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1. 发明授权

US08951718B2 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method 有权
标题翻译：图案形成方法，图案形成方法中使用的多次显影用抗蚀剂组合物，图案形成方法中使用的负显影用显影剂和图案形成方法中使用的负显影用冲洗液
公开(公告)号：US08951718B2
公开(公告)日：2015-02-10
申请号：US13588762
申请日：2012-08-17
申请人： Hideaki Tsubaki , Shinichi Kanna
发明人： Hideaki Tsubaki , Shinichi Kanna
IPC分类号： G03F7/039 , G03F7/32 , G03F7/20
CPC分类号： G03F7/325 , G03F7/038 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/16 , G03F7/2002 , G03F7/2024 , G03F7/30 , G03F7/32 , G03F7/40 , Y10T428/24802
摘要： A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
摘要翻译：一种图案形成方法，包括：（A）用正性显影剂中的溶解度增加的正性抗蚀剂组合物涂覆基材，并且在用光化学辐射或辐射照射时，在负极显影剂中的溶解度降低，以形成抗蚀剂膜; （B）曝光抗蚀膜; 和（D）用负极显影剂显影抗蚀膜; 该方法中使用的用于多重显影的正性抗蚀剂组合物; 用于该方法的开发人员; 以及用于该方法的负显影用冲洗液。

2. 发明授权

US08900789B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法
公开(公告)号：US08900789B2
公开(公告)日：2014-12-02
申请号：US12501938
申请日：2009-07-13
申请人： Hiroshi Saegusa , Shinichi Kanna
发明人： Hiroshi Saegusa , Shinichi Kanna
IPC分类号： G03F7/039 , G03F7/075 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/0757 , G03F7/2041
摘要： An actinic-ray- or radiation-sensitive resin composition comprises (A) a resin that when acted on by an acid, exhibits an increased solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, (C) a resin containing two or more resins (c) each having at least either a fluorine atom or a silicon atom, and (D) a solvent.
摘要翻译：光化射线或辐射敏感性树脂组合物包含（A）当被酸作用时表现出增加的在碱性显影剂中的溶解度的树脂，（B）当暴露于光化射线或辐射时产生酸，（C）含有两种以上的具有至少一个氟原子或硅原子的树脂（c）的树脂和（D）溶剂。

3. 发明授权

US08679724B2 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition 有权
标题翻译：正性抗蚀剂组合物，用于正性抗蚀剂组合物的树脂，用于合成树脂的化合物和使用正性抗蚀剂组合物的图案形成方法
公开(公告)号：US08679724B2
公开(公告)日：2014-03-25
申请号：US11636482
申请日：2006-12-11
申请人： Hiromi Kanda , Shinichi Kanna
发明人： Hiromi Kanda , Shinichi Kanna
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , C07C69/653 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/0392 , G03F7/0395 , G03F7/0757 , G03F7/0758 , G03F7/2041 , G03F7/30 , G03F7/322
摘要： A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.
摘要翻译：正型抗蚀剂组合物包括：（A）在酸的作用下在碱性显影剂中的溶解度增加的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）具有氟原子和硅原子中的至少一个的树脂; 和（D）溶剂; 以及使用正性抗蚀剂组合物的图案形成方法。

4. 发明授权

US08637215B2 Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device 有权
公开(公告)号：US08637215B2
公开(公告)日：2014-01-28
申请号：US13033153
申请日：2011-02-23
申请人： Shinichi Kanna , Kazuya Oota , Masaru Yoshikawa , Junichi Ito , Yoshihiko Fujie , Shigekazu Suzuki
发明人： Shinichi Kanna , Kazuya Oota , Masaru Yoshikawa , Junichi Ito , Yoshihiko Fujie , Shigekazu Suzuki
IPC分类号： G02B5/20
CPC分类号： G02B5/223 , C07D207/335 , C07D207/34 , C07D403/06 , C09B23/0008 , C09B23/04 , C09B57/00 , C09B67/0033 , C09B69/105 , G02B1/04 , G03C1/735 , G03F7/0007 , G03F7/105
摘要： The present invention provides a colored curable composition including a phthalocyanine pigment, a dioxazine pigment, a dye, a polymerization initiator, a polymerizable compound and a solvent; and a colored curable composition including a phthalocyanine pigment, a dye multimer having a polymerizable group and a group derived from a dipyrromethene dye, a polymerization initiator, a polymerizable compound and a solvent.

5. 发明授权

US08338062B2 Colored curable composition, method for producing color filter, color filter, solid-state image pickup device, and liquid crystal display device 有权
标题翻译：着色固化性组合物，滤色器的制造方法，滤色器，固态摄像装置以及液晶显示装置
公开(公告)号：US08338062B2
公开(公告)日：2012-12-25
申请号：US12749533
申请日：2010-03-30
申请人： Kazuya Oota , Shinichi Kanna , Yoshihiko Fujie , Junichi Ito , Yosuke Murakami , Shigekazu Suzuki
发明人： Kazuya Oota , Shinichi Kanna , Yoshihiko Fujie , Junichi Ito , Yosuke Murakami , Shigekazu Suzuki
IPC分类号： G02B5/20 , G02F1/1335
CPC分类号： C07D207/34 , C09B23/04 , C09B57/00 , C09B67/0033 , G03F7/0007
摘要： A colored curable composition including at least (A-1) a complex including a compound represented by the following formula (I) and a metal atom or a metal compound, (A-2) a phthalocyanine pigment, (B) a dispersing agent, (C) a polymerizable compound, (D) a photopolymerization initiator, and (E) an organic solvent: wherein R1 to R6 each independently represent a hydrogen atom or a substituent; and R7 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group.
摘要翻译：一种着色固化性组合物，其至少包含（A-1）包含下式（I）表示的化合物和金属原子或金属化合物的复合物，（A-2）酞菁颜料，（B）分散剂，（C）可聚合化合物，（D）光聚合引发剂和（E）有机溶剂：其中R 1至R 6各自独立地表示氢原子或取代基; 并且R 7表示氢原子，卤素原子，烷基，芳基或杂环基。

6. 发明申请

US20120264039A1 COLORED CURABLE COMPOSITION, RESIST LIQUID, INK FOR INKJET PRINTING, COLOR FILTER, METHOD OF PRODUCING COLOR FILTER, SOLID-STATE IMAGE SENSOR, LIQUID CRYSTAL DISPLAY, ORGANIC EL DISPLAY, IMAGE DISPLAY DEVICE AND COLORANT COMPOUND 有权
标题翻译：彩色固化组合物，电阻液体，用于喷墨打印的墨水，彩色滤光片，生产彩色滤光片的方法，固态图像传感器，液晶显示器，有机EL显示器，图像显示装置和着色剂化合物
公开(公告)号：US20120264039A1
公开(公告)日：2012-10-18
申请号：US13501650
申请日：2010-10-07
申请人： Junichi Ito , Yuki Mizukawa , Yoshiharu Yabuki , Shinichi Kanna , Haruki Inabe , Yushi Kaneko , Akiyoshi Goto
发明人： Junichi Ito , Yuki Mizukawa , Yoshiharu Yabuki , Shinichi Kanna , Haruki Inabe , Yushi Kaneko , Akiyoshi Goto
IPC分类号： C07F3/06 , G03F1/54
CPC分类号： C09D11/101 , C09B57/10 , C09B69/109 , C09D11/322 , G03F7/0007 , G03F7/105 , G03F7/40
摘要： The invention provides a colored curable composition including a dipyrromethene compound having a structure in which a polymerizable group and a carboxyl group are introduced in the same molecule, a resist liquid, an ink for inkjet printing, a color filter, a method of producing a color filter, a solid-state image sensor, a liquid crystal display, an organic EL display, an image display device and a colorant compound.
摘要翻译：本发明提供一种着色固化性组合物，其包含具有将聚合性基团和羧基引入同一分子的结构的二吡咯亚甲基化合物，抗蚀剂液体，喷墨印刷用油墨，滤色器，颜色的制造方法滤光片，固态图像传感器，液晶显示器，有机EL显示器，图像显示装置和着色剂化合物。

7. 发明申请

US20120187351A1 COLORANT MULTIMER, COLORED CURABLE COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, AND SOLID-STATE IMAGE SENSOR, IMAGE DISPLAY DEVICE, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY WITH THE COLOR FILTER 有权
标题翻译：彩色多彩色彩，彩色滤光片及其制造方法，固体摄影传感器，图像显示装置，液晶显示器件和有机EL显示器与彩色滤光片
公开(公告)号：US20120187351A1
公开(公告)日：2012-07-26
申请号：US13498885
申请日：2010-09-28
申请人： Junichi Ito , Masaru Yoshikawa , Yuki Mizukawa , Kenta Ushijima , Shinichi Kanna , Haruki Inabe , Yoshihiko Fujie , Akiyoshi Goto , Yushi Kaneko , Hiroaki Idei
发明人： Junichi Ito , Masaru Yoshikawa , Yuki Mizukawa , Kenta Ushijima , Shinichi Kanna , Haruki Inabe , Yoshihiko Fujie , Akiyoshi Goto , Yushi Kaneko , Hiroaki Idei
IPC分类号： G02B5/23 , G03F7/028 , G03F7/004 , G03F7/027 , C07F3/06 , G03F7/20
CPC分类号： C08F2/50 , C08F220/36 , C08F220/60 , C09B23/04 , C09B57/10 , C09B69/108 , C09K11/06 , C09K2211/1408 , C09K2211/188 , G02B5/22 , G02F1/133516 , G03F7/0007 , G03F7/027 , G03F7/033 , G03F7/0388 , G03F7/105 , H01L27/322 , H05B33/12
摘要： A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: (i) a dipyrromethene compound represented by the following Formula (M); and (ii) a metal or a metal compound: wherein in Formula (M), R4, R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom or a monovalent substituent.
摘要翻译：着色剂多聚体包括作为着色剂部分的部分结构的二吡咯亚甲基金属络合物或其互变异构体，其由以下物质获得：（i）由下式（M）表示的二吡咯亚甲基化合物; 和（ii）金属或金属化合物：其中在式（M）中，R 4，R 5，R 6，R 7，R 8，R 9和R 10各自独立地表示氢原子或一价取代基。

8. 发明授权

US08062826B2 Positive resist composition and pattern-forming method 有权
标题翻译：正抗蚀剂组成和图案形成方法
公开(公告)号：US08062826B2
公开(公告)日：2011-11-22
申请号：US12058223
申请日：2008-03-28
申请人： Shinichi Kanna
发明人： Shinichi Kanna
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/11 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition includes: (A) a resin capable of increasing the solubility in an alkali developing solution by the action of an acid, including: (a1) a repeating unit selected from repeating units represented by specific formulae (a1-1) to (a1-3); (a2) a repeating unit represented by a specific formula (a2); and (a3) a repeating unit selected from repeating units represented by specific formulae (a3-1) to (a3-4); (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a resin including: at least one of a fluorine atom and a silicon atom; and a group selected from specific groups (x) to (z):(x) an alkali-soluble group, (y) a group capable of decomposing by the action of an alkali developing solution to increase the solubility in the alkali developing solution, and (z) a group capable of decomposing by the action of an acid; and (D) a solvent.
摘要翻译：正型抗蚀剂组合物包括：（A）能够通过酸的作用增加在碱性显影液中的溶解度的树脂，其包括：（a1）选自由特定式（a1-1）至（a1-3）; （a2）由特定式（a2）表示的重复单元; 和（a3）选自由特定式（a3-1）〜（a3-4）表示的重复单元的重复单元; （B）能够在用光化射线或辐射照射时能够产生酸的化合物，（C）含有氟原子和硅原子中的至少一种的树脂; 和选自碱溶性基团（x）〜（z）:( x）中的基团，（y）能够通过碱性显影液的作用分解以提高在碱性显影液中的溶解度的基团，和（z）能够通过酸的作用分解的基团; 和（D）溶剂。

9. 发明授权

US08034537B2 Positive resist composition and pattern forming method 有权
标题翻译：正抗蚀剂组成和图案形成方法
公开(公告)号：US08034537B2
公开(公告)日：2011-10-11
申请号：US12593353
申请日：2008-03-27
申请人： Toshiaki Fukuhara , Hiromi Kanda , Shinichi Kanna
发明人： Toshiaki Fukuhara , Hiromi Kanda , Shinichi Kanna
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/0757 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A positive photosensitive composition comprises: (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound that generates an acid in irradiation with actinic light or radiation; (C) a resin that has: at least one of a fluorine atom and a silicon atom; and a group selected from the group consisting of groups (x) to (z); and (D) a solvent: (x) an alkali soluble group, (y) a group which decomposes by action of an alkali developer and increases a solubility of the resin (C) in an alkali developer, and (z) a group which decomposes by action of an acid, wherein, Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two of Ry1 to Ry3 may be coupled to form a ring structure, and Z represents a divalent linking group.
摘要翻译：正型光敏组合物包含：（A）具有由式（I）表示的可酸分解重复单元并通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）在光化或辐射照射下产生酸的化合物; （C）具有氟原子和硅原子中的至少一个的树脂; 和选自基团（x）〜（z））的基团。和（D）溶剂：（x）碱溶性基团，（y）通过碱显影剂的作用分解并增加树脂（C）在碱性显影剂中的溶解度的基团，和（z）通过酸的作用分解，其中，Xa1表示氢原子，烷基，氰基或卤素原子，Ry1〜Ry3各自独立地表示烷基或环烷基，Ry1〜Ry3中的至少两个可以偶联形成环结构，Z表示二价连接基团。

10. 发明授权

US07700260B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US07700260B2
公开(公告)日：2010-04-20
申请号：US11656527
申请日：2007-01-23
申请人： Shinichi Kanna , Haruki Inabe , Hiromi Kanda
发明人： Shinichi Kanna , Haruki Inabe , Hiromi Kanda
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A pattern forming method which uses a positive resist composition comprises: (A) a fluorine-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a fluorine-containing resin having at least one group selected from the group consisting of (X) an alkali-soluble group, (XI) a group capable of decomposing under action of an alkali developer and increasing solubility of the resin (C) in an alkaline developer and (XII) a group capable of decomposing under action of an acid and increasing solubility of the resin (C) in an alkaline developer; and (D) a solvent, the method comprising: (i) a step of applying the positive resist composition to a substrate to form a resist coating; (ii) a step of exposing the resist coating to light via an immersion liquid; (iii) a step of removing the immersion liquid remaining on the resist coating; (iv) a step of heating the resist coating; and (v) a step of developing the resist coating.
摘要翻译：使用正性抗蚀剂组合物的图案形成方法包括：（A）能够在酸的作用下增加其在碱性显影剂中的溶解度的无氟树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; （C）具有选自（X）碱溶性基团（XI）中的至少一种基团的含氟树脂，（XI）能够在碱性显影剂的作用下分解的基团和增加树脂的溶解度（C ）和（XII）能够在酸的作用下分解并增加树脂（C）在碱性显影剂中的溶解度的基团; 和（D）溶剂，所述方法包括：（i）将正性抗蚀剂组合物施加到基材以形成抗蚀剂涂层的步骤; （ii）通过浸没液体使抗蚀剂涂层曝光的步骤; （iii）去除残留在抗蚀剂涂层上的浸渍液体的步骤; （iv）加热抗蚀剂涂层的步骤; 和（v）开发抗蚀剂涂层的步骤。

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