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1. 发明授权

KR100392054B1 대면적의 홀로그래픽 확산판 제조 방법 失效
标题翻译： 대면적의홀로그래픽확산판제조방법
公开(公告)号：KR100392054B1
公开(公告)日：2003-07-22
申请号：KR1020010050740
申请日：2001-08-22
申请人： 이 병 호
发明人： 이병호 , 양병춘
IPC分类号： G02F1/1335
摘要： PURPOSE: A method for fabricating a large-sized holographic diffusion plate is provided to manufacture a large holographic diffusion plate using split exposure and to obtain uniform diffraction characteristic by controlling exposure time. CONSTITUTION: A large-size holographic diffusion plate is fabricated through split exposure. The split exposure splits a large area into a plurality of exposure regions and sequentially expose the exposure regions. The boundary(B) of an exposure region previously exposed is exposed with smaller quantity of optical energy than the energy used for exposing the other portion(A) of the exposure region. The boundary(C) of an exposure region exposed later is exposed with a larger quantity of optical energy than the energy used for exposing the other portion(A) of the region exposed later.
摘要翻译：目的：提供一种用于制造大尺寸全息漫射板的方法，以通过分割曝光来制造大型全息漫射板，并通过控制曝光时间来获得均匀的衍射特性。组成：大尺寸全息扩散板通过分割曝光制造。分割曝光将大面积分割成多个曝光区域，并依次曝光曝光区域。先前曝光的曝光区域的边界（B）以比用于曝光曝光区域的其他部分（A）的能量更小的光能曝光。随后暴露的曝光区域的边界（C）以比用于暴露稍后暴露的区域的其他部分（A）的能量更大的光能量曝光。

2. 发明公开

KR1020030017744A 대면적의 홀로그래픽 확산판 제조 방법 失效
标题翻译：用于制作大尺寸全息扩散板的方法
公开(公告)号：KR1020030017744A
公开(公告)日：2003-03-04
申请号：KR1020010050740
申请日：2001-08-22
申请人： 이 병 호
发明人： 이병호 , 양병춘
IPC分类号： G02F1/1335
摘要： PURPOSE: A method for fabricating a large-sized holographic diffusion plate is provided to manufacture a large holographic diffusion plate using split exposure and to obtain uniform diffraction characteristic by controlling exposure time. CONSTITUTION: A large-size holographic diffusion plate is fabricated through split exposure. The split exposure splits a large area into a plurality of exposure regions and sequentially expose the exposure regions. The boundary(B) of an exposure region previously exposed is exposed with smaller quantity of optical energy than the energy used for exposing the other portion(A) of the exposure region. The boundary(C) of an exposure region exposed later is exposed with a larger quantity of optical energy than the energy used for exposing the other portion(A) of the region exposed later.
摘要翻译：目的：提供一种制造大尺寸全息漫射板的方法，以使用分割曝光制造大型全息漫射板，并通过控制曝光时间获得均匀的衍射特性。构成：通过分割曝光制造大尺寸全息漫射板。分割曝光将大面积分割成多个曝光区域并且顺序曝光曝光区域。暴露于曝光区域的曝光区域的边界（B）以比用于曝光曝光区域的其他部分（A）的能量更少的光能量露出。稍后曝光的曝光区域的边界（C）以比用于暴露稍后暴露的区域的另一部分（A）的能量更大的光能量曝光。

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