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    • 4. 发明公开
    • 용매 흡수성 물질을 이용한 미세 패턴 및 미세 채널 형성방법
    • 使用材料吸收溶剂形成精细图案和精细通道的方法
    • KR1020020084849A
    • 2002-11-13
    • KR1020010023641
    • 2001-05-02
    • 주식회사 미뉴타텍
    • 이홍희김연상
    • H01L21/28
    • PURPOSE: A method for forming a fine pattern and a fine channel by using a material for absorbing a solvent is provided to form uniformly the fine pattern and the fine pattern of constant sizes by using a solvent absorbing material. CONSTITUTION: An arbitrary pattern is formed on a substrate(102) by performing an etch process. A low dielectric material is formed on the substrate(102) by using a spin coating method with a low dielectric material precursor solution. An absorbing plate for absorbing a solvent is adhered on a surface of the low dielectric material. The substrate(102) is turned up. The solvent of the low dielectric material is absorbed by the absorbing plate. A channel(108/1,108/2) is formed on an intaglio part of the arbitrary pattern of the substrate(102). The low dielectric material is used as a channel cover(104). The channel cover(104) is solidified by performing a thermal process.
    • 目的:提供通过使用吸收溶剂的材料形成精细图案和细小通道的方法,以通过使用溶剂吸收材料均匀地形成精细图案和恒定尺寸的精细图案。 构成:通过执行蚀刻工艺在衬底(102)上形成任意图案。 通过使用具有低电介质材料前体溶液的旋涂法在基底(102)上形成低介电材料。 用于吸收溶剂的吸收板粘附在低电介质材料的表面上。 使基板(102)翻转。 低介电材料的溶剂被吸收板吸收。 在基板(102)的任意图形的凹版部分上形成沟道(108 / 1,108 / 2)。 低介电材料用作通道盖(104)。 通过执行热处理使通道盖(104)固化。
    • 6. 发明公开
    • 전기도금용 레벨링제
    • 用于电镀微孔或微孔的电镀组合物
    • KR1020020076796A
    • 2002-10-11
    • KR1020010016927
    • 2001-03-30
    • 주식회사 미뉴타텍
    • 이홍희김연상서동현
    • C25D3/02
    • PURPOSE: An electroplating composition for plating micropattern or microhole is provided, which helps micropattern and microhole plated uniformly on PCB. CONSTITUTION: The electroplating composition for plating micropattern or microhole is characterized in that it contains sulfonate compounds with at least one radical for fluorine substitution and the sulfonate compounds are alkane sulfonate represented by formula I, cycloalkane sulfonate represented by formula II and phenol sulfonate represented by formula III or their derivatives. In the formulae, R1, R2, R3, R4, R5, R6 and R7 denote F, H, CpH2p+1 or CpF2p+1, respectively (p is an integer of 1 to 4) wherein at least one among R1 to R5 is F and at least one between R6 and R7 is F; A denotes alkali metal, alkaline earth metal, hydrogen or -NB1B2B3B4, respectively wherein B1, B2, B3 and B4 denote hydrogen, alkyl, aryl or aralkyl; and n is an integer of 0 to 18.
    • 目的:提供用于电镀微图案或微孔的电镀组合物,其有助于微图案和微孔均匀地印刷在PCB上。 构成:用于电镀微图案或微孔的电镀组合物的特征在于其含有至少一个氟取代基团的磺酸盐化合物,磺酸盐化合物是由式I表示的烷基磺酸盐,由式II表示的环烷磺酸盐和由式 III或其衍生物。 式中,R1,R2,R3,R4,R5,R6和R7分别表示F,H,CpH2p + 1或CpF2p + 1(p为1〜4的整数),R1〜R5中的至少一个为 F和R6和R7之间的至少一个是F; A表示碱金属,碱土金属,氢或-NB1B2B3B4,其中B1,B2,B3和B4表示氢,烷基,芳基或芳烷基; n为0〜18的整数。
    • 7. 发明授权
    • 전극으로 유용한 고분자 배위화합물
    • 전극으로유용한고분자배위화합물
    • KR100422109B1
    • 2004-03-10
    • KR1020010026324
    • 2001-05-15
    • 주식회사 미뉴타텍
    • 이홍희김연상서순민
    • C08G75/14H01L51/30
    • PURPOSE: Provided is a high molecular coordination compound which is formed by coordinate covalent bonding a polymer compound having unshared electron pair with metal ion having coordination number, and which has improved electrical properties and thus is useful to electrode. CONSTITUTION: The compound is formed by coordinate covalent bonding PEDOT(poly(3,4-ethylene dioxythiophene))-PSS(poly(4-styrenesulfonate)) of formula 1 with metal ion having coordination number in reaction medium selected from the group consisting of water, acetone, isopropanol, methanol and ethanol. The metal ion is a transition metal ion having coordination number of 4-6. The metal ion is selected from the group consisting of Cu2+, Ni2+, Zn2+, Co2+, Fe2+, Fe3+, Mn2+, Mn7+, Cr3+ and Cr6+.
    • 目的:提供一种高分子配位化合物,其通过配位共价键合具有未共享电子对的高分子化合物和具有配位数的金属离子而形成,并且具有改善的电性能,因此可用于电极。 构成:化合物通过式1的PEDOT(聚(3,4-亚乙基二氧噻吩)) - PSS(聚(4-苯乙烯磺酸酯))与具有配位数的金属离子在选自以下的反应介质中配位形成: 水,丙酮,异丙醇,甲醇和乙醇。 金属离子是配位数为4-6的过渡金属离子。 金属离子选自Cu2 +,Ni2 +,Zn2 +,Co2 +,Fe2 +,Fe3 +,Mn2 +,Mn7 +,Cr3 +和Cr6 +。
    • 8. 发明授权
    • 모세관 효과를 이용한 미세 패턴 형성 방법
    • 保留所有权利
    • KR100413334B1
    • 2003-12-31
    • KR1020000033873
    • 2000-06-20
    • 주식회사 미뉴타텍
    • 이홍희서갑양김연상유필진
    • G03F1/68G03F1/00
    • PURPOSE: A method for forming micropattern on a substrate is provided by using a capillary phenomenon and a polymer cast to obtain the micropattern without the damage or deformation of a polymer thin film and a substrate. CONSTITUTION: The method comprises the steps of preparing a cast having the pattern structure comprising the intaglio part and the relief part; forming a polymer material(108') with a specific thickness on a substrate(104); contacting the polymer layer on a substrate to the pattern-formed surface of the cast, thereby allowing the polymer material contact with the relief part to be flowed into the empty space(110) of the intaglio part, thereby removing the polymer material contact with the relief part; and removing the cast. Preferably the substrate(104) is heated for allowing the polymer material contact with the intaglio part to be flowed into the empty space(110) after it is contacted with the cast.
    • 目的:通过使用毛细管现象和聚合物铸塑来获得微图案,而不会造成聚合物薄膜和基底的损坏或变形,从而提供在基底上形成微图案的方法。 组成:该方法包括以下步骤:制备具有包括凹版部分和凸版部分的图案结构的铸件; 在基底(104)上形成具有特定厚度的聚合物材料(108'); 使基板上的聚合物层与铸件的图案形成表面接触,由此允许与凹凸部分接触的聚合物材料流入凹版部分的空的空间(110)中,从而移除与聚合物材料接触的聚合物材料 救济部分; 并移除铸件。 优选地,衬底(104)被加热以允许聚合物材料在与铸件接触后与凹版部分接触而流入空的空间(110)。
    • 9. 发明公开
    • 반도체 소자용 미세 패턴 형성 방법
    • 用于制作半导体器件精细图案的方法
    • KR1020020045769A
    • 2002-06-20
    • KR1020000075165
    • 2000-12-11
    • 주식회사 미뉴타텍
    • 이홍희김연상유필진서갑양
    • H01L21/027
    • PURPOSE: A method for fabricating a fine pattern for a semiconductor device is provided to form a desired fine pattern on a substrate, by using a simple process using a polydimethylsiloxanes(PDMS) mold having elasticity and solvent absorbing force. CONSTITUTION: A mold(108) has a pattern structure composed of a relief portion and an intaglio portion, further having elasticity and solvent absorbing force. A thin film material having fluidity caused by solvent is formed on the substrate(104). The mold is closely attached to the thin film material at a predetermined pressure so that a part of the thin film material in contact with the relief portion of the mold pattern is induced to the intaglio portion of the mold pattern while the solvent contained in the thin film material is absorbed to the mold to solidify the thin film material. The mold is separated from the substrate. The thin film material in contact with the relief portion of the mold is eliminated to selectively expose a part of the upper portion of the substrate so that a thin film fine pattern is completed.
    • 目的:提供一种用于制造半导体器件的精细图案的方法,以通过使用具有弹性和溶剂吸收力的聚二甲基硅氧烷(PDMS)模具的简单工艺在基板上形成所需的精细图案。 构成:模具(108)具有由浮雕部分和凹版部分构成的图案结构,其进一步具有弹性和溶剂吸收力。 在衬底(104)上形成具有由溶剂引起的流动性的薄膜材料。 模具以预定的压力紧密地附着到薄膜材料上,使得与模具图案的浮雕部分接触的薄膜材料的一部分被引导到模具图案的凹版部分,同时包含在薄的 薄膜材料被吸收到模具上以固化薄膜材料。 模具与基材分离。 消除与模具的浮雕部分接触的薄膜材料,以选择性地暴露基板的上部的一部分,从而完成薄膜精细图案。
    • 10. 发明授权
    • 열처리 및 모세관 현상을 이용한 열경화성 고분자박막상의 미세 패턴 형성 방법
    • 열처리및모세관현상을이용한열경화성고분자박막상의미세패턴형성방열처
    • KR100407601B1
    • 2003-12-01
    • KR1020000032974
    • 2000-06-15
    • 주식회사 미뉴타텍
    • 이홍희유필진서갑양김연상
    • G03F1/68
    • Various measures are proposed for enabling simultaneous reading and writing of real time information, such as a digital video signal, from/onto a disc-like record carrier. The measures embody several read/write-scheduling algorithms for writing/reading blocks of information recorded in fixed sized fragment areas on the record carrier. Typically one writing action and a plurality of readings actions are employed in one read/write cycle of either a fixed duration or of a variable duration. In particular the proposed measures enable reading and writing of edited files. Further embodiments may require a re-ordering of read actions in a read/write cycle.
    • 提出了各种措施来实现从盘状记录载体同时读取和写入诸如数字视频信号的实时信息。 这些措施体现了用于写入/读取记录在记录载体上的固定大小的片段区域中的信息块的多个读/写调度算法。 典型地,在固定持续时间或可变持续时间的一个读取/写入周期中采用一个写入动作和多个读取动作。 特别是建议的措施能够读写编辑的文件。 其他实施例可能需要在读取/写入循环中对读取动作进行重新排序。