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    • 2. 发明公开
    • 토출 노즐식 도포법용 포지티브형 포토레지스트 조성물 및레지스트 패턴의 형성방법
    • 放电喷涂方法的积极光电组合物和耐蚀图案的形成方法
    • KR1020050033458A
    • 2005-04-12
    • KR1020040078514
    • 2004-10-02
    • 도오꾜오까고오교 가부시끼가이샤
    • 모리오기미타카아오키도모사부로가토데츠야나카지마데츠야
    • G03F7/023
    • A positive photoresist composition is provided to prevent the formation of a scratched line on the surface of the photoresist coat without requiring an excessive use of the photoresist composition when using a discharge nozzle type coating method, and thus to maintain the photoresist layer thin, thereby being advantageously applied to a discharge nozzle type coating method. The positive photoresist composition useful for a discharge nozzle type coating method wherein the coating process is carried out by relatively moving a discharge nozzle and a substrate, comprises: (A) an alkali-soluble novolac resin; (B) a phenolic compound containing hydroxyl groups having a molecular weight of 1000 or more, specifically a compound represented by formula I; (C) a compound containing a naphthoquinone diazide group; and (D) an organic solvent, wherein the organic solvent comprises propylene glycol monomethylether acetate.
    • 提供正性光致抗蚀剂组合物以防止在光致抗蚀剂涂层的表面上形成划痕线,而不需要在使用放电喷嘴型涂布方法时过度使用光致抗蚀剂组合物,从而保持光致抗蚀剂层变薄 有利地应用于喷嘴型涂布方法。 用于喷射喷嘴型涂布方法的正性光致抗蚀剂组合物,其中通过相对移动排出喷嘴和基材进行涂布处理,包括:(A)碱溶性酚醛清漆树脂; (B)含有分子量为1000以上的羟基的酚类化合物,具体为式I表示的化合物; (C)含有萘醌二叠氮基的化合物; 和(D)有机溶剂,其中有机溶剂包括丙二醇单甲醚乙酸酯。