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1. 发明授权

KR100387167B1 초저속 경사회전 노광을 이용한 3차원의 미소 구조안테나의 제조방법 失效
标题翻译： 초저속경사회전노광을이용한3차원의미소구조안테나의제조방초
公开(公告)号：KR100387167B1
公开(公告)日：2003-06-12
申请号：KR1020010028897
申请日：2001-05-25
申请人： 한국과학기술연구원
发明人： 문성욱 , 박종연
IPC分类号： H01L51/00
摘要： PURPOSE: A method for fabricating a three-dimensional micro antenna using ultra low-speed gradient rotary exposure is provided to simplify a fabrication process of a structure of three-dimensional micro antenna and a waveguide by using a MEMS(Micro Electro Mechanical System). CONSTITUTION: A sacrificial oxide layer is formed on a semiconductor substrate(100). The first photoresist layer is deposited thereon. The first photoresist layer pattern is formed by using an exposure mask. The first metal layer is deposited thereon. The first photoresist layer pattern is exposed by polishing the first metal layer. A micro structure(110) is formed by removing the sacrificial oxide layer. A polymer layer is deposited on a whole surface of the above structure. The second photoresist layer is deposited thereon. The second photoresist layer pattern is formed by performing a patterning process. A round is formed on a surface of the polymer layer. The second metal layer is deposited thereon. The round of the second metal layer is removed by performing a polishing process. The third metal layer and the third photoresist layer are deposited thereon. The third photoresist layer pattern and the third metal layer pattern are formed by performing the patterning process. The third photoresist layer pattern is removed. A polymer layer pattern is formed. The fourth metal layer(124) is deposited thereon by using an electroless plating method. The third metal layer pattern and the polymer layer pattern are removed from the semiconductor substrate(100) by performing a plasma asher process.
摘要翻译：目的：提供一种使用超低速梯度旋转曝光制造三维微型天线的方法，以通过使用MEMS（微机电系统）简化三维微型天线和波导结构的制造过程。构成：在半导体衬底（100）上形成牺牲氧化物层。第一光致抗蚀剂层沉积在其上。通过使用曝光掩模形成第一光致抗蚀剂层图案。第一金属层沉积在其上。通过抛光第一金属层来暴露第一光致抗蚀剂层图案。通过去除牺牲氧化物层形成微结构（110）。聚合物层沉积在上述结构的整个表面上。第二光致抗蚀剂层沉积在其上。通过执行构图工艺形成第二光致抗蚀剂层图案。圆形形成在聚合物层的表面上。第二金属层沉积在其上。通过执行抛光工艺来去除第二金属层的圆形。第三金属层和第三光致抗蚀剂层沉积在其上。通过执行构图工艺形成第三光致抗蚀剂层图案和第三金属层图案。第三光致抗蚀剂层图案被去除。形成聚合物层图案。通过使用无电电镀方法在其上沉积第四金属层（124）。通过执行等离子体灰化工艺从半导体衬底（100）去除第三金属层图案和聚合物层图案。

2. 发明公开

KR1020020097425A 초저속 경사 회전 노광장치 无效
标题翻译：超低速斜坡旋转曝光装置
公开(公告)号：KR1020020097425A
公开(公告)日：2002-12-31
申请号：KR1020010035359
申请日：2001-06-21
申请人： 한국과학기술연구원
发明人： 문성욱 , 박종연
IPC分类号： G03F7/20
CPC分类号： G03F7/20 , G03F7/2014 , G03F7/3021 , G03F7/70358 , G03F7/707 , G03F7/70758 , G03F7/70783
摘要： PURPOSE: A super low speed slope rotation exposure device is provided to allow the three dimensional micro structure to be made by using the micro electromechanical system by controlling the slope degree, rotation number and rotation time of a chuck. CONSTITUTION: The exposure device comprises a power supply device(10) for supplying the operation power to the exposure device; a lamp cooling device(20) for cooling the parallel light lamp; an optical tube(30) for obtaining the output of the parallel light by the each reflective mirror(32); a chuck(40) for proceeding the exposure process in the sloped state by the super low speed using the parallel light output by the optical tube; a motor(50) for rotating the chuck; a vacuum device(60) for maintaining the chuck to be under vacuum; and a computer(70) for controlling the range of the rotation state of the chuck. The mask is formed on the wafer of the body of the chuck in a body.
摘要翻译：目的：提供超低速斜坡旋转曝光装置，通过控制卡盘的斜度，旋转次数和旋转时间，通过使用微机电系统来实现三维微结构。构成：曝光装置包括用于向曝光装置提供操作电力的电源装置（10）用于冷却所述平行光灯的灯冷却装置（20）; 用于通过每个反射镜（32）获得平行光的输出的光学管（30）; 用于使用由光管输出的平行光以超低速度在倾斜状态下进行曝光处理的卡盘（40）用于旋转卡盘的马达（50）; 用于将卡盘保持在真空下的真空装置（60）; 以及用于控制卡盘的旋转状态的范围的计算机（70）。掩模形成在卡盘的主体的晶片上。

3. 发明授权

KR100401553B1 미러 반사를 이용한 수평 구조형 노광장치 失效
标题翻译： 미러반사를이용한수평구조형노광장치
公开(公告)号：KR100401553B1
公开(公告)日：2003-10-17
申请号：KR1020010035360
申请日：2001-06-21
申请人： 한국과학기술연구원
发明人： 문성욱 , 박종연
IPC分类号： H01L21/027
摘要： PURPOSE: An exposure apparatus for equatorial conformation using mirror reflection is provided to form a three-dimensional micro structure by using MEMS(Micro Electro Mechanical System) method. CONSTITUTION: A lamp cooling apparatus(20) has a reflective shade(22) and a parallel light lamp(24). An optical tube(30) is connected with the lamp cooling apparatus(20). A plurality of reflective mirrors(32a,32b,32c,32d,32e,32f), a fly eye lens(34), a plate lens(36), and a collimating lens(38) are installed in the inside of the optical tube(30). A shutter(39) is installed at an end portion of the optical tube(30) in order to control a degree of exposure of parallel light. A couple of mirror angle correctors(33a,33b) are installed at the reflective mirrors(32a,32b,32c,32d,32e,32f) in order to correct an angle of a mirror.
摘要翻译：目的：提供使用镜面反射的赤道构造的曝光设备，以通过使用MEMS（微电子机械系统）方法形成三维微结构。构成：灯冷却装置（20）具有反光罩（22）和平行灯（24）。光管（30）与灯冷却装置（20）连接。多个反射镜（32a，32b，32c，32d，32e，32f），复眼透镜（34），平板透镜（36）和准直透镜（38）安装在光管（30）。快门（39）安装在光管（30）的端部，以控制平行光的曝光程度。在反射镜（32a，32b，32c，32d，32e，32f）处安装一对镜角度校正器（33a，33b）以校正反射镜的角度。

4. 发明公开

KR1020030059420A 3차원 ＭＥＭＳ 집광계와 제조방법 및 그 집광계를 이용한디스플레이소자 无效
标题翻译：三维MEMS光收集板及其制造方法，以及使用泵浦光学的显示装置
公开(公告)号：KR1020030059420A
公开(公告)日：2003-07-10
申请号：KR1020010088281
申请日：2001-12-29
申请人： 한국과학기술연구원
发明人： 문성욱 , 박종연 , 박종오
IPC分类号： G02F1/1335
摘要： PURPOSE: A three-dimensional MEMS(Micro Electro Mechanical System) light collection plate and a method for manufacturing the same, and a display device using the pumping optics are provided to reduce light loss on an optical path of light, thereby improving the efficiency and transmissivity of the light. CONSTITUTION: A plurality of feed horns(65) is formed length and breadth. A upper aperture ratio of each feed horns is different from a lower aperture ratio. Light emitted from a back light unit(10) reaches a glass substrate(50) through the plurality of feed horns of a light collection plate(20). The light bumped against a wall of the light collection plate is reflected and reached to the glass substrate via a liquid crystal plate(40), so that the light is interrupted due to areas of thin film transistors(30).
摘要翻译：目的：提供三维MEMS（微机电系统）光收集板及其制造方法和使用泵浦光学元件的显示装置，以减少光路上的光损失，从而提高效率和光的透射率。构成：多个饲料角（65）形成长度和宽度。每个馈电喇叭的上开口率与较低的开口率不同。从背光单元（10）发射的光通过聚光板（20）的多个馈送喇叭抵达玻璃基板（50）。撞在集光板的壁上的光经由液晶板（40）反射并到达玻璃基板，使得由于薄膜晶体管（30）的面积而中断光。

5. 发明公开

KR1020020097426A 미러 반사를 이용한 수평 구조형 노광장치 失效
标题翻译：用反射镜进行均匀配合的曝光装置
公开(公告)号：KR1020020097426A
公开(公告)日：2002-12-31
申请号：KR1020010035360
申请日：2001-06-21
申请人： 한국과학기술연구원
发明人： 문성욱 , 박종연
IPC分类号： H01L21/027
摘要： PURPOSE: An exposure apparatus for equatorial conformation using mirror reflection is provided to form a three-dimensional micro structure by using MEMS(Micro Electro Mechanical System) method. CONSTITUTION: A lamp cooling apparatus(20) has a reflective shade(22) and a parallel light lamp(24). An optical tube(30) is connected with the lamp cooling apparatus(20). A plurality of reflective mirrors(32a,32b,32c,32d,32e,32f), a fly eye lens(34), a plate lens(36), and a collimating lens(38) are installed in the inside of the optical tube(30). A shutter(39) is installed at an end portion of the optical tube(30) in order to control a degree of exposure of parallel light. A couple of mirror angle correctors(33a,33b) are installed at the reflective mirrors(32a,32b,32c,32d,32e,32f) in order to correct an angle of a mirror.
摘要翻译：目的：提供使用镜面反射的赤道构象的曝光装置，通过使用MEMS（微机电系统）方法形成三维微结构。构成：灯冷却装置（20）具有反射罩（22）和平行灯（24）。光管（30）与灯冷却装置（20）连接。多个反射镜（32a，32b，32c，32d，32e，32f），蝇眼透镜（34），平板透镜（36）和准直透镜（38）安装在光学管（30）。为了控制平行光的曝光程度，在光学管（30）的端部安装有挡板（39）。为了校正反射镜的角度，在反射镜（32a，32b，32c，32d，32e，32f）处安装有一对镜面角度校正器（33a，33b）。

6. 发明公开

KR1020020090401A 초저속 경사회전 노광을 이용한 3차원의 미소 구조안테나의 제조방법 失效
标题翻译：使用超低级梯度旋转曝光制造三维微型天线的方法
公开(公告)号：KR1020020090401A
公开(公告)日：2002-12-05
申请号：KR1020010028897
申请日：2001-05-25
申请人： 한국과학기술연구원
发明人： 문성욱 , 박종연
IPC分类号： H01L51/00
摘要： PURPOSE: A method for fabricating a three-dimensional micro antenna using ultra low-speed gradient rotary exposure is provided to simplify a fabrication process of a structure of three-dimensional micro antenna and a waveguide by using a MEMS(Micro Electro Mechanical System). CONSTITUTION: A sacrificial oxide layer is formed on a semiconductor substrate(100). The first photoresist layer is deposited thereon. The first photoresist layer pattern is formed by using an exposure mask. The first metal layer is deposited thereon. The first photoresist layer pattern is exposed by polishing the first metal layer. A micro structure(110) is formed by removing the sacrificial oxide layer. A polymer layer is deposited on a whole surface of the above structure. The second photoresist layer is deposited thereon. The second photoresist layer pattern is formed by performing a patterning process. A round is formed on a surface of the polymer layer. The second metal layer is deposited thereon. The round of the second metal layer is removed by performing a polishing process. The third metal layer and the third photoresist layer are deposited thereon. The third photoresist layer pattern and the third metal layer pattern are formed by performing the patterning process. The third photoresist layer pattern is removed. A polymer layer pattern is formed. The fourth metal layer(124) is deposited thereon by using an electroless plating method. The third metal layer pattern and the polymer layer pattern are removed from the semiconductor substrate(100) by performing a plasma asher process.
摘要翻译：目的：提供一种使用超低速梯度旋转曝光制造三维微型天线的方法，以通过使用MEMS（微机电系统）简化三维微型天线和波导的结构的制造工艺。构成：牺牲氧化物层形成在半导体衬底（100）上。第一光致抗蚀剂层被沉积在其上。通过使用曝光掩模形成第一光致抗蚀剂层图案。第一金属层被沉积在其上。第一光致抗蚀剂图案通过抛光第一金属层而被曝光。通过去除牺牲氧化物层形成微结构（110）。聚合物层沉积在上述结构的整个表面上。第二光致抗蚀剂层沉积在其上。通过进行图案化处理形成第二光致抗蚀剂层图案。在聚合物层的表面上形成圆形。第二金属层被沉积在其上。通过进行抛光处理除去第二金属层的一圈。第三金属层和第三光致抗蚀剂层沉积在其上。通过进行图案化工艺来形成第三光致抗蚀剂层图案和第三金属层图案。去除第三光致抗蚀剂层图案。形成聚合物层图案。通过使用无电镀方法将第四金属层（124）沉积在其上。通过进行等离子体灰化处理，从半导体基板（100）除去第三金属层图案和聚合物层图案。

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