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    • 1. 发明授权
    • Method of ejecting faulty absorbent article
    • 弹出吸收性物品的方法
    • US09101514B2
    • 2015-08-11
    • US14130155
    • 2012-06-29
    • Kazuhiko TakahashiTomohiro WatanabeMasanobu Miyaki
    • Kazuhiko TakahashiTomohiro WatanabeMasanobu Miyaki
    • B07C5/342A61F13/15
    • A61F13/15764A61F13/15772B07C5/342
    • A method of ejecting a faulty absorbent article which includes a step of detecting a failure region of an absorbent article in which a failure location of the absorbent article exists, and a type of a failure in the failure region, by identifying a shape of the absorbent article in the course of the manufacturing line, a step of deciding the absorbent article to be ejected based on the detection result of the failure region and the type of failure in the step of detecting, and a step of disengaging, from the manufacturing line, the absorbent article decided in the step of deciding, and then ejecting the absorbent article in the course of the manufacturing line. In the step of deciding, the number of absorbent articles to be ejected in the step of ejecting is decided according to the failure region and the type of the failure.
    • 一种排出有缺陷的吸收性物品的方法,其包括检测存在吸收性物品的故障位置的吸收性物品的失效区域的步骤,以及破坏区域的失效类型,通过识别吸收性物品的形状 在制造过程中的制品,基于故障区域的检测结果和检测步骤中的故障类型来决定要排出的吸收性物品的步骤,以及从生产线脱离的步骤, 所述吸收性物品在制造过程中决定,然后喷射吸收性物品的步骤中决定。 在决定步骤中,根据故障区域和故障类型来决定喷射步骤中要喷射的吸收性物品的数量。
    • 2. 发明授权
    • Glass composition and optical device
    • 玻璃组成和光学装置
    • US08921246B2
    • 2014-12-30
    • US13580603
    • 2011-02-23
    • Tomohiro WatanabeTaihei Mukaide
    • Tomohiro WatanabeTaihei Mukaide
    • C03C3/062C03C3/095C03C4/00
    • C03C3/062C03C4/0085
    • There is provided a glass composition containing an oxide containing Lu, Si, and Al, in which the composition of the glass composition lies within a compositional region of a ternary composition diagram of Lu, Si, and Al in terms of cation percent, the compositional region being defined by the following six points: (32.3% LuO3/2, 30.0% SiO2, 37.7% AlO3/2), (32.3% LuO3/2, 37.7% SiO2, 30.0% AlO3/2), (20.8% LuO3/2, 55.0% SiO2, 24.2% AlO3/2), (10.0% LuO3/2, 45.0% SiO2, 45.0% AlO3/2), (20.8% LuO3/2, 24.2% SiO2, 55.0% AlO3/2), and (30.0% LuO3/2, 25.0% SiO2, 45.0% AlO3/2). For the glass composition, a glassy state having low or no intrinsic birefringence in the ultraviolet region is stably obtained.
    • 提供了含有Lu,Si和Al的氧化物的玻璃组合物,其中玻璃组合物的组成位于Lu,Si和Al的三元组成图的组成范围内,以阳离子百分比计,组成 (32.3%LuO3 / 2,30.0%SiO2,37.7%AlO3 / 2),(32.3%LuO3 / 2,37.7%SiO2,30.0%AlO3 / 2)(20.8%LuO3 / 2%,55.0%SiO 2,24.2%AlO 3/2)(10.0%LuO 3/2,45.0%SiO 2,45.0%AlO 3/2)(20.8%LuO 3/2,24.2%SiO 2,55.0%AlO 3/2) (30.0%LuO 3/2,25.0%SiO 2,45.0%AlO 3/2)。 对于玻璃组合物,稳定地获得在紫外区域中具有低或没有固有双折射的玻璃状态。
    • 5. 发明授权
    • Thin film transistor
    • 薄膜晶体管
    • US08344373B2
    • 2013-01-01
    • US12891704
    • 2010-09-27
    • Ayumu SatoHideya KumomiRyo HayashiTomohiro Watanabe
    • Ayumu SatoHideya KumomiRyo HayashiTomohiro Watanabe
    • H01L29/786H01L21/84
    • H01L29/7869
    • To achieve, in an oxide semiconductor thin layer transistor, both the stability of threshold voltage against electric stress and suppression of variation in the threshold voltage in a transfer characteristic. A thin film transistor includes an oxide semiconductor layer and a gate insulating layer disposed so as to be in contact with the oxide semiconductor layer, wherein the oxide semiconductor layer contains hydrogen atoms and includes at least two regions that function as active layers of the oxide semiconductor and have different average hydrogen concentrations in the layer thickness direction; and when the regions functioning as the active layers of the oxide semiconductor are sequentially defined as, from the side of the gate insulating layer, a first region and a second region, the average hydrogen concentration of the first region is lower than the average hydrogen concentration of the second region.
    • 为了在氧化物半导体薄层晶体管中实现阈值电压对电应力的稳定性和抑制传输特性中阈值电压变化的两者。 薄膜晶体管包括氧化物半导体层和设置成与氧化物半导体层接触的栅极绝缘层,其中氧化物半导体层包含氢原子,并且包括至少两个用作氧化物半导体的有源层的区域 并且在层厚度方向上具有不同的平均氢浓度; 并且当用作氧化物半导体的有源层的区域依次定义为从栅极绝缘层的侧面开始第一区域和第二区域时,第一区域的平均氢浓度低于平均氢浓度 的第二个地区。