , John A. Pipitone , Daniel J. Hoffman , Steven C. Shannon , Keith A. Miller , Vijay D. PARKHE
发明人： Vineet Mehta , Karl M. BROWN , John A. Pipitone , Daniel J. Hoffman , Steven C. Shannon , Keith A. Miller , Vijay D. PARKHE
IPC分类号： B08B7/00
CPC分类号： B08B7/0035 , C25F7/00 , H01J37/32009 , H01J37/32541 , H01L21/02046 , H01L21/0206
摘要： A substrate cleaning chamber includes a contoured ceiling electrode having an arcuate surface that faces a substrate support and has a variable cross-sectional thickness to vary the gap size between the arcuate surface and the substrate support to provide a varying plasma density across the substrate support. A dielectric ring for the cleaning chamber comprises a base, a ridge, and a radially inward ledge that covers the peripheral lip of the substrate support. A base shield comprises a circular disc having at least one perimeter wall. Cleaning and conditioning processes for the cleaning chamber are also described.
摘要翻译：衬底清洁室包括具有面向衬底支撑件的弓形表面的轮廓天花板电极，并且具有可变的横截面厚度以改变弧形表面和衬底支撑件之间的间隙尺寸，以在衬底支撑件上提供变化的等离子体密度。用于清洁室的介电环包括覆盖基板支撑件的周缘的基部，脊和径向向内的凸缘。底座包括具有至少一个周边壁的圆盘。还描述了清洁室的清洁和调节过程。

6. 发明授权

US08435379B2 Substrate cleaning chamber and cleaning and conditioning methods 有权
标题翻译：基材清洗室和清洁和调理方法
公开(公告)号：US08435379B2
公开(公告)日：2013-05-07
申请号：US11745451
申请日：2007-05-08
申请人： Vineet Mehta , Karl Brown , John A. Pipitone , Daniel J. Hoffman , Steven C. Shannon , Keith A. Miller , Vijay D. Parkhe
发明人： Vineet Mehta , Karl Brown , John A. Pipitone , Daniel J. Hoffman , Steven C. Shannon , Keith A. Miller , Vijay D. Parkhe
IPC分类号： H01L21/306
CPC分类号： B08B7/0035 , C25F7/00 , H01J37/32009 , H01J37/32541 , H01L21/02046 , H01L21/0206
摘要： A substrate cleaning chamber includes a contoured ceiling electrode having an arcuate surface that faces a substrate support and has a variable cross-sectional thickness to vary the gap size between the arcuate surface and the substrate support to provide a varying plasma density across the substrate support. A dielectric ring for the cleaning chamber comprises a base, a ridge, and a radially inward ledge that covers the peripheral lip of the substrate support. A base shield comprises a circular disc having at least one perimeter wall. Cleaning and conditioning processes for the cleaning chamber are also described.
摘要翻译：衬底清洁室包括具有面向衬底支撑件的弓形表面的轮廓天花板电极，并且具有可变的横截面厚度以改变弧形表面和衬底支撑件之间的间隙尺寸，以在衬底支撑件上提供变化的等离子体密度。用于清洁室的介电环包括覆盖基板支撑件的周缘的基部，脊和径向向内的凸缘。底座包括具有至少一个周边壁的圆盘。还描述了清洁室的清洁和调节过程。

7. 发明申请

US20090256723A1 METHODS, SYSTEMS AND DEVICES RELATED TO ROAD MOUNTED INDICATORS FOR PROVIDING VISUAL INDICATIONS TO APPROACHING TRAFFIC 失效
标题翻译：与道路安装指标相关的方法，系统和设备，用于提供视觉指示以实现交通
公开(公告)号：US20090256723A1
公开(公告)日：2009-10-15
申请号：US12492143
申请日：2009-06-26
申请人： Timm Peddie , David P. Bim-Merle , Thomas A. Burnham , Daniel O. Santos , Lawrence E. Miller , Vineet Mehta , Johannes B. Van Niekerk
发明人： Timm Peddie , David P. Bim-Merle , Thomas A. Burnham , Daniel O. Santos , Lawrence E. Miller , Vineet Mehta , Johannes B. Van Niekerk
IPC分类号： G08G1/095
CPC分类号： G08G1/096783 , E01F9/559
摘要： A traffic informational system provides information to traffic moving along a road and may include a plurality of traffic information devices mountable to the road, each having an integral power producing source, at least a first set of illumination sources, and a wireless communications subsystem. The traffic informational system may further include at least a first external control device comprising at least one antenna and a transmitter communication wirelessly with the traffic information devices and/or with one another. The traffic information device may communicate with one another, and may include sensor for sensing ambient conditions. The system employs various approaches to reducing power consumption and improving communications, and is suitable for a wide range of applications, including use in remote environments.
摘要翻译：交通信息系统为沿着道路行驶的交通提供信息，并且可以包括可安装到道路的多个交通信息装置，每个具有整体的发电源，至少第一组照明源和无线通信子系统。交通信息系统还可以包括至少第一外部控制装置，该第一外部控制装置包括与交通信息装置和/或彼此无线地相连接的至少一个天线和发射机通信。交通信息装置可以彼此通信，并且可以包括用于感测环境条件的传感器。该系统采用各种方法来降低功耗并改善通信，适用于各种应用，包括在远程环境中使用。

8. 发明授权

US07513971B2 Flat style coil for improved precision etch uniformity 有权
标题翻译：扁平型线圈，可提高精密蚀刻均匀性
公开(公告)号：US07513971B2
公开(公告)日：2009-04-07
申请号：US10387948
申请日：2003-03-12
申请人： Karl Brown , Vineet Mehta , See-Eng Phan
发明人： Karl Brown , Vineet Mehta , See-Eng Phan
IPC分类号： H01L21/306 , C23C16/00
CPC分类号： H01J37/321
摘要： An RF coil for a plasma etch chamber is provided in which the RF coil is substantially flat over a portion of at least one turn of the coil. In one embodiment, each turn of the coil is substantially flat over a majority of each turn. In one embodiment of the present inventions, each turn of the coil is substantially flat over approximately 300 degrees of the turn. In the final approximate 60 degrees of the turn, the coil is sloped down to the next turn. Each turn thus comprises a substantially flat portion in combination with a sloped portion interconnecting the turn to the next adjacent turn. In one embodiment, the RF coil having turns with substantially flat portions is generally cylindrical. Other shapes are contemplated such as a dome shape. In some applications such as an RF plasma etch reactor, it is believed that providing an RF coil having turns comprising flat portions with sloped portions interconnecting the flat portions can improve uniformity of the etch process.
摘要翻译：提供了一种用于等离子体蚀刻室的RF线圈，其中RF线圈在线圈的至少一圈的一部分上基本上是平坦的。在一个实施例中，线圈的每个匝在每匝的大部分上基本平坦。在本发明的一个实施例中，线圈的每一圈在转弯的大约300度处基本平坦。在最终大约60度的转弯中，线圈向下倾斜到下一回合。因此，每个转弯包括基本平坦的部分，与将转弯相互连接到下一个相邻转弯的倾斜部分组合。在一个实施例中，具有基本平坦部分的匝的RF线圈通常为圆柱形。可以想到其它形状，例如圆顶形状。在诸如RF等离子体蚀刻反应器的一些应用中，据信提供具有包括平坦部分的匝的RF线圈，其具有互连平坦部分的倾斜部分可以提高蚀刻工艺的均匀性。

9. 发明授权

US07480129B2 Detachable electrostatic chuck for supporting a substrate in a process chamber 有权
标题翻译：用于在处理室中支撑基板的可拆卸静电卡盘
公开(公告)号：US07480129B2
公开(公告)日：2009-01-20
申请号：US11221169
申请日：2005-09-07
申请人： Karl Brown , Semyon Sherstinsky , Wei W. Wang , Cheng-Hsiung Tsai , Vineet Mehta , Allen Lau , Steve Sansoni
发明人： Karl Brown , Semyon Sherstinsky , Wei W. Wang , Cheng-Hsiung Tsai , Vineet Mehta , Allen Lau , Steve Sansoni
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , Y10T279/23
摘要： A detachable electrostatic chuck can be attached to a pedestal in a process chamber. The electrostatic chuck has an electrostatic puck comprising a dielectric covering at least one electrode and a frontside surface to receive a substrate. A backside surface of the chuck has a central protrusion that can be a D-shaped mesa to facilitate alignment with a mating cavity in the pedestal. The protrusion can also have asymmetrically offset apertures, which further assist alignment, and also serve to receive electrode terminal posts and a gas tube. A heat transfer plate having an embedded heat transfer fluid channel is spring loaded on the pedestal to press against the chuck for good heat transfer.
摘要翻译：可拆卸的静电卡盘可以附接到处理室中的基座。静电吸盘具有包括覆盖至少一个电极和前侧表面的电介质的静电压盘，用于接收衬底。卡盘的背面具有可以是D形台面的中心突起，以便于与基座中的配合腔体对准。突起还可以具有不对称偏移的孔，其进一步辅助对准，并且还用于接收电极端子柱和气体管。具有嵌入式传热流体通道的传热板弹簧加载在基座上以压靠卡盘以获得良好的热传递。

10. 发明授权

US07252737B2 Pedestal with integral shield 有权
标题翻译：带整体护罩的基座
公开(公告)号：US07252737B2
公开(公告)日：2007-08-07
申请号：US10819891
申请日：2004-04-06
申请人： Karl Brown , Vineet Mehta , See-Eng Phan , Semyon Sherstinsky , Allen Lau
发明人： Karl Brown , Vineet Mehta , See-Eng Phan , Semyon Sherstinsky , Allen Lau
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/67069 , H01J37/321 , H01J37/32623
摘要： Generally, a substrate support member for supporting a substrate is provided. In one embodiment, a substrate support member for supporting a substrate includes a body coupled to a lower shield. The body has an upper surface adapted to support the substrate and a lower surface. The lower shield has a center portion and a lip. The lip is disposed radially outward of the body and projects towards a plane defined by the first surface. The lip is disposed in a spaced-apart relation from the body. The lower shield is adapted to interface with an upper shield disposed in a processing chamber to define a labyrinth gap that substantially prevents plasma from migrating below the member. The lower shield, in another embodiment, provides the plasma with a short RF ground return path.
摘要翻译：通常，提供了用于支撑衬底的衬底支撑构件。在一个实施例中，用于支撑衬底的衬底支撑构件包括联接到下屏蔽的主体。主体具有适于支撑基板和下表面的上表面。下屏蔽件具有中心部分和唇部。唇缘设置在身体的径向外侧并朝向由第一表面限定的平面突出。唇缘与身体间隔开设置。下屏蔽适于与设置在处理室中的上屏蔽接口以限定基本上防止等离子体迁移到构件下方的迷宫间隙。在另一个实施例中，下屏蔽为等离子体提供短的RF接地返回路径。

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