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    • 3. 发明授权
    • Semiconductor integrated circuit protectant incorporating cold cathode
field emission
    • 包含冷阴极场致发射的半导体集成电路保护器
    • US5416355A
    • 1995-05-16
    • US116216
    • 1993-09-02
    • Hitoshi Kudoh
    • Hitoshi Kudoh
    • H01L23/58H01L23/48H01L29/46H01L29/60H01L29/62
    • H01L23/585H01L2924/0002
    • An electronic element is provided which includes a pair of electrodes (referred to as facing electrodes) formed within the groove of an insulating film on the substrate, the end portions of the electrodes being separated and facing each other in the groove. When a voltage of a predetermined value or more is applied between the facing electrodes, there occurs a cold cathode emission which causes a flow of electrons from one of the electrodes to the other. At that time, the facing electrodes are melted by heat generated by the applied voltage, and either a short circuit or insulation between the facing electrodes, is attained, depending on the selected structure of the element. In this way, the electronic element of the present invention can perform the protection of semiconductor devices and semiconductor circuits. Also, the electronic element of the present invention can perform the operation of selecting a desired load resistance to be applied to a specific circuit.
    • 提供一种电子元件,其包括形成在基板上的绝缘膜的沟槽内的一对电极(称为对置电极),电极的端部在沟槽中彼此分离并面对。 当在相对电极之间施加预定值以上的电压时,会发生冷阴极发射,导致电子从一个电极流向另一个电极。 此时,由所施加的电压产生的热量使面对的电极熔化,并且取决于所选择的元件的结构,实现面对电极之间的短路或绝缘。 以这种方式,本发明的电子元件可以执行半导体器件和半导体电路的保护。 此外,本发明的电子元件也可以进行选择要施加到特定电路的期望负载电阻的操作。
    • 4. 发明授权
    • Semiconductor device
    • 半导体器件
    • US5331192A
    • 1994-07-19
    • US937440
    • 1992-08-27
    • Hitoshi Kudoh
    • Hitoshi Kudoh
    • H01L27/088H01L27/02
    • H01L27/088
    • A semiconductor device includes plural transistors in which the transistors themselves share a gate and a channel region and posses three or more source and drain regions. In such a configuration, a drain current is determined by the voltage application condition (potential difference of all source and drain regions). Therefore, assuming one of the three source and drain regions to be a control terminal (disturbance terminal) instability or drift of the transistor operation may be intentionally produced by applying proper voltages to each of the three source and drain regions.
    • 半导体器件包括晶体管本身共享栅极和沟道区域并且具有三个或更多个源极和漏极区域的多个晶体管。 在这种结构中,漏极电流由电压施加条件(所有源极和漏极区域的电位差)决定。 因此,通过对三个源极和漏极区域中的每一个施加适当的电压,可以有意地产生三个源极和漏极区域中的一个作为控制端子(干扰端子)的不稳定性或晶体管工作的漂移。