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    • 2. 发明授权
    • Method of fabricating a planar waveguide structure
    • 制造平面波导结构的方法
    • US5979188A
    • 1999-11-09
    • US880594
    • 1997-06-23
    • Sureshchandra Mishrilal Ojha
    • Sureshchandra Mishrilal Ojha
    • C23C16/56G02B6/12G02B6/132C23C16/40
    • G02B6/132C23C16/56G02B2006/12169
    • Annealing a planar wave guide layer is critical because small structural imperfections lead to optical problems. Chemical vapor deposition of the layer tends to leave gaseous substances bonded to the deposit, which on being driven off by initial annealing warm-ups leave cavities requiring densification. Traditional annealing methods take several hours. This invention proposes a rapid heating of the layer to a temperature below the flow temperature, maintaining this temperature for about 30 to 300 seconds, then rapidly heating up further to a temperature close to or above the flow temperature, maintaining this temperature for about 30 to 300 seconds, then allowing the substrate and layer to cool rapidly to room temperature.
    • 退火平面波导层是至关重要的,因为小的结构缺陷导致光学问题。 该层的化学气相沉积倾向于留下结合到沉积物上的气态物质,其在初始退火预热时被驱除,留下需要致密化的空隙。 传统的退火方法需要几个小时。 本发明提出将层的快速加热到低于流动温度的温度,将该温度保持约30至300秒,然后进一步快速升温至接近或高于流动温度的温度,将该温度保持在约30℃至 300秒,然后使基材和层迅速冷却至室温。