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    • 4. 发明授权
    • Semiconductor wafer processing system
    • 半导体晶圆处理系统
    • US6089763A
    • 2000-07-18
    • US139270
    • 1998-08-25
    • Jin-Young ChoiHee-Young KangKyung-Dae ParkTae-Su KimJun-Seong LeeDong-Ho KimSung-Yun KangJai-Moon RyuHan-Kil Kang
    • Jin-Young ChoiHee-Young KangKyung-Dae ParkTae-Su KimJun-Seong LeeDong-Ho KimSung-Yun KangJai-Moon RyuHan-Kil Kang
    • H01L21/027H01L21/677G03D5/00H01L21/00
    • H01L21/67778Y10S414/135
    • A semiconductor wafer processing system having a multi-layered arrangement of wafer processing units included in a spinner to carry out photoresist coating and developing processes for the formation of micro patterns on semiconductor wafers, thereby enabling an easy increase in those processing units coping with an introduction of new processes without increasing the occupying space of the processing units, while being capable of achieving accurate wafer feeding and loading operations, and minimizing the consumption of a chemical solvent coated over wafers. The system includes groups of modules each being selected from first and second modules. The first module includes a plurality of bake units each having bake boxes arranged in a multi-layered fashion, the bake units being arranged adjacent to one another in the wafer feeding direction, and a spin unit, such as a spine coater or a spine developer, fixedly mounted on the bake units. The second module includes a plurality of wafer edge exposure units arranged in a multi-layered fashion while being arranged in such a fashion that they are adjacent to one another in the wafer feeding direction, and a spin unit fixedly mounted on the wafer edge exposure units. Each module group constitute a station, together with a feeding robot. A feeing interface or buffer stocker is arranged between adjacent stations.
    • 一种半导体晶片处理系统,其具有包括在旋转器中的晶片处理单元的多层布置,以执行光致抗蚀剂涂层和用于在半导体晶片上形成微图案的显影工艺,从而使得能够容易地增加处理单元以应对导入 的新工艺,而不增加处理单元的占用空间,同时能够实现精确的晶片进给和加载操作,并且使涂覆在晶片上的化学溶剂的消耗最小化。 该系统包括从第一和第二模块中选择的模块组。 第一模块包括多个烘烤单元,每个烘烤单元具有以多层方式布置的烘箱,烘烤单元在晶片进给方向上彼此相邻布置,并且旋转单元例如脊柱涂布机或脊柱显影剂 ,固定在烘烤单元上。 第二模块包括以多层方式布置的多个晶片边缘曝光单元,其排列方式使得它们在晶片馈送方向上彼此相邻,并且固定地安装在晶片边缘曝光单元上的旋转单元 。 每个模块组与进给机器人一起构成一个工位。 在相邻站之间安排一个费用接口或缓冲存储器。