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1. 发明授权

KR100547254B1 리소그라피용 유기초박막 失效
标题翻译：用于光刻的超薄有机膜
公开(公告)号：KR100547254B1
公开(公告)日：2006-01-26
申请号：KR1020030004752
申请日：2003-01-24
申请人： 학교법인 한양학원
发明人： 이해원 , 박혜영 , 최완식 , 손민석
IPC分类号： G03F7/039
摘要： 본 발명은 리소그라피용 유기초박막에 관한 것으로서, 더욱 상세하게는 다음 화학식 1로 표시되는 술폰산염 유기물, 다음 화학식 2로 표시되는 아조화합물 또는 다음 화학식 3으로 표시되는 유기 고분자를 고체 기판 표면에 코팅하여 형성된 박막으로, 박막의 두께가 수 nm 수준으로 얇고 표면이 균일하므로 전자 디바이스의 제조나 미세 가공 기술분야에서 활용될 수 있는 리소그라피용 유기초박막에 관한 것이다.

유기초박막, 아조화합물, 아크릴계 고분자, 술폰산염화합물, 스핀코팅, 원자힘현미경, 리소그래피

2. 发明公开

KR1020050049011A 원자력간 현미경 리소그래피 기술을 이용한 극자외선 노광공정용 반사형 다층 박막 미러의 제조방법 失效
标题翻译：使用原子力显微镜光刻技术制造极紫外线辐射掩模镜的制造方法
公开(公告)号：KR1020050049011A
公开(公告)日：2005-05-25
申请号：KR1020030082777
申请日：2003-11-20
申请人： 학교법인 한양학원
发明人： 이해원 , 이순우 , 안진호 , 배석종
IPC分类号： H01L21/027
CPC分类号： G03F1/24 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/2049
摘要： 본 발명은 원자력간 현미경(atomic force microscope; AFM)을 이용하여 차세대 노광 공정 마스크 중의 하나인 극자외선(extreme ultraviolet radiation; EUV) 노광 공정용 반사형 다층 박막 미러를 제조하는 방법에 관한 것으로서, 특히 기판의 다층 박막 구조 위에 증착시킨 흡수체(absorber) 물질의 패터닝(patterning)시에 원자력간 현미경의 탐침(cantilever tip)과 흡수체 물질간의 양극산화현상을 이용하여 기판으로부터 소정 높이와 폭을 가지는 금속 산화물 구조층을 형성시키고 이어 이 금속 산화물 구조층을 식각 처리하여 초미세 선폭의 흡수체 패턴을 형성, 제조하게 되는 원자력간 현미경 리소그래피 기술을 이용한 극자외선 노광 공정용 반사형 다층 박막 미러의 제조방법에 관한 것이다.
이러한 본 발명의 제조방법에 의하면, 높은 해상도를 가지는 극자외선 노광 마스크 미러를 제조할 수 있는 장점과 함께 기존의 제조방법에 비해 미세한 흡수체 패턴 사이즈(선폭 30nm 미만)를 가지는 반사형 다층 박막 미러를 제조할 수 있는 장점이 있다.

3. 发明公开

KR1020050010540A 원자력간 현미경 리소그래피 기술을 이용한 포토 마스크및 제작 방법 失效
标题翻译：使用原子力显微镜光刻技术制造光掩模的方法，用于在不损坏基板和获取各种图形图像的同时形成精细图案，并具有照片掩蔽
公开(公告)号：KR1020050010540A
公开(公告)日：2005-01-28
申请号：KR1020030049744
申请日：2003-07-21
申请人： 학교법인 한양학원
发明人： 이해원 , 이순우 , 김정오
IPC分类号： H01L21/027
摘要： PURPOSE: A method of manufacturing a photo-mask using an atomic force microscope lithographic technique and the photo-mask thereby are provided to embody a fine pattern without damage of a substrate and to acquire various pattern images by using an atomic force microscope in a lithographic process. CONSTITUTION: A metal thin film(12) made of titanium or chrome is deposited on a transparent glass quartz substrate(10) by using sputtering. An oxide layer with predetermined height and width is grown from the substrate by applying electric field to a cantilever tip and the substrate using an atomic force microscope. A fine metal thin pattern is formed by removing the oxide layer therefrom.
摘要翻译：目的：使用原子力显微镜平版印刷技术制造光掩模的方法和由此形成的光掩模，以体现精细图案而不损坏基板，并通过在光刻中使用原子力显微镜获得各种图案图像处理。构成：通过溅射将由钛或铬制成的金属薄膜（12）沉积在透明玻璃石英基板（10）上。通过使用原子力显微镜对悬臂尖和基板施加电场，从衬底生长具有预定高度和宽度的氧化物层。通过从其中除去氧化物层形成细金属薄图案。

4. 发明公开

KR1020030064669A 헤테로 링을 포함하는 아조계 금속 착화합물과 이의 용도 失效
标题翻译： AZO金属复合材料包含异型环和其使用
公开(公告)号：KR1020030064669A
公开(公告)日：2003-08-02
申请号：KR1020030036900
申请日：2003-06-09
申请人： 학교법인 한양학원
发明人： 이해원 , 박혜영
IPC分类号： C09B62/008
摘要： PURPOSE: Provided are novel azo metal chelate compounds represented by formula 2 which are prepared by reacting azo dyes containing derivatives represented by formula 1 with various metal ions. The chelate compounds are used as optical recording materials. CONSTITUTION: The azo metal chelate compound represented by formula 2 has maximum absorbance at wave length of 350-650nm and has 1,8-2.3 reflective index at wave length of 400-700nm. In the formula 1 and the formula 2, X and Y are independently S or N; R1, R2, R3, R4 and R5 are independently hydrogen atom, carboxyl group and methoxy group; and M is metal ions such as Ni, Zn, Co or Cu. The optical recording materials comprises a transparent substrate with grooves and an optical recoding layer containing the azo metal chelate compounds represented by formula 2 functioning as dye to absorb laser light, on the substrate.
摘要翻译：目的：提供由式2表示的新型偶氮金属螯合物，其通过使含有式1表示的衍生物的偶氮染料与各种金属离子反应制备。螯合化合物用作光学记录材料。构成：由式2表示的偶氮金属螯合物在波长350-650nm处具有最大吸收，在波长400-700nm处具有18-2.3的反射指数。在式1和式2中，X和Y独立地为S或N; R1，R2，R3，R4和R5独立地是氢原子，羧基和甲氧基; M是金属离子如Ni，Zn，Co或Cu。光学记录材料包括具有沟槽的透明衬底和含有用作吸收激光的作为染料吸收激光的由式2表示的偶氮金属螯合化合物的光学记录层。

5. 发明授权

KR100390871B1 ＰＳ 판용 아크릴레이트계 감광성 수지 조성물 失效
标题翻译： PS판용아크릴레이트계감광성수지조성물
公开(公告)号：KR100390871B1
公开(公告)日：2003-07-10
申请号：KR1020000008614
申请日：2000-02-22
申请人： (주)디엔엘 , 학교법인 한양학원
发明人： 이해원 , 유장근 , 김경철 , 정택서
IPC分类号： G03F7/004
摘要： PURPOSE: An acrylate photosensitive resin composition for lithographic plate is provided which shows a rapid developing property regardless of high molecular weight. CONSTITUTION: The composition comprises: (i) 30-40 wt. parts of quaternary copolymeric material having an acrylic monomer with a hetero ring, R, at the end and an acrylic monomer with a hetero ring, R', at the end, wherein R is one of tetrahydrofuran, tetrahydropyran and hetero ring having 5-8 carbons and R' is one of fluoroacetic acid, chloroacetic acid, bromoacetic acid, iodoacetic acid, dichloroacetic acid, trichloroacetic acid and it's similar halogenated acetic acid; (ii) 50-70 wt. parts of ethylcellosolve and methylcellosolve; (iii) 1-2 wt. parts of dye; and (iv) 0.5-1 parts of additive.
摘要翻译：目的：提供一种用于平版印刷版的丙烯酸酯光敏树脂组合物，其无论高分子量如何显示出快速显影性能。构成：组合物包含：（i）30-40wt。部分四元共聚物材料，其末端带有一个带有杂环的丙烯酸单体R，末端带有一个杂环R'的丙烯酸单体，其中R是四氢呋喃，四氢吡喃和杂环中的一种，具有5-8 碳和R'是氟乙酸，氯乙酸，溴乙酸，碘乙酸，二氯乙酸，三氯乙酸及其类似的卤代乙酸中的一种; （ii）50-70wt。乙基溶纤剂和甲基溶纤剂的一部分; （iii）1-2wt。染料的部分; 和（iv）0.5-1份的添加剂。

6. 发明公开

KR1020030010462A 비접촉형 원자간력 현미경에 공진신호에 동기화된구형파를 공급하는 장치 및 방법 有权
标题翻译：用于提供与共振信号同步到非接触原子力显微镜的方波的装置和方法
公开(公告)号：KR1020030010462A
公开(公告)日：2003-02-05
申请号：KR1020020005361
申请日：2002-01-30
申请人： 학교법인 한양학원
发明人： 김영환 , 정정주 , 이해원
IPC分类号： G01Q10/06
摘要： PURPOSE: A device and a method for supplying square waves synchronized with resonance signals to a non-contact atomic force microscope are provided to supply a square wave having a desired duration time and amplitude to the microscope at a desired time point, thereby forming more precise nano-patterns and improving the reliability of a tip. CONSTITUTION: A device for supplying square waves synchronized with resonance signals to a non-contact atomic force microscope for carrying out nano-lithography by receiving a resonance signal, includes a square wave generating unit(300) for generating a square wave having a predetermined phase synchronized with the resonance signal, and a duration time control unit(600) for controlling a duration time of a high signal section of the square wave by a predetermined value.
摘要翻译：目的：提供一种用于向非接触式原子力显微镜提供与谐振信号同步的方波的装置和方法，以在期望的时间点向显微镜提供具有期望的持续时间和幅度的方波，从而形成更精确纳米图案和提高提示的可靠性。构成：用于向非接触原子力显微镜提供与谐振信号同步的方波用于通过接收共振信号进行纳米光刻的装置，包括：方波发生单元（300），用于产生具有预定相位的方波与谐振信号同步的持续时间控制单元（600），用于将方波的高信号部分的持续时间控制预定值。

7. 发明公开

KR1020020066610A 광기록 매체에 이용되는 헤테로 링을 포함하는 아조계 화합물 失效
标题翻译：基于AZO的包含杂环化合物的化合物，其制备金属复合化合物的方法及其用途
公开(公告)号：KR1020020066610A
公开(公告)日：2002-08-21
申请号：KR1020010006880
申请日：2001-02-12
申请人： 학교법인 한양학원
发明人： 이해원 , 박혜영
IPC分类号： C09B62/008
摘要： PURPOSE: Provided are an azo based compound comprising a heterocycle, a method for preparing a metal complex compound thereof which can be prepared relatively easily than existing phthalocyanine or cyanine, and which has high yields, and optically and thermally excellent properties, and a use thereof. CONSTITUTION: The azo dye is represented by formula 1. In the formula 1, X represents S, N, O, Y represents S, N, O, and R1 to R5 represent hydrogen atom, carboxylic acid(-COOH), methoxy(-OCH3), (alkyl group(-(CH2)n), CH3, n = 0-5), nitro group(-NO2), hydroxy group(-OH), halogen atom, phenyl group, cyano group(-CN), sulfonic acid group(-SO3,H). An optic recording media comprises a transparent substrate having a groove; and a recording layer which is formed on the transparent substrate and contains a laser beam-absorbing colorant. The colorant is the azo compound of formula 1.
摘要翻译：目的：提供一种包含杂环的偶氮基化合物，其制备可与现有酞菁或花青相比容易制备的金属络合物的方法，并且其产率高，光学和热学优异性能及其用途。构成：偶氮染料由式1表示。在式1中，X表示S，N，O，Y表示S，N，O，R 1至R 5表示氢原子，羧酸（-COOH），甲氧基（ - OCH 3），（烷基（ - （CH 2）n），CH 3，n = 0-5），硝基（-NO 2），羟基（-OH），卤素原子，苯基，氰基（-CN）磺酸基（-SO 3，H）。光学记录介质包括具有凹槽的透明基底; 以及形成在透明基板上并且包含激光束吸收着色剂的记录层。着色剂是式1的偶氮化合物。

8. 发明公开

KR1020040067564A 리소그라피용 유기초박막 失效
标题翻译：有机超薄膜
公开(公告)号：KR1020040067564A
公开(公告)日：2004-07-30
申请号：KR1020030004752
申请日：2003-01-24
申请人： 학교법인 한양학원
发明人： 이해원 , 박혜영 , 최완식 , 손민석
IPC分类号： G03F7/039
摘要： PURPOSE: Provided is an organic ultrathin film having a uniform surface with a thickness of several millimeters, useful for manufacturing micropatterns in electronic devices, panel display devices, bio-devices, etc. CONSTITUTION: The organic ultrathin film for lithography has a thickness of 1-3 nm and a surface roughness of 2-5 angstroms as determined by Atomic Force Microscopy, and is formed by coating on a solid substrate, a solution containing an organic compound selected from the group consisting of an organic sulfonate represented by formula 1, an azo compound represented by formula 2 or a metal complex salt thereof, and an organic polymer represented by formula 3. In formula 1, X is Ph-H, Ph-OH, Ph-OCH3, Ph-(CH2)nCH3, Ph-NO2, Ph-OPh, Ph-Hal, Ph-SCH3, Ph-O-Ph, Ph-OCH2COO-CH3, Ph-SPh, Ph-SCH3 or Ph-SOCH3; n is 0 or an integer of 1-20; and m is 0 or an integer of 1-10. In formula 2, each of R1 and R2 is the same or different and represents a phenyl, naphthyl, benzothiazole, benzimidazole or benzoic acid group. In formula 3, each of R3-R8 is the same or different and represents H, a C1-C5 alkyl or a C1-C5 hydroxyalkyl; p+q+r=1; p ranges from 0.1 to 0.9; q ranges from 0.05 to 0.8; r ranges from 0.05 to 0.5; and the weight average molecular weight is 5,000-100,000.
摘要翻译：目的：提供一种厚度为几毫米的均匀表面的有机超薄膜，可用于制造电子器件，面板显示装置，生物器件等中的微图案。构成：用于光刻的有机超薄膜的厚度为1 -3nm，并且通过原子力显微镜测定的表面粗糙度为2-5埃，并且通过在固体基底上涂布含有选自由式1表示的有机磺酸酯，式式1中，X为Ph-H，Ph-OH，Ph-OCH 3，Ph-（CH 2）n CH 3，Ph-NO 2 ，Ph-OPh，Ph-Hal，Ph-SCH3，Ph-O-Ph，Ph-OCH2COO-CH3，Ph-SPh，Ph-SCH3或Ph-SOCH3; n为0或1-20的整数; m为0或1-10的整数。在式2中，R 1和R 2各自相同或不同，表示苯基，萘基，苯并噻唑，苯并咪唑或苯甲酸基。在式3中，R 3 -R 8各自相同或不同，表示H，C 1 -C 5烷基或C 1 -C 5羟基烷基; P + Q + R = 1; p范围为0.1〜0.9; q范围为0.05〜0.8; r范围为0.05〜0.5; 重均分子量为5,000〜10000。

9. 发明授权

KR100427263B1 감광제로 유용한 칼릭스 유도체 失效
标题翻译： 감광제로유용한칼릭도도。。
公开(公告)号：KR100427263B1
公开(公告)日：2004-04-17
申请号：KR1020010014180
申请日：2001-03-19
申请人： 학교법인 한양학원
发明人： 이해원 , 구양서 , 강영종 , 김응렬
IPC分类号： G03F7/004
摘要： PURPOSE: A photosensitive material containing a calix derivative, its preparation method and its use are provided, which material shows a high sensitivity and a good resolution and is used as a PS plate, a printed circuit board, a color cathode ray and a photoresist for screen printing and microimage. CONSTITUTION: The photosensitive material is a calix derivative comprising calix£4| resorcinarene and calix£4|pyrogallene represented by the formula 1, wherein R1 comprises 2-diazo-1-naphthoquinone-5-sulfonyl group represented by the formula 2 and OH; R2 is NO2, Cl, F or CN; and R3 is OH or H.
摘要翻译：目的：提供一种含有杯形衍生物的感光材料及其制备方法和用途，该材料显示出高灵敏度和良好的分辨率，并用作PS版，印刷电路板，彩色阴极射线和光致抗蚀剂丝网印刷和微图像。构成：感光材料是包含杯[4]的杯子衍生物间苯二酚芳烃和杯芳烃;式1代表的4-pyrogallene，其中R1包含由式2表示的2-重氮-1-萘醌-5-磺酰基和OH; R2是NO2，Cl，F或CN; 和R3是OH或H.

10. 发明授权

KR100398089B1 아조계 염료와 이의 용도 失效
标题翻译： 아조계염료와이이용도
公开(公告)号：KR100398089B1
公开(公告)日：2003-09-19
申请号：KR1020010006879
申请日：2001-02-12
申请人： 학교법인 한양학원
发明人： 이해원 , 박혜영
IPC分类号： C09B62/008
摘要： PURPOSE: Provided are a method for preparing a metal complex compound of azo based compound which can be prepared relatively easily than existing phthalocyanine or cyanine, and which has high yields, and optically and thermally excellent properties, and a use thereof. CONSTITUTION: The azo dye is represented by formula 1. In the formula 1, X represents a benzene ring, naphthalene ring or anthracene ring, R1-R3 represent hydrogen atom, carboxylic acid(-COOH), methoxy(-OCH3), alkyl group(-(CH2)nCH3, n=0-5), nitro group(-NO2), hydroxy group(-OH), halogen atom, phenyl group, cyano group(-CN), sulfonic acid group(-SO3H). An optic recording media comprises a transparent substrate having a groove; and a recording layer which is formed on the transparent substrate and contains a laser beam-absorbing colorant. The colorant is the azo compound of formula 1.
摘要翻译：目的：提供一种制备比现有的酞菁或花青相对容易地制备且产率高，光学和热性能优异的偶氮系化合物的金属络合物的方法及其用途。构成：偶氮染料由式1表示。在式1中，X表示苯环，萘环或蒽环，R 1 -R 3表示氢原子，羧酸（-COOH），甲氧基（-OCH 3），烷基（ - （CH2）nCH3，n = 0-5），硝基（-NO2），羟基（-OH），卤原子，苯基，氰基（-CN），磺酸基（-SO3H）。一种光学记录介质包括具有凹槽的透明基底; 以及形成在透明基板上并包含激光束吸收着色剂的记录层。着色剂是式1的偶氮化合物。

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