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    • 5. 发明申请
    • COBALT (CO) AND PLATINUM (PT)-BASED MULTILAYER THIN FILM HAVING INVERTED STRUCTURE AND METHOD FOR MANUFACTURING SAME
    • 具有反相结构的钴(CO)和铂(PT) - 多层膜薄膜及其制造方法
    • US20150115379A1
    • 2015-04-30
    • US14403058
    • 2012-06-26
    • Sang Ho LimTae Young LeeSeong Rae LeeDong-Su Son
    • Sang Ho LimTae Young LeeSeong Rae LeeDong-Su Son
    • H01L43/10H01L43/02H01L43/12
    • H01L43/10G01R33/098G11C11/161H01F10/123H01F10/3286H01L43/02H01L43/12
    • The present invention relates to a cobalt (Co) and platinum (Pt)-based multilayer thin film having a novel structure and perpendicular magnetic anisotropy, and to a fabrication method thereof. More specifically, the invention relates to a cobalt and platinum-based multilayer thin film having perpendicular magnetic anisotropy (PMA), which includes thin cobalt layers and thin platinum layers alternately deposited over a substrate, and has an inverted structure in which a thickness of the thin cobalt layers is greater than that of the thin platinum layers, and to a fabrication method thereof. The cobalt and platinum-based multilayer thin film has a new structure in which the thickness of a magnetic thin layer is greater than that of a non-magnetic thin layer. The multilayer thin film may be easily applied as a free layer and a pinned layer in a magnetic tunnel junction by controlling the perpendicular magnetic anisotropy energy depending on the thickness ratio of the layers. Also, the multilayer thin film has excellent thermal stability, and thus maintains its PMA energy density even after being subjected to a heat treatment process. In addition, it enables a fine amount of in-plane magnetic anisotropy to be formed by heat treatment so as to reduce the critical current density required for magnetization switching. Therefore, it may be advantageously used for high-performance and high-density MRAM.
    • 本发明涉及具有新颖结构和垂直磁各向异性的钴(Co)和铂(Pt)基多层薄膜及其制造方法。 更具体地,本发明涉及具有垂直磁各向异性(PMA)的钴和铂基多层薄膜,其包括交替沉积在衬底上的薄钴层和薄铂层,并且具有倒置结构,其中, 薄的钴层的厚度大于薄铂层的制造方法。 钴和铂基多层薄膜具有磁性薄层的厚度大于非磁性薄层的厚度的新结构。 通过根据层的厚度比控制垂直磁各向异性能,可以容易地将多层薄膜作为自由层和钉扎层施加在磁性隧道结中。 此外,多层薄膜具有优异的热稳定性,因此即使在经受热处理工艺之后也能保持其PMA能量密度。 此外,通过热处理能够形成精细的面内磁各向异性,从而降低磁化切换所需的临界电流密度。 因此,可以有利地用于高性能和高密度的MRAM。