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    • 3. 发明公开
    • 테이프 형상 금속 기재의 표면 연마 시스템 및 연마 방법
    • 用于抛光金属基材的表面抛光系统及方法
    • KR1020090029177A
    • 2009-03-20
    • KR1020087005322
    • 2007-07-05
    • 니혼 미크로 코팅 가부시끼 가이샤
    • 와따나베다께히로호리모또사나끼나가미네다꾸야호리에유우지
    • B24B7/13B24B37/04
    • B24B7/13
    • Provided are a system and a method for uniformly polishing a surface of a tape-like metal base material in a unit of several hundred meters, at a high speed and a high efficiency. The polishing system for continuously polishing the surface of the tape-like metal base material to be polished is provided with an apparatus for continuously running the tape-like metal base material; an apparatus for applying a prescribed tension to the tape-like metal base material; a first polishing apparatus for performing initial polishing at random to the surface of the tape-like metal base material to be polished; and a second polishing apparatus for performing final polishing to the surface of the tape-like metal base material to be polished, along the running direction. A polishing mark is formed by the final polishing, along the running direction on the surface to be polished.
    • 提供了以高速和高效率以数百米为单位对带状金属基材的表面进行均匀抛光的系统和方法。 用于连续抛光待抛光的带状金属基材的表面的抛光系统设置有用于连续运行带状金属基材的装置; 用于向带状金属基材施加规定张力的装置; 用于随机对要抛光的带状金属基材的表面进行初始抛光的第一抛光装置; 以及第二抛光装置,用于沿着运行方向对被抛光的带状金属基材的表面进行最终抛光。 通过最后研磨,沿被抛光表面的运行方向形成抛光标记。