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2. 发明公开

KR1020030038377A 기판세정장치 및 방법 有权
标题翻译：基板清洗装置和方法
公开(公告)号：KR1020030038377A
公开(公告)日：2003-05-16
申请号：KR1020020065771
申请日：2002-10-28
申请人： 가부시키가이샤 스크린 홀딩스
发明人： 나카지마카즈오 , 사토마사노부 , 스기모토히로아키 , 하시즈메아키오 , 츠지카와히로키
IPC分类号： H01L21/304
CPC分类号： H01L21/67051 , B01F3/04007 , B01F3/04985 , B01F5/0471 , B08B3/02 , Y10S134/902
摘要： PURPOSE: A substrate cleaning apparatus and method are provided to be capable of preventing cleaning mist from being scattered to the unexpected direction. CONSTITUTION: A substrate cleaning apparatus(1) is provided with a substrate cleaning part(50) for mainly cleaning a substrate(W), a process solution supply part(60) for supplying predetermined deionized water made of nitrogen gas as inert gas and a cleaning solution to the substrate cleaning part, and a controller(70) for controlling the substrate cleaning apparatus. At this time, the substrate cleaning part includes a substrate rotation part(10) for holding and rotating the substrate and a process solution jet part(20) for jetting the cleaning solution onto the substrate. At the time, the substrate rotation part includes a rotation base(11), a plurality of chuck pins(12) installed at the upper portion of the rotation base, a rotating motor(14) for rotating the rotation base, and a cup(15) for enclosing the peripheral portion of the substrate.
摘要翻译：目的：提供一种基板清洗装置和方法，能够防止清洁雾被散射到意想不到的方向。构成：基板清洗装置（1）设置有用于主要清洗基板（W）的基板清洗部（50），用于将由氮气制成的预定去离子水用作惰性气体的处理液供给部（60）清洁溶液到基板清洁部分，以及用于控制基板清洁装置的控制器（70）。此时，基板清洗部包括用于保持和旋转基板的基板旋转部（10）和用于将清洗液喷射到基板上的处理液喷射部（20）。此时，基板旋转部包括旋转基座（11），安装在旋转基座的上部的多个卡盘销（12），旋转基座的旋转马达（14）和杯 15），用于封装基板的周边部分。

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