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    • 8. 发明公开
    • 액정표시장치의 화소구조
    • 液晶显示装置的像素结构
    • KR1020040048118A
    • 2004-06-07
    • KR1020020075890
    • 2002-12-02
    • 엘지디스플레이 주식회사
    • 김대홍윤종서서기철박현진
    • G02F1/1343
    • G02F1/136286
    • PURPOSE: A pixel structure of an LCD device is provided to change types of gate electrodes and gate bus lines in a step difference area where the gate bus lines are overlapped with data bus lines on an array substrate, thereby preventing data and source/drain electrode from being open. CONSTITUTION: Plural gate bus lines(21a,21b) and data bus lines(23a,23b) are crossed in vertical direction, and define unit pixel areas. TFTs are formed in areas where the gate bus lines(21a,21b) and the data bus lines(23a,23b) vertically cross each other, and pixel electrodes(29a,29b) are disposed in the unit pixel areas by an ITO(Indium-Tin-Oxide) metal. A gate insulating film and an active layer(27) are disposed on the gate bus lines(21a). The data bus line(23a) and source/drain electrodes(26a,26b) are disposed on the active layer(27).
    • 目的:提供LCD器件的像素结构,以在栅极总线与阵列基板上的数据总线重叠的阶差区域中改变栅极电极和栅极总线的类型,从而防止数据和源极/漏极 从开放 构成:多条栅极总线(21a,21b)和数据总线(23a,23b)在垂直方向上交叉,并且限定单位像素区域。 TFT形成在栅极总线(21a,21b)和数据总线(23a,23b)垂直交叉的区域,像素电极(29a,29b)通过ITO(铟 - 氧化铅)金属。 栅极绝缘膜和有源层(27)设置在栅极总线(21a)上。 数据总线(23a)和源/漏电极(26a,26b)设置在有源层(27)上。
    • 9. 发明公开
    • 액정 표시장치의 데이터 패드부 및 그 형성방법
    • LCD及其制造方法的数据垫部分
    • KR1020030010873A
    • 2003-02-06
    • KR1020010045521
    • 2001-07-27
    • 엘지디스플레이 주식회사
    • 소재문윤종서
    • G02F1/133
    • PURPOSE: A data pad part of a liquid crystal display device and a method for fabricating the same are provided to simplify the fabricating steps by reducing the number of required masks and prevent the open-reject due to the mechanical damage of the data pad in the brake procedure by forming open-reject preventing patterns apart from the data pad with a height equal to or higher than the data pad. CONSTITUTION: A data pad part of a liquid crystal display device is in a stacked structure of a gate insulating film(212), a semiconductor layer(213) patterned on the gate insulating film, an ohmic contact layer(214) and an electrode layer(215) on a lower substrate(211) and includes open-reject preventing patterns(204,205) formed in the stacked structure of gate lines(216), the gate insulating film, and the semiconductor layer, wherein the height from the surface of the lower substrate to the electrode layer is about 7800Å and the height of the open-reject preventing pattern is about 8000Å from the surface of the lower substrate to the semiconductor film.
    • 目的:提供液晶显示装置的数据焊盘部分及其制造方法,以通过减少所需掩模的数量来简化制造步骤,并防止由于数据焊盘的机械损坏引起的开漏 通过形成具有等于或高于数据焊盘的高度的与数据焊盘隔开的防止脱离图案的制动过程。 构成:液晶显示装置的数据焊盘部分是栅极绝缘膜(212),在栅极绝缘膜上图案化的半导体层(213),欧姆接触层(214)和电极层 (215)在下基板(211)上,并且包括形成在栅极线(216),栅极绝缘膜和半导体层的层叠结构中的开放阻止防止图案(204,205),其中,从 电极层的下基板约为7800,并且防脱离图案的高度从下基板的表面到半导体膜约为8000。