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1. 发明授权

US07862646B2 Nanoporous articles and methods of making same 有权
标题翻译：纳米制品及其制作方法
公开(公告)号：US07862646B2
公开(公告)日：2011-01-04
申请号：US12182880
申请日：2008-07-30
申请人： J. Donald Carruthers , Frank Dimeo, Jr. , Brian Bobita
发明人： J. Donald Carruthers , Frank Dimeo, Jr. , Brian Bobita
IPC分类号： B01D53/02 , B01J20/20
CPC分类号： B01D53/0415 , B01D53/0446 , B01D2253/102 , B01D2253/1122 , B01D2253/202 , B01D2253/308 , B01D2253/311 , B01D2253/342 , B01D2256/24 , B01D2257/30 , B01D2258/0216 , B01D2259/40096 , B01D2259/4146 , B01D2259/4525 , B01D2259/455 , B01J20/20 , B01J20/28011 , B01J20/28014 , B01J20/28023 , B01J20/28033 , B01J20/28042 , B01J20/28052 , B01J20/2808 , B01J20/28097 , B01J2220/66 , B82Y30/00 , C01B3/0021 , C01B13/0251 , C10G25/003 , C10G45/02 , C10G67/06 , C10G2300/1033 , C10G2300/1044 , C10G2300/1051 , C10G2300/1055 , C10G2300/202 , C10G2300/207 , F17C11/00 , F17C11/007 , Y02E60/321 , Y02E60/325 , Y10S95/903 , Y10T428/249956 , Y10T428/249957
摘要： An adsorbent having porosity expanded by contact with a first agent effecting such expansion and a pressurized second agent effecting transport of the first agent into the porosity, wherein the adsorbent subsequent to removal of the first and second agents retains expanded porosity. The adsorbent can be made by an associated method in which materials such as water, ethers, alcohols, organic solvent media, or inorganic solvent media can be utilized as the first agent for swelling of the porosity, and helium, argon, krypton, xenon, neon, or other inert gases can be employed as the pressurized second agent for transport of both agents into the porosity of the adsorbent, subsequent to which the agents can be removed to yield an adsorbent of increased capacity for sorbable fluids, e.g., organometallic compounds, hydrides, halides and acid gases. Also described is a nanoporous carbon composite having porosity that is at least partially filled with material imparting to the composite an enhanced character with respect to characteristics selected from the group consisting of hardness, wear-resistance and toughness, as compared with the nanoporous carbon alone.
摘要翻译：具有通过与实现这种膨胀的第一试剂接触膨胀的孔隙率的吸附剂和影响第一试剂输送到孔隙中的加压第二试剂，其中除去第一和第二试剂后的吸附剂保持膨胀的孔隙率。吸附剂可以通过相关的方法制备，其中可以使用诸如水，醚，醇，有机溶剂介质或无机溶剂介质的材料作为用于膨胀孔隙率的第一试剂，以及氦，氩，氪，氙，氖气或其它惰性气体可以用作用于将两种试剂输送到吸附剂的孔隙中的加压第二试剂，随后可以除去试剂以产生增加可吸收流体例如有机金属化合物的能力的吸附剂，氢化物，卤化物和酸性气体。还描述了一种具有孔隙率的纳米多孔碳复合材料，与纳米多孔碳相比，至少部分地填充有赋予复合材料的材料相对于选自硬度，耐磨性和韧性的特性而具有增强特性。

2. 发明授权

US07080545B2 Apparatus and process for sensing fluoro species in semiconductor processing systems 失效
标题翻译：用于在半导体处理系统中感测氟物质的装置和方法
公开(公告)号：US07080545B2
公开(公告)日：2006-07-25
申请号：US10273036
申请日：2002-10-17
申请人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
发明人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
IPC分类号： G01N9/00
CPC分类号： G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
摘要： A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
摘要翻译：用于检测含有其的气体中的含氟物质的气体检测器和方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的检测器结构布置采用基于微机电系统（MEMS）的器件结构和/或独立的金属元件，其在需要高温感测时用作感测部件并且可选地作为热源。独立的金属元件可以直接制造在标准芯片载体/器件封装上，使得封装成为检测器的平台。

3. 发明授权

US06265222B1 Micro-machined thin film hydrogen gas sensor, and method of making and using the same 有权
标题翻译：微加工薄膜氢气传感器及其制造和使用方法
公开(公告)号：US06265222B1
公开(公告)日：2001-07-24
申请号：US09231277
申请日：1999-01-15
申请人： Frank DiMeo, Jr. , Gautam Bhandari
发明人： Frank DiMeo, Jr. , Gautam Bhandari
IPC分类号： G01N700
CPC分类号： G01N27/128 , G01N21/59 , G01N21/783 , G01N27/12 , G01N33/0014 , G01N33/005 , G01N2291/02863 , Y10T436/22
摘要： A hydrogen sensor including a thin film sensor element formed, e.g., by metalorganic chemical vapor deposition (MOCVD) or physical vapor deposition (PVD), on a microhotplate structure. The thin film sensor element includes a film of a hydrogen-interactive metal film that reversibly interacts with hydrogen to provide a correspondingly altered response characteristic, such as optical transmissivity, electrical conductance, electrical resistance, electrical capacitance, magnetoresistance, photoconductivity, etc., relative to the response characteristic of the film in the absence of hydrogen. The hydrogen-interactive metal film may be overcoated with a thin film hydrogen-permeable barrier layer to protect the hydrogen-interactive film from deleterious interaction with non-hydrogen species. The hydrogen sensor of the invention may be usefully employed for the detection of hydrogen in an environment susceptible to the incursion or generation of hydrogen and may be conveniently configured as a hand-held apparatus.
摘要翻译：一种氢传感器，其包括例如通过金属有机化学气相沉积（MOCVD）或物理气相沉积（PVD）形成在薄板结构上的薄膜传感器元件。薄膜传感器元件包括与氢可逆地相互作用的氢相互作用金属膜的膜，以提供相对改变的响应特性，例如光透射率，电导率，电阻，电容，磁电阻，光电导等等在不存在氢气的情况下对膜的响应特性。氢相互作用金属膜可以用薄膜氢可渗透阻挡层进行外涂，以保护氢相互作用膜免受与非氢物质的有害相互作用。本发明的氢传感器可有效地用于在易于入侵或产生氢的环境中检测氢气，并且可以方便地配置为手持设备。

4. 发明授权

US07966879B2 Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel 有权
标题翻译：流体储存和分配系统包括流体储存和分配容器的动态流体监测
公开(公告)号：US07966879B2
公开(公告)日：2011-06-28
申请号：US11577864
申请日：2005-10-24
申请人： James Dietz , Steven E. Bishop , James V. McManus , Steven M. Lurcott , Michael J. Wodjenski , Robert Kaim , Frank Dimeo, Jr.
发明人： James Dietz , Steven E. Bishop , James V. McManus , Steven M. Lurcott , Michael J. Wodjenski , Robert Kaim , Frank Dimeo, Jr.
IPC分类号： G01F23/00
CPC分类号： G01N33/00 , F17C11/00 , G01F15/063 , G01F22/02 , G01F23/0076 , G01M3/32 , G01M3/3236 , G06Q10/087 , G06Q30/04 , G06Q50/04 , H01L21/561 , H01L21/568 , H01L21/6835 , H01L22/10 , H01L23/5389 , H01L24/24 , H01L24/48 , H01L24/82 , H01L25/03 , H01L25/0652 , H01L25/16 , H01L2224/16225 , H01L2224/16227 , H01L2224/24011 , H01L2224/2518 , H01L2224/48091 , H01L2224/48227 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01058 , H01L2924/01076 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/09701 , H01L2924/14 , H01L2924/19042 , H05K1/185 , H05K3/4602 , H05K2203/0165 , H05K2203/085 , H05K2203/1469 , Y02P90/30 , Y10T29/4913 , Y10T29/49133 , Y10T29/49165 , Y10T29/53183 , H01L2224/45099
摘要： A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.
摘要翻译：一种用于在操作期间监测流体供应容器（22,24,26,28,108）中的流体的监测系统（100），包括从所述流体供应容器分配流体。监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器（114,126），（ii）可操作地耦合到一个的数据采集模块（40,132,146）或多个传感器以从其接收监测数据并且响应地产生与由所述一个或多个传感器监测的特性相关的输出，以及（iii）处理器（50,150）和显示器（52,150），其与所述数据采集模块并且被布置成处理来自数据采集模块的输出并且响应地输出流体供应容器中的流体的图形表示，计费凭证，使用报告和/或再供应请求。

5. 发明授权

US5972430A Digital chemical vapor deposition (CVD) method for forming a multi-component oxide layer 失效
标题翻译：用于形成多组分氧化物层的数字化学气相沉积（CVD）方法
公开(公告)号：US5972430A
公开(公告)日：1999-10-26
申请号：US979465
申请日：1997-11-26
申请人： Frank DiMeo, Jr. , Steven M. Bilodeau , Peter C. Van Buskirk
发明人： Frank DiMeo, Jr. , Steven M. Bilodeau , Peter C. Van Buskirk
IPC分类号： C23C16/40 , C23C16/44 , C23C16/455
CPC分类号： C23C16/409 , C23C16/45531
摘要： A chemical vapor deposition (CVD) method for forming a multi-component oxide layer. There is first provided a chemical vapor deposition (CVD) reactor chamber. There is then positioned within the chemical vapor deposition (CVD) reactor chamber a substrate. There is then formed over the substrate a multi-component oxide precursor layer. The multi-component oxide precursor layer is formed from at minimum a first precursor reactant source material and a second precursor reactant source material introduced simultaneously into the chemical vapor deposition (CVD) reactor chamber in absence of an oxidant reactant source material. There is then oxidized with the oxidant reactant source material within the chemical vapor deposition (CVD) reactor chamber the multi-component oxide precursor layer formed over the substrate to form a multi-component oxide layer formed over the substrate. The oxidant reactant source material is introduced into the chemical vapor deposition (CVD) reactor chamber in absence of the first precursor reactant source material and the second precursor reactant source material.
摘要翻译：一种用于形成多组分氧化物层的化学气相沉积（CVD）方法。首先提供化学气相沉积（CVD）反应室。然后在化学气相沉积（CVD）反应器室内定位一个衬底。然后在衬底上形成多组分氧化物前体层。多组分氧化物前体层由不存在氧化剂反应物源材料的至少第一前体反应物源材料和同时引入化学气相沉积（CVD）反应器室的第二前体反应物源材料形成。然后在化学气相沉积（CVD）反应器室内用氧化剂反应物源材料氧化形成在衬底上的多组分氧化物前体层，以形成在衬底上形成的多组分氧化物层。在不存在第一前体反应物源材料和第二前体反应物源材料的情况下，氧化剂反应物源材料被引入到化学气相沉积（CVD）反应器室中。

6. 发明授权

US08555705B2 Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel 有权
公开(公告)号：US08555705B2
公开(公告)日：2013-10-15
申请号：US13171434
申请日：2011-06-28
申请人： James Dietz , Steven E. Bishop , James V. McManus , Steven M. Lurcott , Michael J. Wodjenski , Robert Kaim , Frank Dimeo, Jr.
发明人： James Dietz , Steven E. Bishop , James V. McManus , Steven M. Lurcott , Michael J. Wodjenski , Robert Kaim , Frank Dimeo, Jr.
IPC分类号： G01N33/487
CPC分类号： G01N33/00 , F17C11/00 , G01F15/063 , G01F22/02 , G01F23/0076 , G01M3/32 , G01M3/3236 , G06Q10/087 , G06Q30/04 , G06Q50/04 , H01L21/561 , H01L21/568 , H01L21/6835 , H01L22/10 , H01L23/5389 , H01L24/24 , H01L24/48 , H01L24/82 , H01L25/03 , H01L25/0652 , H01L25/16 , H01L2224/16225 , H01L2224/16227 , H01L2224/24011 , H01L2224/2518 , H01L2224/48091 , H01L2224/48227 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01058 , H01L2924/01076 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/09701 , H01L2924/14 , H01L2924/19042 , H05K1/185 , H05K3/4602 , H05K2203/0165 , H05K2203/085 , H05K2203/1469 , Y02P90/30 , Y10T29/4913 , Y10T29/49133 , Y10T29/49165 , Y10T29/53183 , H01L2224/45099
摘要： A monitoring system for monitoring fluid in a fluid supply vessel during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor and display operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.

7. 发明授权

US08109130B2 Apparatus and process for sensing fluoro species in semiconductor processing systems 有权
标题翻译：用于在半导体处理系统中感测氟物质的装置和方法
公开(公告)号：US08109130B2
公开(公告)日：2012-02-07
申请号：US12537910
申请日：2009-08-07
申请人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
发明人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
IPC分类号： G01N33/00
CPC分类号： G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
摘要： A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
摘要翻译：用于检测含有其的气体中的含氟物质的气体检测器和方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的结构布置中的检测器采用微机电系统（MEMS））的器件结构和/或独立的金属元件，其在需要升高的温度感测时用作感测部件并且可选地作为热源。独立的金属元件可以直接制造在标准芯片载体/器件封装上，使得封装成为检测器的平台。

8. 发明授权

US07475588B2 Apparatus and process for sensing fluoro species in semiconductor processing systems 有权
标题翻译：用于在半导体处理系统中感测氟物质的装置和方法
公开(公告)号：US07475588B2
公开(公告)日：2009-01-13
申请号：US11057734
申请日：2005-02-14
申请人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawacz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
发明人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawacz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
IPC分类号： G01N9/00
CPC分类号： G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
摘要： A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
摘要翻译：用于检测含有其的气体中的含氟物质的气体检测器和方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的结构布置中的检测器采用微机电系统（MEMS））的器件结构和/或独立的金属元件，其在需要升高的温度感测时用作感测部件并且可选地作为热源。独立的金属元件可以直接制造在标准芯片载体/器件封装上，使得封装成为检测器的平台。

9. 发明授权

US07370511B1 Gas sensor with attenuated drift characteristic 有权
标题翻译：具有衰减漂移特性的气体传感器
公开(公告)号：US07370511B1
公开(公告)日：2008-05-13
申请号：US10795529
申请日：2004-03-08
申请人： Ing-Shin Chen , Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Bryan Hendrix
发明人： Ing-Shin Chen , Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Bryan Hendrix
IPC分类号： G01N33/00
CPC分类号： G01N33/005 , G01N27/128
摘要： A sensor with an attenuated drift characteristic, including a layer structure in which a sensing layer has a layer of diffusional barrier material on at least one of its faces. The sensor may for example be constituted as a hydrogen gas sensor including a palladium/yttrium layer structure formed on a micro-hotplate base, with a chromium barrier layer between the yttrium layer and the micro-hotplate, and with a tantalum barrier layer between the yttrium layer and an overlying palladium protective layer. The gas sensor is useful for detection of a target gas in environments susceptible to generation or incursion of such gas, and achieves substantial (e.g., >90%) reduction of signal drift from the gas sensor in extended operation, relative to a corresponding gas sensor lacking the diffusional barrier structure of the invention.
摘要翻译：具有衰减漂移特性的传感器，包括其中感测层在其至少一个面上具有扩散阻挡材料层的层结构。传感器例如可以构成为包括形成在微电镀基板上的钯/钇层结构的氢气传感器，钇层和微电镀板之间的铬阻挡层，以及在钇层和覆盖钯保护层。气体传感器可用于在易于产生或侵入这种气体的环境中检测目标气体，并且相对于相应的气体传感器在延长的操作中实现了从气体传感器的信号漂移的实质（例如，> 90％）的减小缺乏本发明的扩散屏障结构。

10. 发明授权

US07296460B2 Apparatus and process for sensing fluoro species in semiconductor processing systems 有权
标题翻译：用于在半导体处理系统中感测氟物质的装置和方法
公开(公告)号：US07296460B2
公开(公告)日：2007-11-20
申请号：US11057594
申请日：2005-02-14
申请人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
发明人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
IPC分类号： G01N7/00
CPC分类号： G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
摘要： A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
摘要翻译：用于检测含有其的气体中的含氟物质的气体检测器和方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的检测器结构布置采用基于微机电系统（MEMS）的器件结构和/或独立的金属元件，其在需要高温感测时用作感测部件并且可选地作为热源。独立的金属元件可以直接制造在标准芯片载体/器件封装上，使得封装成为检测器的平台。

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