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    • 6. 发明公开
    • 헤드 슬라이더 및 그 제조 방법 및 헤드 슬라이더용 연마장치
    • 头滑块及其制造方法和用于头滑块的研磨装置
    • KR1020080039210A
    • 2008-05-07
    • KR1020070092531
    • 2007-09-12
    • 후지쯔 가부시끼가이샤
    • 오제키마사히로
    • G11B21/21G11B5/60
    • G11B5/3169G11B5/3133G11B5/3166G11B5/607
    • A head slider, a method for making the same, and a grinding apparatus for a head slider are provided to confirm that there is a sure contact between a protection film and a storage medium by measuring a projected volume of a non-magnetic insulating film and setting the projected volume of the non-magnetic insulating film when an even polished surface contacts the storage medium. A storage medium driving device includes a storage medium(14), a slider body(31), a non-magnetic insulating film(32), a rail, a first protection film(48), a second protection film(47), a head element, a heater(66), and a recess. The non-magnetic insulating film is deposited on the free end of the slider body. The rail is formed on the medium-opposed surface of the slider body and extends to reach the free end of the slider body. The first protection film has a non-ground surface. The second protection film is formed continuous from the first protection film. The head element is embedded in the non-magnetic insulating film of the rail. The heater is embedded in the non-magnetic insulating film and is related to the head element. The recess is at least partly defined on the second protection film with respect to the heater. An even polished surface(68) is formed at the second protection film. When the polished surface contacts the storage medium, a control circuit measures the projected volume of the non-magnetic insulating film and sets the projected volume of the non-magnetic insulating film.
    • 提供磁头滑动器,其制造方法和用于磁头滑块的磨削装置,以通过测量非磁性绝缘膜的投射体积来确认保护膜和存储介质之间存在可靠接触,并且 当均匀研磨的表面接触存储介质时,设定非磁性绝缘膜的投影体积。 存储介质驱动装置包括存储介质(14),滑块体(31),非磁性绝缘膜(32),轨道,第一保护膜(48),第二保护膜(47), 头元件,加热器(66)和凹部。 非磁性绝缘膜沉积在滑块体的自由端上。 轨道形成在滑块体的中等相对表面上并延伸到达滑块体的自由端。 第一保护膜具有非地表面。 第二保护膜从第一保护膜连续地形成。 头元件嵌入轨道的非磁性绝缘膜。 加热器嵌入在非磁性绝缘膜中并与头元件有关。 相对于加热器,凹部至少部分地限定在第二保护膜上。 在第二保护膜处形成均匀抛光的表面(68)。 当抛光表面接触存储介质时,控制电路测量非磁性绝缘膜的投射体积并设定非磁性绝缘膜的投射体积。
    • 7. 发明授权
    • 개선된 전기 랩 가이드 배선 구조
    • 개선된전기랩가이드배선구조
    • KR100422436B1
    • 2004-03-12
    • KR1019997003120
    • 1997-01-30
    • 시게이트 테크놀로지 엘엘씨
    • 하오산린엑스스토버랜스이킬비트지
    • G11B5/127B24B49/00
    • B24B37/00B23Q15/02B24B37/048B24B41/06B24B49/02B24B49/10G11B5/102G11B5/1871G11B5/232G11B5/3106G11B5/3116G11B5/313G11B5/3166G11B5/3169G11B5/3903Y10T29/49037
    • PCT No. PCT/US97/01324 Sec. 371 Date Mar. 3, 1997 Sec. 102(e) Date Mar. 3, 1997 PCT Filed Jan. 30, 1997 PCT Pub. No. WO98/18596 PCT Pub. Date May 7, 1998An electrical lap guide (ELG) system and method are disclosed for use in lapping a bar 10 of magnetic transducer carrying sliders to a desired transducer height. A first ELG ELG1 contained within the bar has at least two first ELG resistive elements R11 and R12. A second ELG ELG 2 contained within the bar has at least two second ELG resistive elements R21 and R23. A first of the at least two first ELG resistive elements is electrically coupled to a first of the at least two second ELG resistive elements to thereby reduce a total number of leads needed between a data acquisition unit 100 and the bar 10 during lapping. The reduction in required data acquisition unit 100 leads allow more ELGs to be included on each bar 10 in order to more accurately control the lapping process.
    • PCT No.PCT / US97 / 01324 Sec。 371日期1997年3月3日Sec。 102(e)1997年3月3日PCT提交日期1997年1月30日PCT Pub。 WO98 / 18596 PCT Pub。 日期1998年5月7日公开了一种用于将携带滑块的磁性换能器的杆10研磨到期望的换能器高度的电气式导轨(ELG)系统和方法。 包含在该条内的第一ELG ELG1具有至少两个第一ELG电阻元件R11和R12。 包含在该条内的第二ELG ELG 2具有至少两个第二ELG电阻元件R21和R23。 至少两个第一ELG电阻元件中的第一个电耦合到至少两个第二ELG电阻元件中的第一个,从而减少在研磨期间数据采集单元100和棒10之间所需的引线总数。 所需数据采集单元100引线的减少允许更多ELG被包括在每个杆10上,以便更精确地控制研磨过程。