会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 10. 发明公开
    • 실리콘 단결정 냉각장치 및 이를 이용한 실리콘 단결정 성장 장치
    • 用于冷却硅单晶和硅晶体晶体生长装置的装置
    • KR1020130079831A
    • 2013-07-11
    • KR1020120000563
    • 2012-01-03
    • 에스케이실트론 주식회사
    • 이성찬김상희
    • C30B35/00C30B29/06C30B11/00H01L21/02
    • PURPOSE: An apparatus for cooling a silicon crystal and an apparatus for growing the silicon crystal are provided to efficiently absorb radiant heat from a silicon crystal ingot by assembling a plurality of water cooling tubes with different cooling speeds. CONSTITUTION: A water cooling tube assembly support (200) is assembled by laminating a first water cooling tube (300) and a second water cooling tube (400). The first and second water cooling tubes are assembled by a coupling member (210) of the water cooling tube assembly support. The radiant heat absorption rate of the first water cooling tube is different from the radiant heat absorption rate of the second water cooling tube. One of the first and second water cooling tubes is coated with radiant heat absorption materials. The first and second water cooling tubes are coated with ceramics to reduce the contamination of an ingot (100).
    • 目的:提供一种用于冷却硅晶体的装置和用于生长硅晶体的装置,以通过组装具有不同冷却速度的多个水冷却管来有效地吸收来自硅晶锭的辐射热。 构成:通过层压第一水冷却管(300)和第二水冷却管(400)来组装水冷管组件支撑件(200)。 第一和第二水冷却管由水冷却管组件支撑件的联接构件(210)组装。 第一水冷却管的辐射吸热率与第二水冷却管的辐射吸热率不同。 第一和第二水冷却管之一涂有辐射吸热材料。 第一和第二水冷却管涂覆陶瓷以减少锭(100)的污染。