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1. 发明授权

US08622013B2 Sailboard step design with less ventilation and increased speed 有权
标题翻译：帆板踏步设计，通风较少，速度更快
公开(公告)号：US08622013B2
公开(公告)日：2014-01-07
申请号：US13119035
申请日：2009-09-16
申请人： John H. Keller
发明人： John H. Keller
IPC分类号： B63B1/32
CPC分类号： B63B1/18
摘要： A step shape in a planing hull for water craft and more particularly for sailboards, surfboard or PWC for increasing the lift in front of the step and decreasing it in back at high planing speed, which has dynamic lift directly behind the step when the hull is traveling at a transition speed between displacement mode and planing mode, but at high planing speed it does not have lift directly behind the step. The hull has increased speed because the lift behind the step at transition speed allows the position of the step to be moved forward and in one embodiment has cambered surface (9) in front of the step. This step does not go across the full width of the hull such that there is a continuous planing surface in front of the fins or other means, which it is desirous that they not ventilate, and fin or other means has more ventilation resistance in another embodiment.
摘要翻译：在水上工艺的平面船体中形成一个台阶，特别是帆板，冲浪板或PWC，用于增加台阶前的升力，并以高刨削速度将其降低回来，当船体为以位移模式和刨削模式之间的过渡速度行驶，但是在高刨床速度下，它不会直接在踏板后面。船体具有增加的速度，因为在转变速度之后的踏板上的升力允许台阶的位置向前移动，并且在一个实施例中在台阶前面具有弧形表面（9）。该步骤不会穿过船体的整个宽度，使得在翼片或其他装置前面存在连续的刨削表面，这是希望它们不通风的，并且翅片或其它装置在另一个实施例中具有更多的通风阻力。

2. 发明授权

US06595151B2 Planing sailboard 有权
公开(公告)号：US06595151B2
公开(公告)日：2003-07-22
申请号：US09867437
申请日：2001-05-31
申请人： John H. Keller
发明人： John H. Keller
IPC分类号： B63B3500
CPC分类号： B63B1/20 , B63B35/7906 , B63B35/792 , B63B35/7926 , B63B35/7953 , B63B2001/201 , B63B2001/202 , B63B2001/206
摘要： High performance of a sailboard is achieved over a wider range of wind and water conditions by providing a hull having two or more planing surfaces which may differ in shape and/or aspect ratio. Drag due to suction at steps between planing surfaces is reduced by venting to the air. Cusp shaping of the respective planing surfaces can reduce and stabilize the angle of attack at the displacement/planing transition without causing fore-and-aft pitching effects known as porpoising.

3. 发明授权

US06323493B1 Increased ion beam throughput with reduced beam divergence in a dipole magnet 失效
标题翻译：增加离子束通量，减少偶极子磁体中的光束发散
公开(公告)号：US06323493B1
公开(公告)日：2001-11-27
申请号：US09383772
申请日：1999-08-26
申请人： John H. Keller , Kathleen J. Keller
发明人： John H. Keller , Kathleen J. Keller
IPC分类号： H01J3700
CPC分类号： H01J37/3266 , H01J37/04
摘要： Spreading of an ion beam when passing through a dipole magnet is reduced or suppressed by electrostatic ion beam confinement which supplements magnetic confinement which may be provided. The magnetic confinement is enhanced by the provision of a magnetic mirror through concentration and localized increase of the dipole field with a concave profile of the pole pieces faces and/or provision of permanent magnets or localized regions of material of increased permeability to form magnetic cusps. Pitch and geometry of convex portions of the pole piece faces are adjusted to increase the mirror ratio and the location of the maximum mirror field relative to the thickness of a graphite or insulating liner which may be employed. Electrostatic confinement elements in the form of negatively charged electrodes and/or electrically isolated electrodes or insulators which assume a negative charge. Ionization of plasma between the pole pieces may be enhanced by application of a VHF/UHF field having a frequency of about 40 MHz to 100 MHZ or higher.
摘要翻译：当通过偶极子磁体时，离子束的扩散通过静电离子束限制被减少或抑制，这补充了可以提供的磁约束。通过集中提供磁镜并通过极片面的凹形轮廓和/或提供永久磁体或增加渗透性的材料的局部区域形成磁尖来提供磁镜来增强磁约束。调节极片面的凸起部分的几何形状和镜片面的几何形状，以增大镜面比率和最大镜面相对于可采用的石墨或绝缘衬垫的厚度的位置。具有带负电荷的电极和/或电隔离电极或绝缘体形式的静电限制元件，其承担负电荷。可以通过施加具有约40MHz至100MHz或更高频率的VHF / UHF场来增强极片之间的等离子体的电离。

4. 发明授权

US6028394A Cold electron plasma reactive ion etching using a rotating electromagnetic filter 失效
标题翻译：使用旋转电磁滤波器的冷电子等离子体反应离子蚀刻
公开(公告)号：US6028394A
公开(公告)日：2000-02-22
申请号：US47095
申请日：1998-03-24
申请人： John H. Keller , Dennis K. Coultas
发明人： John H. Keller , Dennis K. Coultas
IPC分类号： H01L21/302 , H01J37/32 , H01L21/3065 , H05H1/46
CPC分类号： H01J37/321 , H01J37/3266 , H01J37/32678
摘要： An apparatus and method for producing a cold electron plasma for etching a work piece. An electromagnetic wave is generated at a first frequency to produce a plasma in a hot plasma region of the etching chamber, the plasma having positive ions, cold electrons, and hot electrons. A plurality of magnetic coils are disposed about the perimeter of the etching chamber for generating a rotating magnetic field with an electron cyclotron resonance at a second frequency. The rotating magnetic field has a magnetic potential such that the rotating magnetic field: (i) allows the positive ions and the cold electrons to diffuse from the plasma through the rotating magnetic field to produce the cold electron plasma in a cold plasma region over the work piece, and (ii) inhibits the hot electrons from the plasma from diffusing through the rotating magnetic field to the cold electron plasma.
摘要翻译：一种用于制造用于蚀刻工件的冷电子等离子体的装置和方法。在第一频率产生电磁波，以在蚀刻室的热等离子体区域产生等离子体，等离子体具有正离子，冷电子和热电子。围绕蚀刻室的周边设置多个磁性线圈，用于产生具有第二频率的电子回旋共振的旋转磁场。旋转磁场具有磁电势，使得旋转磁场：（i）允许正离子和冷电子从等离子体扩散通过旋转磁场，以在工作中的冷等离子体区域中产生冷电子等离子体并且（ii）抑制来自等离子体的热电子通过旋转磁场扩散到冷电子等离子体。

5. 发明授权

US5587045A Gettering of particles from an electro-negative plasma with insulating chuck 失效
标题翻译：用绝缘卡盘从电 - 负等离子体吸取颗粒
公开(公告)号：US5587045A
公开(公告)日：1996-12-24
申请号：US430040
申请日：1995-04-27
申请人： John H. Keller , Gregory Costrini
发明人： John H. Keller , Gregory Costrini
IPC分类号： H01J37/32 , H01L21/306
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32623 , H01J37/32706 , H01J37/32963
摘要： Apparatus controls a wafer potential in a plasma system when the plasma is off to keep the wafer slightly negative at all times in order to reduce and eliminate the collection of charged particles on the wafer. The apparatus allows the wafer bias to be reduced to a small negative voltage and then holds that voltage. This greatly reduces the net positive flux to the wafer. A diode and a programmed power supply hold a minimum negative voltage on the back of the wafer electrode when the plasma density is decaying to zero.
摘要翻译：当等离子体关闭时，设备控制等离子体系统中的晶圆电位，以使晶片始终保持微小的负值，以便减少和消除晶片上带电粒子的收集。该装置允许将晶片偏压降低到小的负电压，然后保持该电压。这大大降低了晶片的净正通量。当等离子体密度衰减到零时，二极管和编程电源在晶片电极的背面保持最小的负电压。

6. 发明授权

US5561585A Electrostatic chuck with reference electrode 失效
公开(公告)号：US5561585A
公开(公告)日：1996-10-01
申请号：US470612
申请日：1995-06-06
申请人： Michael S. Barnes , John H. Keller , Joseph S. Logan , Robert E. Tompkins , Robert P. Westerfield, Jr.
发明人： Michael S. Barnes , John H. Keller , Joseph S. Logan , Robert E. Tompkins , Robert P. Westerfield, Jr.
IPC分类号： B23Q3/15 , H01L21/683 , H02N13/00
CPC分类号： H02N13/00 , H01L21/6831 , Y10T279/23
摘要： An electrostatic chuck has its electrodes biased with respect to the self-bias potential induced by the plasma on the wafer, thereby providing improved resistance to breakdown in spite of variation of the wafer potential during processing. An alternate embodiment further suppresses the formation of vacuum arcs between the back of the wafer being processed and the body of the chuck by the interposition of a conductive guard ring at the self-bias potential, thereby defining an equipotential area between the closest electrode and the wafer.

7. 发明授权

US5467249A Electrostatic chuck with reference electrode 失效
标题翻译：带参考电极的静电吸盘
公开(公告)号：US5467249A
公开(公告)日：1995-11-14
申请号：US169903
申请日：1993-12-20
申请人： Michael S. Barnes , John H. Keller , Joseph S. Logan , Robert E. Tompkins , Robert P. Westerfield, Jr.
发明人： Michael S. Barnes , John H. Keller , Joseph S. Logan , Robert E. Tompkins , Robert P. Westerfield, Jr.
IPC分类号： B23Q3/15 , H01L21/683 , H02N13/00
CPC分类号： H02N13/00 , H01L21/6831 , Y10T279/23
摘要： An electrostatic chuck has its electrodes biased with respect to the self-bias potential induced by the plasma on the wafer, thereby providing improved resistance to breakdown in spite of variation of the wafer potential during processing, further suppressing the formation of vacuum arcs between the back of the wafer being processed and the body of the chuck by the interposition of a conductive guard ring at the self-bias potential, thereby defining an equipotential area between the closest electrode and the wafer.
摘要翻译：静电卡盘的电极相对于由晶片上的等离子体引起的自偏置电位偏置，从而提供改进的击穿耐性，尽管在处理期间晶片电位发生变化，进一步抑制了背面之间的真空电弧的形成通过插入导电保护环处于自偏压电位，从而在最近的电极和晶片之间限定等电位区域来处理正在处理的晶片和卡盘的主体。

8. 发明授权

US5206516A Low energy, steered ion beam deposition system having high current at low pressure 失效
标题翻译：在低压下具有高电流的低能量，转向离子束沉积系统
公开(公告)号：US5206516A
公开(公告)日：1993-04-27
申请号：US692589
申请日：1991-04-29
申请人： John H. Keller , Dennis K. Coultas
发明人： John H. Keller , Dennis K. Coultas
IPC分类号： H01J37/141 , H01J37/05 , H01J37/317 , H01L21/265 , H01L21/268
CPC分类号： H01J37/05 , H01J37/3178 , H01J2237/0041 , H01J2237/055
摘要： An ion beam deposition system in which ions of different masses and from different sources are independently steered into different parts of an analyzer magnet to be converged into a single wide beam which maintains a perpendicular relationship between the beam and the target. The beam is decelerated by a slit type deceleration lens to an energy suitable for deposition. The target is then scanned across the decelerated beam. The beam is maintained at high current and low pressure by confining electrons away from the magnet and/or adding energy to the low pressure atmosphere inside the analyzer magnet to produce a plasma of electrons and charged particles in order to provide adequate neutralizing of the space charge of the beam.
摘要翻译：一种离子束沉积系统，其中不同质量和不同源的离子被独立地转导到分析器磁体的不同部分中，以被聚集成单个宽光束，其维持光束和目标之间的垂直关系。光束通过狭缝式减速透镜减速到适于沉积的能量。然后将目标扫描在减速梁上。通过将电子限制在远离磁体的位置和/或向分析器磁体内部的低压气氛中增加能量，将光束保持在高电流和低压，以产生电子和带电粒子的等离子体，以便提供足够的中和空间电荷的梁。

9. 发明申请

US20130298813A1 SAILBOARD WITH SLOTTED WINGLETS 审中-公开
标题翻译：带有楔形手镯的舷梯
公开(公告)号：US20130298813A1
公开(公告)日：2013-11-14
申请号：US13946798
申请日：2013-07-19
申请人： John H. Keller
发明人： John H. Keller
IPC分类号： B63B35/79 , B63B1/26 , B63B1/24
CPC分类号： B63B35/7923 , B63B1/20 , B63B1/24 , B63B1/26 , B63B35/7906 , B63B35/7953
摘要： A sailboard hull has at least one pair of winglets or foils beneath the top of the board. Each winglet or foil has above it a slot and allows dynamic lift from both the top and bottom surface of the winglet and reduction of drag when the board is traveling at a transition speed between displacement mode and planing mode. At high planing speed it does not normally have lift from the top surface of the winglet. There may be multiple pairs of winglets or foils. Back slots may be provided at the rear of the sailboard hull providing a higher ratio of winglet width to maximum hull width. A top slot may cover at least half the winglet area, and a winglet may have a camber/slope step on the planing surface.
摘要翻译：帆板船体在板的顶部至少有一对小翼或箔片。每个小翼或箔片上方都有一个槽，并允许从小翼的顶部和底部表面进行动态提升，并且当板在位移模式和刨削模式之间的过渡速度下行进时减少阻力。在高刨光速度下，通常不会从小翼的顶面提起电梯。可能有多对小翼或箔。后槽可以设置在帆板船体的后部，提供较小的小翼宽度与最大船体宽度的比率。顶部狭槽可以覆盖小翼区域的至少一半，并且小翼可以在刨削表面上具有外倾/斜坡台阶。

10. 发明申请

US20110197798A1 SAILBOARD STEP DESIGN WITH LESS VENTILATION AND INCREASED SPEED 有权
标题翻译： SAILBOARD步进设计，通风不便，速度更快
公开(公告)号：US20110197798A1
公开(公告)日：2011-08-18
申请号：US13119035
申请日：2009-09-16
申请人： John H. Keller
发明人： John H. Keller
IPC分类号： B63B1/16 , B63B35/79
CPC分类号： B63B1/18
摘要： A step shape in a planing hull for water craft and more particularly for sailboards, surfboard or PWC for increasing the lift in front of the step and decreasing it in back at high planing speed, which has dynamic lift directly behind the step when the hull is traveling at a transition speed between displacement mode and planing mode, but at high planing speed it does not have lift directly behind the step. The hull has increased speed because the lift behind the step at transition speed allows the position of the step to be moved forward and in one embodiment has cambered surface (9) in front of the step. This step does not go across the full width of the hull such that there is a continuous planing surface in front of the fins or other means, which it is desirous that they not ventilate, and fin or other means has more ventilation resistance in another embodiment.
摘要翻译：在水上工艺的平面船体中形成一个台阶，特别是帆板，冲浪板或PWC，用于增加台阶前的升力，并以高刨削速度将其降低回来，当船体为以位移模式和刨削模式之间的过渡速度行驶，但是在高刨床速度下，它不会直接在踏板后面。船体具有增加的速度，因为在转变速度之后的踏板上的升力允许台阶的位置向前移动，并且在一个实施例中在台阶前面具有弧形表面（9）。该步骤不会穿过船体的整个宽度，使得在翼片或其他装置前面存在连续的刨削表面，这是希望它们不通风的，并且翅片或其它装置在另一个实施例中具有更多的通风阻力。

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