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81. 发明公开

KR1020100102170A 방사선 소스, 리소그래피 장치 및 디바이스 제조방법 无效
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：KR1020100102170A
公开(公告)日：2010-09-20
申请号：KR1020107016125
申请日：2008-12-19
申请人： 에이에스엠엘 네델란즈 비.브이.
发明人： 바니네,바딤예프겐예비치 , 반헤르펜,마르텐마리누스요한네스빌헬무스 , 소어,보우터안톤
IPC分类号： H05G2/00 , G03F7/20 , H01L21/027
CPC分类号： H05G2/003 , H05G2/005 , G03F7/20 , H01L21/0274
摘要： A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.

82. 发明公开

KR1020100057898A 높은 전력 동작을 위해 휠 커버를 포함하는 가스 방전 소스들을 위한 회전 휠 전극 디바이스 有权
标题翻译：用于高功率运行的包含轮盖的气体放电源旋转电极装置
公开(公告)号：KR1020100057898A
公开(公告)日：2010-06-01
申请号：KR1020107007485
申请日：2008-08-14
申请人： 코닌클리케 필립스 엔.브이.
发明人： 조카베츠,울라드지미르 , 크루켄,토마스 , 데라,권터,에이치.
IPC分类号： H05G2/00
CPC分类号： H01J1/88 , H05G2/005
摘要： The present invention relates to an electrode device for gas discharge sources and to a gas discharge source having one or two of said electrode devices. The electrode device comprises an electrode wheel (7) rotatable in a rotational direction around a rotational axis (22), said electrode wheel (7) having an outer circumferential surface (24) between two side surfaces (25). An electrode wheel cover (8) is provided which covers a portion of the outer circumferential surface (24) and the side surfaces (25) of the electrode wheel (24). The cover (8) is designed to form a cooling channel (12) in the circumferential direction between the cover (8), the outer circumferential surface (24) and radially outer portions part of the side surfaces (25), and to form a gap (23) between the cover (8) and the outer circumferential surface (24) in extension of the cooling channel (12) in the circumferential direction. The gap (23) has a smaller flow cross section than the cooling channel (12) and limits a thickness of the liquid material film formed on the outer circumferential surface (24) during rotation of the electrode wheel (7). Alternatively to the gap (23) the cover (8) may be designed to inhibit the formation of such a film from the liquid material flowing through the cooling channel (12). The cooling channel (12) allows at the same time cooling of the electrode wheel (7) by the liquid material circulating through the cooling channel (12). With the proposed design of the cover (8), an efficient cooling of the electrode wheel (7) is achieved, allowing high electrical powers for operating gas discharge sources with such an electrode device.
摘要翻译：本发明涉及一种用于气体放电源的电极装置和一种具有一个或两个所述电极装置的气体放电源。所述电极装置包括绕旋转轴线（22）沿旋转方向旋转的电极轮（7），所述电极轮（7）在两个侧面（25）之间具有外周面（24）。设置有覆盖电极轮（24）的外周面（24）的一部分和侧面（25）的电极轮罩（8）。盖（8）被设计成在盖（8），外周面（24）和侧面（25）的径向外部部分之间沿圆周方向形成冷却通道（12），并形成在周向上在冷却通道（12）延伸的盖（8）和外周面（24）之间的间隙（23）。间隙（23）具有比冷却通道（12）更小的流动横截面，并限制了在电极轮（7）旋转期间形成在外圆周表面（24）上的液体材料膜的厚度。可替换地，间隙（23），盖（8）可以设计成阻止从流过冷却通道（12）的液体材料形成这种膜。冷却通道（12）同时允许通过冷却通道（12）循环的液体材料冷却电极轮（7）。通过提出的盖（8）的设计，实现了电极轮（7）的有效冷却，允许用这种电极装置操作气体放电源的高电功率。

83. 发明公开

KR1020090088951A 방사선 시스템 및 리소그래피 장치 失效
标题翻译：辐射系统和光刻设备
公开(公告)号：KR1020090088951A
公开(公告)日：2009-08-20
申请号：KR1020097014489
申请日：2007-12-13
申请人： 에이에스엠엘 네델란즈 비.브이.
发明人： 반헤르펜,마르텐마리누스요한네스빌헬무스 , 바니네,바딤예프겐예비치 , 이바노프,블라디미르비탈에비치 , 코셀레프,콘스탄틴니콜라에비치 , 클룬더,데르크얀빌프레드
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles. ® KIPO & WIPO 2009
摘要翻译：本发明涉及一种用于产生电磁辐射的辐射系统。辐射系统包括一对电极，其构造和布置成产生等离子体中的第一物质的等离子体和夹紧。辐射系统还包括等离子体复合表面，其被布置成靠近夹点，并且被配置为中和多个等离子体颗粒。 ®KIPO＆WIPO 2009

84. 发明公开

KR1020090033787A 극단 자외광 발생 방법 및 극단 자외광 광원 장치 无效
标题翻译：产生超极紫外光的极光紫外光和光源装置的方法
公开(公告)号：KR1020090033787A
公开(公告)日：2009-04-06
申请号：KR1020080081261
申请日：2008-08-20
申请人： 도오쿄 인스티튜드 오브 테크놀로지 , 우시오덴키 가부시키가이샤
发明人： 호소카이도모나오 , 호리오카가즈히코 , 세키교헤이 , 요코야마다쿠마
IPC分类号： H05H1/24 , H01L21/027 , G03F7/20
CPC分类号： H05G2/003 , H05G2/005 , G03F7/70033
摘要： A method for generating extreme ultraviolet light and an extreme ultraviolet light source apparatus are provided to make a relatively low current flow in a discharging region by forming the high temperature plasma satisfying the extreme ultraviolet radiation condition. A pulse power is supplied between first and second electrodes(2a,2b) installed inside a chamber(1). A discharge channel is formed between two electrodes. A laser beam(L1) is emitted from a laser source(7). The laser beam is irradiated to the high temperature plasma raw material(8). The low temperature plasma gas is supplied to the discharge channel. The radiation of the extreme ultraviolet light is started by converting the low temperature plasma gas to the high temperature plasma through the discharge. The radiation of the extreme ultraviolet light is condensed by an extreme ultraviolet light condenser(4) and is emitted from an extreme ultraviolet light pickup unit(5).
摘要翻译：提供一种用于产生极紫外光的方法和一种极紫外光源装置，通过形成满足极紫外辐射条件的高温等离子体，在放电区域中形成相对低的电流。在安装在室（1）内的第一和第二电极（2a，2b）之间提供脉冲功率。在两个电极之间形成放电通道。从激光源（7）发射激光束（L1）。激光束照射到高温等离子体原料（8）上。低温等离子体气体被供给到排出通道。通过放电将低温等离子体气体转换成高温等离子体，开始进行极紫外光的照射。极紫外光的辐射由极紫外光聚光器（4）冷凝，并从极紫外光拾取单元（5）发射。

85. 发明公开

KR1020080024535A ＬＰＰＥＵＶ 광원 구동 레이저 시스템 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：KR1020080024535A
公开(公告)日：2008-03-18
申请号：KR1020087001491
申请日：2006-06-27
申请人： 사이머 엘엘씨
发明人： 에르쇼프알렉산더아이. , 바이카노프알렉산더엔. , 코디킨올레흐 , 포멘코프아이고르브이.
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 mum at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO 2 laser. The drive laser redirecting mechanism may comprise a mirror. ® KIPO & WIPO 2008
摘要翻译：公开了一种装置和方法，其可以包括激光产生的等离子体EUV系统，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100μm的EUV目标液滴上的波长，如果在所涉及的几何形状的约束条件下聚焦镜头。驱动激光器可以包括CO 2激光器。驱动激光重定向机构可以包括镜子。 ®KIPO＆WIPO 2008

86. 发明公开

KR1020070023694A ＥＵＶ 광원, ＥＵＶ 노광 장치 및 반도체 장치의 제조방법 有权
标题翻译： EUV光源，EUV曝光设备和半导体器件制造方法
公开(公告)号：KR1020070023694A
公开(公告)日：2007-02-28
申请号：KR1020067023544
申请日：2005-06-22
申请人： 가부시키가이샤 니콘
发明人： 무라카미가츠히코
IPC分类号： H01L21/027
CPC分类号： G03F7/70033 , B82Y10/00 , G21K2201/064 , H05G2/003 , H05G2/005 , H05G2/008 , G03F7/70008
摘要： A liquid in which fine solid Sn particles are dispersed in a resin is accommodated inside the heated tank 4. The resin pressurized by a pressurizing pump is conducted to a nozzle 1, so that a liquid-form resin is caused to jet from the tip end of the nozzle 1 that is disposed inside a vacuum chamber 7. The liquid-form resin which is caused to jet from the nozzle 1 assumes a spherical shape as a result of surface tension, and is solidified by being cooled in a vacuum, so that a solid-form target 2 is formed. A laser introduction window 10 used for the introduction of laser light is formed in the vacuum chamber 7, and laser light generated from a laser light source 8 disposed on the outside of the vacuum chamber 7 is focused by a lens 9 and conducted into the vacuum chamber 7, so that the target is converted into a plasma, thus generating EUV light.

87. 发明公开

KR1020060119962A 극자외 방사선 또는 연질 Ｘ 방사선을 생성하기 위한 장치및 방법 有权
标题翻译：用于生产超极紫外线辐射或软X射线辐射的方法和装置
公开(公告)号：KR1020060119962A
公开(公告)日：2006-11-24
申请号：KR1020067004980
申请日：2004-09-01
申请人： 코닌클리케 필립스 엔.브이. , 프라운호퍼 게젤샤프트 쭈르 푀르데룽 데어 안겐반텐 포르슝 에. 베.
发明人： 존커스,제론 , 바우드레반지,도미니크마셀 , 네프,윌리
IPC分类号： H05G2/00 , H05H1/00
CPC分类号： H05G2/003 , H05G2/005
摘要： A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced.The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).
摘要翻译：一种通过电操作的放电产生极紫外辐射（EUV）或软X射线辐射的方法，特别是用于EUV光刻或计量的方法，其中等离子体（22）在气体介质中点燃至少两个放电空间（12）中的电极（14,16），所述等离子体发射要产生的辐射。气体介质由金属熔体（24）产生，金属熔体（24）被施加到所述放电空间），并且至少部分地被能量束蒸发，特别是通过激光束（20）。

88. 发明授权

KR100588113B1 리소그래피 투영장치용 방사원 有权
标题翻译：用于光刻投影装置的辐射源
公开(公告)号：KR100588113B1
公开(公告)日：2006-06-09
申请号：KR1020000076691
申请日：2000-12-14
申请人： 에이에스엠엘 네델란즈 비.브이.
发明人： 피에도로비츠헨리크 , 비케르크프레데리크 , 데브륀코르넬리스코르넬리아 , 바르트니크안드르제 , 코쉘레프콘스탄틴니콜라에비치 , 바니네파딤예프겐예비치
IPC分类号： H01L21/027
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.

89. 发明公开

KR1020000062868A 블라스트 실드를 갖춘 플라즈마 포커싱된 고 에너지 포톤소스 失效
公开(公告)号：KR1020000062868A
公开(公告)日：2000-10-25
申请号：KR1020000012732
申请日：2000-03-14
申请人： 사이머 엘엘씨
发明人： 파틀로윌리엄엔. , 포멘코프이고르브이. , 벅스다니엘엘.
IPC分类号： H01L21/263
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： 고에너지포톤소스가개시되었다. 한쌍의플라즈마핀치전극이진공챔버에위치된다. 이챔버는소망하는스펙트럼라인을제공하기위해선택된활성가스및 노블버퍼가스를포함하는작용가스를함유한다. 펄스파워소스는활성가스의스펙트럼라인에서방사선을제공하는작용가스에서초고온, 고밀도플라즈마핀치를발생시키기위해전그사이에서전기방전을일으키기에충분한전압으로전기펄스를공급한다. 고밀도핀치의위치바로위에위치된블라스트실드는그 축방향연장을제한하는핀치를한정하는물리적장벽을제공한다. 바람직한실시예에서, 플라즈마와대면하는실드의표면은돔 형상이다. 바람직한실시예에서, 외부반사방사선콜렉터-디렉터는플라즈마핀치에서발생된방사선을수집하여소망하는방향으로지향시킨다. 또한바람직한실시예에서리튬증기이고버퍼가스는헬륨이고방사선-콜렉터는고 그레이징입사반사도를갖는물질로코팅되거나이 물질로만들어진다. 반사물질을위한양호한선택은몰리브데늄, 팔라디윰, 루데늄, 로듐, 금또는텅스텐이다.

90. 发明授权

KR101885748B1 광원 초점의 정렬 有权
公开(公告)号：KR101885748B1
公开(公告)日：2018-09-10
申请号：KR1020137001480
申请日：2011-07-14
申请人： 에이에스엠엘 네델란즈 비.브이.
发明人： 그라함매튜알. , 파틀로윌리엄엔. , 창스티븐 , 벅스테트로버트에이.
IPC分类号： H01S3/10
CPC分类号： H05G2/008 , G01B11/0608 , G01B11/26 , H05G2/003 , H05G2/005
摘要： 극자외선광시스템은극자외선광 챔버내의타겟위치근방의초점면으로전파방향을따라이동하는증폭된광선을조종하고초점조절하는조향, 챔버내의타겟재료의적어도일부로부터반사된레이저빔의이미지를검출하도록위치된적어도하나의검출기, 상기반사된레이저빔의경로에있고상기타겟위치와검출시스템사이에있는파면수정시스템및 컨트롤러를포함한다. 파장수정시스템은전파방향을따른타겟초점면위치의함수로서, 반사된레이저빔의파면을수정하도록구성되어있다. 컨트롤러는상기반사된레이저빔의검출된이미지에기초하여타겟재료에상대적인증폭된광선의초점면의영역을조정하기위한로직을포함하고있다.

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