会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 10. 发明公开
    • 고내열성 음성 레지스트 조성물
    • 具有高耐热性的耐腐蚀组合物
    • KR1020100079784A
    • 2010-07-08
    • KR1020080138357
    • 2008-12-31
    • 주식회사 삼양사
    • 김준영임경진최승렬김도
    • G03F7/027G03F7/028
    • G03F7/027G03F7/0007G03F7/0233G03F7/032G03F7/033G03F7/0382G03F7/039G03F7/0392
    • PURPOSE: A negative resist composition is provided to ensure high thermal resistance, permeability, and chemical resistance and to enhance battery efficiency. CONSTITUTION: A negative resist composition contains 3-40 weight% of binder resin of chemical formula 1, 2-40 weight% of multifunctional acrylic monomer, 0.01-10 weight% of photo initiator, and 10-95 weight% of organic solvent. In chemical formula 1, R1 and R2 are independently hydrogen or methyl group; R3 is hydrogen, alkyl group of 1-14 carbon atoms, cycloalkyl group or aryl group; and R4 is aryl group, alkyl oxy, aryl oxy, nitrile, or alkyloxycarbonyl group, or alkyl group which is substituted with hydroxyl group of 1-14 carbon atoms and non-substituted.
    • 目的:提供负的抗蚀剂组合物,以确保高耐热性,渗透性和耐化学性,并提高电池效率。 构成:负光刻胶组合物含有3-40重量%的化学式1的粘合剂树脂,2-40重量%的多官能丙烯酸单体,0.01-10重量%的光引发剂和10-95重量%的有机溶剂。 在化学式1中,R 1和R 2独立地为氢或甲基; R3是氢,1-14个碳原子的烷基,环烷基或芳基; R4为芳基,烷基氧基,芳基氧基,腈基或烷氧基羰基,或被1-14个碳原子的羟基取代而未被取代的烷基。