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    • 4. 发明公开
    • 용해 특성을 조절하는 감광성 수지 조성물 및 이를 이용한이층 구조의 패턴 형성 방법
    • 用于控制熔融特性的光催化剂树脂组合物及其形成两层结构图案的方法
    • KR1020040031137A
    • 2004-04-13
    • KR1020020060500
    • 2002-10-04
    • 주식회사 동진쎄미켐삼성전자주식회사
    • 양석윤노수귀김길래박찬석박춘호
    • G02B5/20
    • G03F7/032G03F7/0007G03F7/0751Y10S430/106
    • PURPOSE: A photoresist resin composition for controlling a melting characteristic and a method for forming a pattern of a two layer structure using the same are provided to control a gamma value and the thickness of the layer by using a new photopolymerization initiator and a hardener for bottom layer. CONSTITUTION: A photoresist resin composition for controlling a melting characteristic includes a binder of 5 to 30 weight percent, a crosslinkable monomer of 5 to 30 weight percent, paints of 10 to 60 weight percent, a photopolymerization initiator of 1 to 5 weight percent, a hardener of 0.1 to 2 weight percent, and a solvent of 20 to 80 weight percent. The binder melts in alkali aqueous solution. The crosslinkable monomer is formed with two or more ethylene-based double bond. The photopolymerization initiator is formed with one or more materials, which are selected from a group including an acetophenone compound, a xanthone compound, a benzoin compound, and an imidazole compound. The hardener is formed with one or more materials, which are selected from a group including a silane polymer, an ethylene monomer having one or more epoxy bases and an oligomer of the ethylene monomer.
    • 目的:提供用于控制熔融特性的光致抗蚀剂树脂组合物和使用其的形成两层结构的图案的方法,以通过使用新的光聚合引发剂和底部的固化剂来控制该层的γ值和厚度 层。 构成:用于控制熔融特性的光致抗蚀剂树脂组合物包括5至30重量%的粘合剂,5至30重量%的可交联单体,10至60重量%的涂料,1至5重量%的光聚合引发剂,1至5重量%的光聚合引发剂, 0.1〜2重量%的硬化剂,20〜80重量%的溶剂。 粘合剂在碱性水溶液中熔化。 可交联单体由两个或更多个乙烯基双键形成。 光聚合引发剂由选自苯乙酮化合物,呫吨酮化合物,苯偶姻化合物和咪唑化合物的一种或多种材料形成。 硬化剂由一种或多种材料形成,其选自包括硅烷聚合物,具有一个或多个环氧基的乙烯单体和乙烯单体的低聚物的组。
    • 6. 发明公开
    • 씬너 조성물
    • 薄膜组成
    • KR1020030000359A
    • 2003-01-06
    • KR1020010036103
    • 2001-06-23
    • 주식회사 동진쎄미켐
    • 박찬석김길래박춘호김경아
    • G03F7/32
    • G03F7/32C11D3/044G03F7/168G03F7/322G03F7/422G03F7/423G03F7/425
    • PURPOSE: A thinner composition is provided, which is used to remove the unnecessary membrane component formed at the edge of a resist membrane coated on a substrate or at the rear face of a substrate without the corrosion of an equipment, and is improved in the resist removing property. CONSTITUTION: The thinner composition comprises 0.1-5 wt% of an organic amine; 0.1-30 wt% of an organic solvent; 0.01-5 wt% of a surfactant comprising an anionic surfactant and a nonionic surfactant; and 60-99 wt% of water. The organic solvent is selected from the group consisting of ethylene glycol phenyl ether, propylene glycol phenyl ether, butylene glycol phenyl ether, diethylene glycol phenyl ether, dipropylene glycol phenyl ether, N-methylpyrrolidone, N-ethylpyrrolidone, N-propylpyrrolidone, N-hydroxymethylpyrrolidone, N-hydroxyethylpyrrolidone and their mixtures. Preferably the ratio of an anionic surfactant and a nonionic surfactant is 1:5 by mass.
    • 目的:提供更薄的组合物,其用于除去涂覆在基材上的抗蚀剂膜的边缘或基材的背面上形成的不必要的膜组分,而不会使设备腐蚀,并且改进了抗蚀剂 删除属性。 构成:较薄的组合物包含0.1-5重量%的有机胺; 0.1-30重量%的有机溶剂; 0.01-5重量%的包含阴离子表面活性剂和非离子表面活性剂的表面活性剂; 和60-99重量%的水。 有机溶剂选自乙二醇苯基醚,丙二醇苯基醚,丁二醇苯基醚,二甘醇苯基醚,二丙二醇苯基醚,N-甲基吡咯烷酮,N-乙基吡咯烷酮,N-丙基吡咯烷酮,N-羟甲基吡咯烷酮 ,N-羟乙基吡咯烷酮及其混合物。 阴离子表面活性剂和非离子表面活性剂的比例优选为1:5质量%。