会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • 수직형 기판 처리 장치와 방법
    • 垂直型设备及其处理方法
    • KR101421547B1
    • 2014-07-28
    • KR1020130024089
    • 2013-03-06
    • 주식회사 제우스
    • 이승훈박지호모성원정석준최문섭김태훈이전근이현재장항임율규김혜진송진영
    • H01L21/302
    • H01L21/67028H01L21/68742
    • Disclosed are a vertical type device and a method for treating a substrate. The vertical type device for treating a substrate includes a process chamber part which has a process space for vertically receiving a substrate with regard to a bottom surface and moving the substrate in a height direction, a nozzle chamber part which has a receiving space which is connected to the process space by the medium of a connection part, a connection opening/closing part which opens/closes the connection part, an elevating part which is formed in the process space and elevates and supports the substrate, and a cluster generation part which is formed in the receiving space and changes a process gas into a gas cluster type and supplies it.
    • 公开了垂直型装置和处理基板的方法。 用于处理基板的垂直型装置包括处理室部分,该处理室部分具有用于垂直地接收基板的工作空间,用于相对于底部表面并在高度方向上移动基板;喷嘴室部分,其具有连接的接收空间 通过连接部件的介质到达处理空间,打开/关闭连接部分的连接打开/关闭部分,形成在处理空间中并升高和支撑基板的升降部分,以及簇生成部件 形成在接收空间中并将处理气体改变为气体簇型并提供。
    • 5. 发明授权
    • 기판처리장치
    • 基板处理装置
    • KR101421548B1
    • 2014-07-29
    • KR1020130042276
    • 2013-04-17
    • 주식회사 제우스
    • 이승훈박지호모성원정석준최문섭김태훈이전근이현재장항임율규김혜진송진영
    • H01L21/677H01L21/02B65G49/07
    • H01L21/6773B65G49/061B65G49/062G02F1/1303H01L21/67766H01L21/67793
    • A substrate processing device is disclosed. The disclosed substrate processing device comprises a cassette unit having a cassette part which a substrate is separated from and stacked on; and a transfer unit to transfer the substrate or the cassette unit; and a processing unit to process the substrate. The processing unit includes a processing chamber unit having a processing space in which the substrate is accommodated; a nozzle chamber unit in which an accommodation space communicated with the processing space is included; a communication unit in which a communication space for communicating the processing space with the accommodation space; and a communication opening/closing unit for opening/closing the communication space; a processing transfer unit formed in the processing space to slide or rotate the substrate; and a cluster generation unit formed in the accommodation space to convert a process gas into a gas cluster type to be supplied.
    • 公开了一种基板处理装置。 所公开的基板处理装置包括具有基板与基板分离并堆叠的盒部分的盒单元; 以及转印单元,用于转印所述基板或所述盒单元; 以及处理基板。 处理单元包括处理室单元,其具有容纳基板的处理空间; 喷嘴室单元,其中包括与处理空间连通的容纳空间; 通信单元,其中用于将处理空间与容纳空间通信的通信空间; 以及用于打开/关闭通信空间的通信打开/关闭单元; 处理转移单元,形成在所述处理空间中以使所述基板滑动或旋转; 以及形成在容纳空间中以将处理气体转换成要供应的气体簇型的簇生成单元。