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1. 发明授权

US09031429B2 Gloss processing apparatus 有权
标题翻译：光泽处理装置
公开(公告)号：US09031429B2
公开(公告)日：2015-05-12
申请号：US13761580
申请日：2013-02-07
申请人： Teruo Shimao , Toshie Shimao , Katsunori Takahashi , Kenji Tamaki , Kenichi Hayashi , Yumiko Izumiya , Kazutoshi Yoshimura
发明人： Satoshi Shimao , Katsunori Takahashi , Kenji Tamaki , Kenichi Hayashi , Yumiko Izumiya , Kazutoshi Yoshimura
IPC分类号： G03G21/00 , B05C11/00 , G03G7/00 , G03G8/00
CPC分类号： B05C11/00 , G03G7/00 , G03G7/0006 , G03G8/00
摘要： A sheet of paper is set on a paper-supplying portion of a top surface gloss processing apparatus while its top surface is faced upward. A gloss level sensor measures gloss level of the top surface of the sheet of paper. Data of this measurement is compared with a previously set threshold value. Based on this comparison, it is determined whether or not the gloss processing has been performed on the top surface thereof. When determining that the gloss processing has been already performed, a warning message such that the gloss processing has been already performed on the top surface of the sheet, of paper is displayed on a screen. On the other hand, when determining that the gloss processing has not performed, the top surface gloss processing apparatus performs the gloss processing on the top surface thereof.
摘要翻译：在上表面光泽处理装置的纸供给部分上面设置有一张纸，同时其顶面朝上。光泽度传感器测量纸张顶表面的光泽度。将该测量的数据与先前设定的阈值进行比较。基于该比较，确定在其顶表面上是否进行光泽处理。当确定已经执行光泽处理时，在屏幕上显示纸张的表面上已经执行了光泽处理的警告消息。另一方面，当确定没有进行光泽处理时，顶面光泽处理装置在其顶表面上进行光泽处理。

2. 发明授权

US4282173A Method for manufacturing refractory material having numerous through pores extending in a certain direction 失效
$Method for manufacturing refractory material having numerous through pores extending in a certain direction$
标题翻译：具有沿一定方向延伸的多个通孔的耐火材料的制造方法
公开(公告)号：US4282173A
公开(公告)日：1981-08-04
申请号：US959731
申请日：1978-11-13
申请人： Tsunemi Ochiai , Goro Saiki , Teruo Shimao , Toshitaro Saito , Shizuo Nakanishi , Takeo Saeki
发明人： Tsunemi Ochiai , Goro Saiki , Teruo Shimao , Toshitaro Saito , Shizuo Nakanishi , Takeo Saeki
IPC分类号： C04B38/06 , C04B33/32
CPC分类号： C04B38/065 , C04B2111/0087 , Y10S264/44 , Y10S425/012
摘要： The present invention relates to a method for manufacturing a refractory erial having numerous through pores in a certain direction. The refractory material is manufactured by covering a woven fabric composed of combustible weft and/or warp threads with a slurry of a refractory material, and then drying and baking the coated fabric to burn out the combustible yarns so that the desired through pores may be obtained in directions corresponding to the direction of the burned out weft and warp threads.
摘要翻译：本发明涉及一种在一定方向上具有多个通孔的耐火材料的制造方法。耐火材料通过用耐火材料的浆料覆盖由可燃纬纱和/或经纱构成的机织织物制造，然后干燥和烘烤涂布的织物以烧尽可燃纱线，从而可获得所需的通孔在与被烧的纬纱和经纱的方向相对应的方向上。

3. 发明授权

US08838004B2 Gloss processing apparatus 有权
标题翻译：光泽处理装置
公开(公告)号：US08838004B2
公开(公告)日：2014-09-16
申请号：US13761615
申请日：2013-02-07
申请人： Teruo Shimao , Toshie Shimao
发明人： Satoshi Shimao , Katsunori Takahashi , Kenji Tamaki , Kenichi Hayashi , Yumiko Izumiya , Kazutoshi Yoshimura
IPC分类号： G03G15/20 , G03G15/00 , B05C11/00 , G03G8/00
CPC分类号： B05C11/00 , G03G7/0006 , G03G8/00
摘要： A sheet of paper is set on a paper-supplying portion of a back surface gloss processing apparatus while its top surface is faced upward. A gloss level sensor measures a gloss level of a back surface of the sheet of paper. Data of this measurement is compared with a previously set threshold value. When this measurement result does not exceed the threshold value, it is determined that the gloss processing has not been performed on the back surface thereof. It is then determined whether or not the presently set operation mode is a top surface gloss processing mode. When determining that the present operation mode is not the top surface gloss processing mode, the operation mode is automatically changed from a presently set back surface gloss processing mode to the top surface gloss processing mode.
摘要翻译：在背面光泽处理装置的供纸部上设置一张纸，同时其上表面朝上。光泽度传感器测量纸张背面的光泽度。将该测量的数据与先前设定的阈值进行比较。当该测量结果不超过阈值时，确定在其背面没有进行光泽处理。然后确定当前设置的操作模式是否是顶表面光泽处理模式。当确定当前操作模式不是顶部表面光泽处理模式时，操作模式被自动地从当前设置的背面光泽处理模式改变为顶表面光泽处理模式。

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