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    • 1. 发明授权
    • 황화처리된 산화철을 이용한 수은 제거용 흡착제 및 이의제조방법
    • 通过硫化氧化铁除去汞
    • KR100834451B1
    • 2008-06-09
    • KR1020070028079
    • 2007-03-22
    • 주식회사 코캣동양종합건설 주식회사
    • 이도희배민수가명진이진구장원철김두성
    • B01J20/06B01J20/28C01G49/02
    • B01J20/0266B01J20/0229B01J20/28016B01J20/3007C01G49/02
    • A mercury removal adsorbent is provided to adsorb and remove mercury contained in flue gas by synthesizing iron oxide from polyferric sulfate produced in the preparation process of titanium oxide and sulfiding the synthesized iron oxide, and a method for preparing the mercury removal adsorbent is provided. A mercury removal adsorbent comprises iron oxide sulfided with a sulfiding gas comprising 0.001 to 2.0 vol.% of a sulfur compound, 1 to 50 vol.% of oxygen, and 48.0 to 98.999 vol.% of a carrier gas based on the total sulfiding gas volume. A preparation method of a mercury removal adsorbent comprises sulfiding iron oxide with a sulfiding gas comprising 0.001 to 2.0 vol.% of a sulfur compound, 1 to 50 vol.% of oxygen, and 48.0 to 98.999 vol.% of a carrier gas based on the total sulfiding gas volume. The preparation method further comprises extrusion molding the iron oxide before or after sulfiding the iron oxide to prepare a mercury removal adsorbent in the form of balls, tablets, pellets, or honeycomb. Further, the mercury is Hg^0, HgCl, HgCl2 and a phase of the mercury is gas.
    • 提供了除汞吸附剂,通过在氧化钛的制备过程中生成的硫酸氢氧化物中合成氧化铁并硫化合成的氧化铁来吸附和除去烟道气中的汞,并提供了制备除汞吸附剂的方法。 除汞吸附剂包括用硫化气体硫化的氧化铁,其包含0.001至2.0体积%的硫化合物,1至50体积%的氧气和48.0至98.999体积%的基于总硫化气体的载气 卷。 除汞吸附剂的制备方法包括用硫化气体硫化氧化铁,该硫化气体包含0.001至2.0体积%的硫化合物,1至50体积%的氧气和48.0至98.999体积%的载气,基于 总硫化气体积。 该制备方法还包括在硫化氧化铁之前或之后挤出成型氧化铁以制备球,片剂,丸粒或蜂窝形式的除汞吸附剂。 此外,汞是Hg ^ O,HgCl,HgCl 2,汞的相是气体。
    • 8. 发明授权
    • 암모니아/수소 혼합가스가 함유된 배가스 정화방법 및 그장치
    • 암모니아/수소혼합가스가함유된배가스정화방법및그장치
    • KR100455009B1
    • 2004-11-09
    • KR1020010040269
    • 2001-07-06
    • 주식회사 코캣
    • 김두성오현명이진구김태원박해경
    • B01D53/74
    • PURPOSE: A purifying method of exhaust gas containing mixtures of ammonia and hydrogen and equipment thereof are provided, which can remove particulate matter effectively by porous filter thus preventing any degradation of catalyst so that the system can be steadily operated and remove ammonia and hydrogen of high flow and concentration emitted from nitride film manufacturing process of semiconductor plant by using catalyst. CONSTITUTION: The purifying method includes the steps of adsorbing particulate matter contained in exhaust gas by porous filter selected from a group consisting of ceramic honeycomb, ceramic foam and metallic foam; reacting the exhaust gas with at least one of ammonia decomposing catalyst selected from a group consisting of cobalt, vanadium, molybdenum, tungsten, nickel and iron to decompose the ammonia into nitrogen and hydrogen; mixing the resultant hydrogen and the residual ammonia with oxidant, followed by reacting with residual gas treating catalyst for converting hydrogen into water and residual ammonia into nitrogen and hydrogen. The apparatus for treating exhaust gas containing mixtures of ammonia and hydrogen comprises (a) an ammonia degradation reactor(10) consisting of an exhaust gas inlet(11) installed at a lower side thereof; a porous filter bed(12) packed at lower side thereof; an ammonia degradation catalyst layer(13) formed on the porous filter bed; a ceramic insulation layer(14) formed on the ammonia degradation catalyst layer; and a heater(15) installed adjacent to the porous filter bed and the ammonia degradation catalyst layer to control temperature of the ammonia degradation reactor; (b) a residual gas treatment reactor(20) consisting of an oxidant injection port(22) connected to one end of pipe line; a residual gas treatment catalyst layer(23); and a purified gas exit(24) formed at a lower side thereof; and (c) a water tank(30) consisting of a water drainage(32) connected to lower side of the residual gas treatment reactor; an auto drain valve(31) installed on the water drainage; a pipe line(34) equipped with a water injection pump(33) to supply water a pipe that connects the residual gas treatment reactor with the ammonia degradation reactor; and a water drainage(35) formed at one side of the water tank.
    • 目的:提供一种含氨和氢混合气的废气净化方法及其设备,它能有效地通过多孔过滤器去除颗粒物质,从而防止催化剂的任何降解,从而使系统能够稳定运行并去除高氨和氢气 使用催化剂从半导体工厂的氮化物膜制造过程中释放的流量和浓度。 本发明的净化方法包括以下步骤:用由蜂窝陶瓷,泡沫陶瓷和金属泡沫组成的组中选择的多孔过滤器吸附废气中所含的颗粒物质; 使废气与选自钴,钒,钼,钨,镍和铁中的至少一种氨分解催化剂反应以将氨分解成氮和氢; 将所得到的氢和残余的氨与氧化剂混合,然后与残余气体处理催化剂反应,以将氢气转化成水和残余的氨转化为氮气和氢气。 包含氨和氢的混合物的废气处理设备包括:(a)氨降解反应器(10),其由安装在其下侧的废气入口(11)组成; 在其下侧填充的多孔过滤床(12) 在多孔滤床上形成的氨降解催化剂层(13) 在氨分解催化剂层上形成的陶瓷绝缘层(14) 以及邻近所述多孔过滤床和所述氨降解催化剂层安装的加热器(15),以控制所述氨降解反应器的温度; (b)由连接到管路一端的氧化剂注入口(22)组成的残余气体处理反应器(20); 残留气体处理催化剂层(23); 和在其下侧形成的净化气体出口(24); (c)由连接到残余气体处理反应器下侧的排水管(32)组成的水箱(30); 安装在排水装置上的自动排水阀(31) 配备有注水泵(33)的管线(34),以将连接残余气体处理反应器和氨降解反应器的管道供给水; 和形成在水箱一侧的排水口(35)。
    • 10. 发明授权
    • 축열식 열회수 방식을 이용한 선택적 촉매 및 무촉매환원장치
    • 使用再生热回收的选择性催化剂和非催化剂还原系统
    • KR100597695B1
    • 2006-07-07
    • KR1020030078846
    • 2003-11-08
    • 주식회사 코캣
    • 김두성김정호이진구조한재이승재가명진
    • B01D53/86
    • 본 발명은 질소산화물을 포함하는 배가스가 유입되는 배가스 유입구(26), 상기 배가스 유입구(26)에 연결설치되어 상기 배가스를 축열식 베드(2, 4, 6)로 유입시키는 유입댐퍼(22a, 22b, 22c), 상기 각각의 유입댐퍼(22a, 22b, 22c)에 연결설치되고 그 내부에 처리가스로부터 열을 회수하는 축열층(12) 및 환원제를 공급하는 제 1 환원제 공급수단(14)이 구비된 적어도 2개 이상의 축열식 베드(2, 4, 6), 상기 제 1 환원제 공급수단(14)에 연결설치되고 그 내부에 환원제가 채워져 있는 환원제 탱크(40), 상기 각각의 축열식 베드(2, 4, 6)의 일측에 연결설치되어 유입되는 질소산화물을 포함하는 배가스를 환원시키기 위한 반응실(10), 상기 축열식 베드(2, 4, 6)의 일측에 각각 연결설치되어 상기 반응실(10)에서 환원된 처리가스를 외부로 배출하기 위한 배출댐퍼(20a, 20b, 20c), 상기 배출댐퍼(20a, 20b, 20c)에 연결설치되어 처리가스를 외부로 배출하는 처리가스 배출구(30) 및 상기 축열식 베드(2, 4, 6)의 일측에 각각 연결설치되어 축열식 베드(2, 4, 6)에 잔존하는 배가스를 퍼지하기 위한 퍼지댐퍼(24a, 24b, 24c)를 포함하는 질소산화물을 포함하는 배가스를 처리하기 위한 축열식 환원장치를 제공한다.
      본 발명에 따르면, 축열식 베드에 축열층을 구성함으로써 환원시 사용된 고온의 폐열을 회수하여 재이용함으로 운전비를 감소시킬 수 있으며, 유입되는 질소산화물을 포함하는 배가스에 환원제를 공급하여 환원시킴으로써 배가스에 포함된 질소산화물이 질소로 전환되어 처리되도록 하는 효과가 있다.
      질소산화물, 축열층, 촉매층, 환원제,