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    • 1. 发明公开
    • Method of preparing wiping cloth for cleaning semiconductor device
    • 制备清洁半导体器件的擦拭布的方法
    • KR20100122348A
    • 2010-11-22
    • KR20090041344
    • 2009-05-12
    • PINE TEX CO LTD
    • HONG SANG JINLEE KWANG SUKLEE JOON SEOK
    • D06M13/144D03D15/06D06C17/00D06M15/347
    • PURPOSE: A method of preparing wiping cloth for cleaning a semiconductor device is provided to shrink polyamide components for a composite fiber structure by adding a supplement solution to a shrinking processing solution. CONSTITUTION: A complex fiber structure including the two component complex fiber of a polyamide polymer component(B) and a polyester polymer component(A) is prepared. The surface area of the complex fiber structure is increased through an alkali solution. The complex fiber structure is dipped into a shrinking processing solution, and the shrunk complex fiber structure is removed. A supplement solution is added to the shrinking processing solution, and the shrinking ability of the shrinking processing solution is restored.
    • 目的:提供一种制备用于清洁半导体器件的擦拭布的方法,通过向收缩处理溶液添加补充溶液来收缩用于复合纤维结构的聚酰胺组分。 构成:制备包含聚酰胺聚合物组分(B)和聚酯聚合物组分(A)的双组分复合纤维的复合纤维结构体。 复合纤维结构的表面积通过碱溶液增加。 将复合纤维结构浸入收缩处理溶液中,并且除去收缩的复合纤维结构。 在收缩处理液中添加补充溶液,恢复收缩处理液的收缩能力。
    • 2. 发明公开
    • Shrinking solution composition used in the manufacture of wiping cloth for cleaning semiconductor device
    • 用于清洁半导体器件的擦拭布制造中使用的收缩溶液组合物
    • KR20100122351A
    • 2010-11-22
    • KR20090041347
    • 2009-05-12
    • PINE TEX CO LTD
    • HONG SANG JINLEE KWANG SUKLEE JOON SEOK
    • D06M13/144D06M13/256D06M15/347
    • PURPOSE: A shrinking solution composition used in the fabrication of wiping cloth for cleaning a semiconductor device is provided to recycle a shrinking processing solution composition as least 4 times by mixing anionic surfactant, non-ionic surfactant and glycol ether solvent with the shrinking processing solution. CONSTITUTION: A complex fiber structure including the two component complex fiber of a polyamide polymer component(B) and a polyester polymer component(A) is prepared. A shrinking processing solution composition includes mixture 100 weight and water 900 weight. The mixture 100 weight contains benzyl alcohol 80 -90 weight and emulsifying agent 10-20 weight. The emulsifying agent is formed by mixing glycol ether solvent 5-9 weight, non-ion surfactant 3.5-7 weight and anionic surfactant 1.5-3 weight. A polyamide component of a complex fiber structure is shrunk by the shrinking processing solution composition.
    • 目的:提供用于制造用于清洁半导体器件的擦拭布的收缩溶液组合物,通过将阴离子表面活性剂,非离子表面活性剂和二醇醚溶剂与收缩处理溶液混合来再循环收缩处理溶液组合物至少4次。 构成:制备包含聚酰胺聚合物组分(B)和聚酯聚合物组分(A)的双组分复合纤维的复合纤维结构体。 收缩的处理溶液组合物包括混合物100重量和水900重量。 混合物100重量含有80-90重量份的苄醇和10-20重量份的乳化剂。 乳化剂是通过将乙二醇醚溶剂5-9重量,非离子表面活性剂3.5-7重量和阴离子表面活性剂1.5-3重量混合而成的。 复合纤维结构体的聚酰胺成分通过收缩处理液组合物收缩。