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    • 1. 发明公开
    • 리소그래피 적용을 위한 열경화된 언더코트
    • 用于光刻应用的热固化底漆
    • KR1020070029157A
    • 2007-03-13
    • KR1020067021214
    • 2005-03-09
    • 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨.
    • 드비노드비.말리크산제이코갑토마스제이.사루비토마스
    • G03F7/11C09D5/00
    • G03F7/094C09D133/14Y10S430/11Y10S430/111Y10S430/128
    • Thermally curable undercoat composition comprising for producing a bilayer relief image comprising a) a polymer of Structure (I) comprising repeating units of Structure (II), (III), and (IV) wherein each R1 is independently a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms or a halogen atom; L represents a single bond, a -COO- group, or a -CON(R2)- group; R2 represents a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms; M represents a C5-7 cycloalkylene group or an arylene group having from 6 to 18 carbon atoms; W represents a single bond, a - COO- group, -0-, -(C=O)-, or -(SO2)-; R3 represents a hydrogen atom or a linear unsubstituted or substituted alkyl having from 5 to 30 carbon atoms or an unsubstituted or substituted cycloalkyl group having from 5 to 30 carbon atoms, a bridged unsubstituted or substituted alicyclic hydrocarbon group having from 5 to 25 carbon atoms or an unsubstituted or substituted aryl group having from 6 to 18 carbon atoms or an arylalkyl group having from 7 to 18 carbon atoms; n is an integer from 1 to 3, q is an integer from 0 to 3, the sum of n and q being no greater than 5; R4 is a linear or branched or cyclic C1 - C10 alkyl or a halogen group; R5 is an alkyl or branched alkyl or cyclic alkyl or an unsubstituted or substituted alicyclic group, having 5 to 30 carbon atoms or (R60)t R7 group where R6 is a C1-10 linear or branched alkylene group and R7 is linear, branched or cyclic alkyl or an unsubstituted or substituted alicyclic group or an unsubstituted or substituted a romatic or a Ikyl a romatic group having 1 to 30 carbon atoms and t is an integer about 1 to 4; b) a phenolic crosslinker; c) a thermal acid generator (TAG); and d) a solvent. ® KIPO & WIPO 2007
    • 包含用于制备双层浮雕图像的可热固化底涂层组合物,其包含a)包含结构(II),(III)和(IV)的重复单元的结构(I)的聚合物,其中每个R 1独立地为氢原子或烷基 具有1至3个碳原子或卤素原子; L表示单键,-COO-基或-CON(R2) - 基; R2表示氢原子或碳原子数为1〜3的烷基; M表示碳原子数为6〜18的C 5-7亚环烷基或亚芳基。 W表示单键,a-COO-基,-O - , - (C = O) - 或 - (SO2) - ; R 3表示氢原子或具有5至30个碳原子的直链未取代或取代的烷基或具有5至30个碳原子的未取代或取代的环烷基,具有5至25个碳原子的桥接未取代或取代的脂环族烃基或 具有6至18个碳原子的未取代或取代的芳基或具有7至18个碳原子的芳基烷基; n为1〜3的整数,q为0〜3的整数,n和q之和为5以下。 R4是直链或支链或环状的C1-C10烷基或卤素基团; R5是具有5-30个碳原子的烷基或支链烷基或环烷基或未取代或取代的脂环基,或(R60)t R7基,其中R6是C1-10直链或支链亚烷基,R7是直链,支链或支链的 环状烷基或未取代或取代的脂环族基团或未取代或取代的芳族或具有1至30个碳原子的烷基芳基,t为约1至4的整数; b)酚类交联剂; c)热酸生成器(TAG); 和d)溶剂。 ®KIPO&WIPO 2007