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    • 6. 发明公开
    • 포름알데히드, 일산화탄소, 메탄올 및 수소 산화 제거용 백금 촉매의 제조 방법
    • 铂催化剂,其制备方法和除去甲醛,二氧化碳,甲醇和氢气的方法
    • KR1020120134379A
    • 2012-12-12
    • KR1020110053244
    • 2011-06-02
    • (주) 세라컴
    • 조항근이강홍이승현남승하서필원홍성창강연석김성수이현희김기왕박광희이상문권동욱김거종원종민
    • B01J23/42B01J37/02B01J37/34B01D53/86
    • B01J37/345B01J23/42B01J37/18
    • PURPOSE: A formaldehyde, carbon monoxide, methanol, and hydrogen-oxidizing removal platinum catalyst, a manufacturing method of the platinum catalyst, and a removal method of formaldehyde, carbon monoxide, methanol, and hydrogen using the same are provided to minimize the generation of dust and efficiently remove formaldehyde, carbon monoxide, methanol, and hydrogen from an indoor place. CONSTITUTION: A formaldehyde, carbon monoxide, methanol, and hydrogen-oxidizing removal platinum catalyst includes the following steps: a metal is coated on a support; and platinum is supported on the support on the basis of UV irradiation. The metal is titania sol. A platinum precursor for supporting the platinum is one selected from platinum chloride(PtCl_4), tetra-amine platinum nitrate(Pt(NH_3)_4(NO_3)_2), or hydroxyl platinum(NH_2-CH_2CH_2-OH)·2Pt(OH)_6. The amount of the platinum precursor on the basis of the titania is 0.1-5.0 weight%. The wavelength of UV is 10-400nm. [Reference numerals] (AA) Oxidation rate of formaldehyde(%); (BB) Example; (CC) Embodiment 1; (DD) Embodiment 2; (EE) Spatial velocity(hr^-)
    • 目的:提供甲醛,一氧化碳,甲醇和氢氧化去除铂催化剂,铂催化剂的制造方法和使用其的甲醛,一氧化碳,甲醇和氢气的去除方法,以最小化 从室内放置并有效地除去甲醛,一氧化碳,甲醇和氢气。 构成:甲醛,一氧化碳,甲醇和氢氧化去除铂催化剂包括以下步骤:将金属涂覆在载体上; 并且在紫外线照射的基础上支撑铂。 金属是二氧化钛溶胶。 用于负载铂的铂前体是选自氯化铂(PtCl 4),四胺硝酸铂(Pt(NH 3)4(NO 3)2))或羟基铂(NH 2 -CH 2 -OH)2 Pt(OH) 。 基于二氧化钛的铂前体的量为0.1-5.0重量%。 UV的波长为10-400nm。 (标号)(AA)甲醛的氧化率(%); (BB)示例; (CC)实施例1; (DD)实施例2; (EE)空速(hr ^ - )
    • 9. 发明公开
    • 반도체 제조공정의 유해가스 처리 방법
    • 用于处理在半导体制造工艺中产生的危险气体的方法
    • KR1020130108732A
    • 2013-10-07
    • KR1020120030387
    • 2012-03-26
    • (주) 세라컴
    • 이강홍홍성창이상문
    • H01L21/02
    • Y02P70/605H01L21/67098B01D46/0047B01D46/24H01L21/67028
    • PURPOSE: A method for treating hazardous gas generated in a semiconductor manufacturing process is provided to treat fetid toxic gas of low concentration with high efficiency by integrating a particle filtering process with a catalytic oxidation process after a heat recovery oxidation process. CONSTITUTION: A thermal oxidation process using heat recovery oxidation is performed on toxic gas. A powdered oxide generated in the thermal oxidation is filtered by a filter (21). The filter is divided by tube-type cells comprising a porous partition wall (22). A partition wall includes an adsorption catalyst for adsorbing the powdered oxide. A catalytic combustion process is performed on unreactive toxic gas.
    • 目的:提供一种治疗半导体制造工序中产生的有害气体的方法,通过在热回收氧化工序后将颗粒过滤工艺与催化氧化工序结合,高效率地处理低浓度有毒气体。 构成:对有毒气体进行使用热回收氧化的热氧化工艺。 在热氧化中产生的粉状氧化物被过滤器(21)过滤。 过滤器由包含多孔分隔壁(22)的管型电池分开。 分隔壁包括用于吸附粉状氧化物的吸附催化剂。 对非反应性有毒气体进行催化燃烧过程。