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1. 发明公开

KR1020130037517A 예비 토출 유닛 审中-实审
标题翻译：预排放单位
公开(公告)号：KR1020130037517A
公开(公告)日：2013-04-16
申请号：KR1020110101962
申请日：2011-10-06
申请人： 세메스 주식회사
发明人： 김병재 , 양진혁
IPC分类号： H01L21/027 , H01L21/02
CPC分类号： H01L21/0274 , G03F7/16 , H01L21/02002 , H01L21/02019
摘要： PURPOSE: A preliminary discharge unit is provided to uniformly put a chemical solution at the discharge end of a nozzle in the longitudinal direction in a preliminary discharge process. CONSTITUTION: A preliminary discharge unit(600) provides a preliminary discharge space in a nozzle(300). The preliminary discharge unit includes a process tub(620), a roller(640), a rotation shaft(660), and a blade. A washing solution is filled in the process tub. The roller is rotatably arranged in the process tub. The roller has a body part(642) and a plating part(646). The rotation shaft supports both sides of the roller. The blade removes a small quantity of the washing solution adhering to the outer surface of the roller.
摘要翻译：目的：提供一个初步排放单元，用于在初步排放过程中，在喷嘴的排放端沿纵向均匀地放置化学溶液。构成：初步排放单元（600）在喷嘴（300）中提供预备排放空间。初步排出单元包括处理桶（620），辊（640），旋转轴（660）和叶片。洗涤溶液填充在过程桶中。辊可旋转地布置在过程桶中。辊具有主体部分（642）和电镀部分（646）。旋转轴支撑滚筒的两侧。刀片除去附着在辊外表面上的少量洗涤液。

2. 发明公开

KR1020100059235A 유체 분사 장치 无效
标题翻译：喷射流体的装置
公开(公告)号：KR1020100059235A
公开(公告)日：2010-06-04
申请号：KR1020080117932
申请日：2008-11-26
申请人： 세메스 주식회사
发明人： 김병재 , 박종호
IPC分类号： B05C5/02 , H01L21/302 , B08B3/00 , G02F1/13
CPC分类号： B05C5/027 , B05C9/14 , G02F1/13 , H01L21/302
摘要： PURPOSE: A fluid spraying apparatus is provided to uniformly spray fluid on a substrate with a constant pressure by supplying the fluid using spraying nozzles with a reduced inflow sectional area. CONSTITUTION: A fluid spraying apparatus(100) comprises the following: a housing(110) extended toward one direction; a buffer unit(120) formed along the housing and filled with fluid inserted from an outer supplying source; and multiple spraying nozzles(130) located along the housing and connected with the buffer unit to spray the fluid to an exterior. The spraying nozzles have shapes which gradually expand to the spraying direction and fixed widths. The tip-ends of the spraying nozzles are connected to each other to form a slit shape.
摘要翻译：目的：提供一种流体喷涂装置，通过使用具有减小的流入截面面积的喷嘴供给流体，以恒定压力将流体均匀地喷射在基板上。构成：流体喷射装置（100）包括：向一个方向延伸的壳体（110）; 缓冲单元（120），沿着所述壳体形成，并且填充有从外部供给源插入的流体; 和多个喷雾嘴（130），沿着壳体定位并与缓冲单元连接以将流体喷射到外部。喷嘴具有逐渐扩大到喷射方向和固定宽度的形状。喷嘴的前端彼此连接以形成狭缝形状。

3. 发明公开

KR1020090117476A 약액 공급 장치 有权
标题翻译：化学设备
公开(公告)号：KR1020090117476A
公开(公告)日：2009-11-12
申请号：KR1020080043540
申请日：2008-05-09
申请人： 세메스 주식회사
发明人： 김병재
IPC分类号： H01L21/306
CPC分类号： H01L21/67017 , B05B12/14
摘要： PURPOSE: An apparatus for supplying chemical solution is provided to simplify a structure by separating one chemical solution tank into two storages using a partition. CONSTITUTION: A chemical solution supply unit(100) includes a chemical solution tank(110), a first pump(120), and a second pump(130). The chemical solution tank has a partition inside. The tank is divided into a first storage and a second storage by the partition. The first pump supplies the chemical solution from the first storage to a substrate processor. The second pump supplies the chemical solution from the second storage to the substrate processor. The chemical solution moves between the first storage and the second storage. The partition has at least one penetration hole.
摘要翻译：目的：提供一种用于提供化学溶液的设备，以通过使用隔板将一个化学溶液罐分成两个储存器来简化结构。构成：化学溶液供应单元（100）包括化学溶液罐（110），第一泵（120）和第二泵（130）。化学溶液罐内有隔板。储罐通过隔板分成第一储存器和第二储存器。第一个泵将化学溶液从第一个储存器提供给基板处理器。第二个泵将化学溶液从第二个储存器提供给基板处理器。化学溶液在第一储存器和第二储存器之间移动。隔板具有至少一个穿透孔。

4. 发明授权

KR100841340B1 기판 베이크 장치 失效
标题翻译：基材包装
公开(公告)号：KR100841340B1
公开(公告)日：2008-06-26
申请号：KR1020070008294
申请日：2007-01-26
申请人： 세메스 주식회사
发明人： 김병재 , 함승원
IPC分类号： H01L21/324
CPC分类号： H01L21/67098 , H01L21/324 , H01L21/68714
摘要： A substrate baking apparatus is provided to effectively cool down an overall surface of a substrate by adopting a partial cooling scheme for a cooling plate. A substrate baking apparatus includes a chamber(101), plural cooling plates(110-140), and cooling lines(115-145). The chamber defines an enclosed space, where a substrate treating process is performed. The cooling plate directly supports one substrate. The cooling plates are arranged, such that the chamber is uniformly divided. The cooling line is arranged inside the cooling plate and provides a coolant circulating path. The cooling line is formed in a zigzag formation.
摘要翻译：提供了一种基板烘烤装置，通过采用用于冷却板的部分冷却方案来有效地冷却基板的整个表面。基板烘烤装置包括室（101），多个冷却板（110-140）和冷却管线（115-145）。腔室限定了一个封闭的空间，其中进行了基底处理过程。冷却板直接支撑一个基板。冷却板被布置成使得室被均匀地分开。冷却管线布置在冷却板内部并提供冷却剂循环路径。冷却线形成为锯齿形。

5. 发明授权

KR101451856B1 약액 공급 장치 有权
公开(公告)号：KR101451856B1
公开(公告)日：2014-10-16
申请号：KR1020080043540
申请日：2008-05-09
申请人： 세메스 주식회사
发明人： 김병재
IPC分类号： H01L21/306
摘要： 약액 공급 장치가 제공된다. 본 발명의 실시예에 따른 약액 공급 장치는, 격벽에 의해 약액을 저장하는 제1 저장부 및 제2 저장부로 분리되는 약액 탱크와, 제1 저장부로부터 약액을 기판 처리부로 공급하는 제1 펌프 및 제2 저장부로부터 약액을 기판 처리부로 공급하는 제2 펌프를 포함하며, 격벽에는 제1 저장부와 제2 저장부 사이에 약액의 이동이 가능한 적어도 하나의 관통 홀이 형성된다.
약액 공급 장치, 약액 탱크, 캐스케이드 구조, 격막

6. 发明公开

KR1020100056608A 기판 코팅 장치 有权
标题翻译：涂装基材的装置
公开(公告)号：KR1020100056608A
公开(公告)日：2010-05-28
申请号：KR1020080115487
申请日：2008-11-20
申请人： 세메스 주식회사
发明人： 김병재 , 함승원
IPC分类号： B05C5/00 , G02F1/13
CPC分类号： B05C5/02 , B05C9/12 , G02F1/13 , H01L21/027 , H01L2221/00
摘要： PURPOSE: A substrate coating apparatus is provided to secure a uniformity of a coating film from both sides of a substrate, and to reduce the discarding amount of the substrate by a coating film imbalance. CONSTITUTION: A substrate coating apparatus comprises the following: a table(110) to put a substrate(G); a coating unit(120) supplying a coating material on the substrate while moving to the horizontal direction to form a coating film on the substrate; and a bead formation block(130) closely located to one side of the substrate to form an edge bead of the coating film. The bead formation block is capable of ascending and descending to be located with the substrate in parallel.
摘要翻译：目的：提供一种基板涂布装置，用于确保涂膜从基板两侧的均匀性，并通过涂膜不平衡减少基板的丢弃量。构成：基材涂布装置包括：放置基板（G）的工作台（110）; 涂覆单元（120），其在向所述水平方向移动的同时在所述基板上供给涂料，以在所述基板上形成涂膜; 以及紧密地位于所述基板的一侧的珠形成块（130），以形成所述涂膜的边缘。胎圈形成块能够上升和下降以与衬底平行地定位。

7. 发明公开

KR1020090117483A 약액 공급 장치 有权
标题翻译：化学设备
公开(公告)号：KR1020090117483A
公开(公告)日：2009-11-12
申请号：KR1020080043551
申请日：2008-05-09
申请人： 세메스 주식회사
发明人： 김병재
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , G03F7/16
摘要： PURPOSE: A chemical supply device is provided to remove the hydroplaning on a surface of a mesh net by including an air vent pipe in the mesh net. CONSTITUTION: A chemical supply device includes a chemical tank(20), a chemical supply pump(30), a process bath(13), and a mesh net. The chemical tank stores the chemical. The chemical supply pump supplies the chemical from the chemical tank to the substrate processing unit. The process bath receives the chemical sprayed in the substrate processing unit and recovers the chemical in the chemical tank. The mesh net is installed between the exhaust pipe connected to the lower side of the process bath and the chemical tank. An air vent pipe is installed in the mesh net to remove the hydroplaning on the surface of the mesh net.
摘要翻译：目的：提供一种化学品供应装置，通过在网状网中包括排气管来除去网状网的表面上的滑水。构成：化学品供应装置包括一个化学品罐（20），一个化学品供应泵（30），一个处理槽（13）和一个网状网。化学品罐储存化学品。化学品供应泵将化学品从化学药液供应到基材处理单元。处理槽容纳在基板处理单元中喷洒的化学物质，并回收化学罐中的化学物质。网状网安装在连接到处理槽下侧的排气管与化学罐之间。通风管安装在网状网中以去除网状网表面上的滑水。

8. 发明授权

KR102239520B1 기판 처리 장치 및 방법 有权
公开(公告)号：KR102239520B1
公开(公告)日：2021-04-14
申请号：KR1020140065587
申请日：2014-05-30
申请人： 세메스 주식회사
发明人： 김병재
IPC分类号： H01L21/67 , H01L21/02
摘要： 본발명은기판처리장치를제공한다. 본발명의일 실시예에의하면, 상기기판처리장치는챔버, 상기챔버내에배치되며기판을제 1 방향을따라반송하는반송유닛, 상기챔버내에서상기반송유닛아래에배치되며상부를향해액을공급하는하부분사부재및 상기하부분사부재의분사압을조절하는제어기를포함한다. 또한본 발명은기판처리방법을제공한다. 일실시예에의하여, 챔버내에제공된반송유닛에의해기판을반송하여기판을처리하는기판처리방법에있어서, 기판세정시노즐로부터제 1 압력으로액을분사하여기판을세정하고, 챔버세정시노즐로부터제 2 압력으로액을분사하여챔버를세정한다.

9. 发明授权

KR101583750B1 기판 처리 장치 및 방법 有权
标题翻译：基板处理装置及方法
公开(公告)号：KR101583750B1
公开(公告)日：2016-01-19
申请号：KR1020140063259
申请日：2014-05-26
申请人： 세메스 주식회사
发明人： 김병재
IPC分类号： H01L21/302 , H01L21/02
摘要： 본발명은기판처리장치를제공한다. 기판처리장치는챔버, 상기챔버내에배치되며제 1 방향을따라반송하는반송유닛, 상기챔버내에배치되며하부가개방된제 1 공간을제공하는하우징및 상기하우징내에배치되며, 기판으로제 1 액을분사하는분사부재를포함하되, 상기제 1 공간에는제 1 감압부재가설치된제 1 배기관이결합되고, 상기하우징과상기챔버의사이의제 2 공간에는제 2 감압부재가설치된제 2 배기관이결합된다. 본발명은기판처리방법을제공한다. 상기분사부재로상기제 1 액을분사할때, 상기제 1 감압부재및 상기제 2 감압부재는상기제 1 공간에상기제 2 공간보다더 큰음압을제공하는것을포함한다

10. 发明公开

KR1020150137521A 기판 처리 장치 및 방법 有权
标题翻译：装置和处理基板的方法
公开(公告)号：KR1020150137521A
公开(公告)日：2015-12-09
申请号：KR1020140065516
申请日：2014-05-30
申请人： 세메스 주식회사
发明人： 김병재
IPC分类号： H01L21/302 , H01L21/677
CPC分类号： H01L21/67051 , H01L21/02041
摘要： 본발명은기판처리장치및 기판처리방법을제공한다. 기판처리장치는챔버, 상기챔버내에배치되며제 1 방향으로반송하는반송유닛및 상기챔버내에배치되며, 기판으로액을분사하는분사부재를포함하되, 상기분사부재는상기액과상기기판이충돌하는위치가상부에서바라볼때 상기제 1 방향에수직한제 2 방향에경사진방향에서형성되도록제공되는노즐을포함한다. 기판처리방법은기판을제 1 방향을따라반송하고, 반송되는상기기판에챔버상부에제공된분사부재를통해액을분사하여기판을처리하되, 상기분사부재는상기액과상기기판이충돌하는위치가상부에서바라볼때 상기제 1 방향에수직한제 2 방향에경사진방향으로형성되도록제공된노즐을포함한다.
摘要翻译：本发明提供一种处理基板的装置和方法。用于处理衬底的装置包括：腔室; 设置在所述室中的输送单元，并且沿第一方向输送基板; 以及设置在所述室中的喷射构件，并且将液体喷射到所述基板。喷射构件包括喷嘴，其允许液体和基板沿着从上侧观察时朝向与第一方向垂直的第二方向倾斜的方向碰撞。处理基板的方法包括以下步骤：在第一方向上输送基板; 以及通过将被供应到所述室的上部的所述喷射构件喷射到所传送的基板上来处理所述基板。喷射构件包括喷嘴，其允许液体和基板沿着从上侧观察时朝向与第一方向垂直的第二方向倾斜的方向碰撞。

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