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    • 90. 发明公开
    • 반도체 장치 및 그 제조 방법
    • 半导体器件及其制造方法
    • KR1020030051276A
    • 2003-06-25
    • KR1020020078770
    • 2002-12-11
    • 가부시끼가이샤 도시바
    • 나까오미쯔히로
    • H01L21/60
    • H01L24/81H01L21/563H01L23/3128H01L25/105H01L2224/13144H01L2224/45144H01L2224/73203H01L2224/81193H01L2224/81801H01L2225/1023H01L2225/107H01L2924/01005H01L2924/01006H01L2924/01029H01L2924/01033H01L2924/01047H01L2924/0105H01L2924/01078H01L2924/01079H01L2924/01082H01L2924/01322H01L2924/15311H01L2924/3511H01L2924/00
    • PURPOSE: To increase the quality of a semiconductor device and make the device compact by suppressing electrical connection failure and the decline in an yield along with the narrowing of pitches. CONSTITUTION: A chip 1 and a substrate 3 are disposed in such a manner that a gold-made stud bump 2 formed on one principal plane of the semiconductor chip 1 and a copper-made inner lead 4 formed on one principal plane of the chip mount substrate 3 are opposite to each other. The lead 4 is formed in such a shape that its width is the same as or smaller than that of the bump 2, and is formed with a tin plating thin film 5 on the surface by an electroless plating method. Between the chip 1 and the substrate 3, a sealing resin 6 is disposed which is hardened at a temperature between about 160°C and 200°C to show an adhesive power. The chip 1, the substrate 3, and the resin 6 are thermocompression-bonded at about 180°C until an end part 2a of the bump 2 becomes abutted against the lead 4 and the width of the bump 2 becomes nearly the same as that of an edge part of the end of the lead 4 to conduct a connection between the bump 2 and the lead 4 via a thin film 5 and sealing of a space between the chip 1 and the substrate 3 in a batch process.
    • 目的:为了提高半导体器件的质量,通过抑制电连接故障和产量下降以及间距变窄,使设备紧凑。 构成:芯片1和基板3以这样的方式设置,使得形成在半导体芯片1的一个主平面上的金制凸块2和形成在芯片安装件的一个主平面上的铜制内部引线4 基板3彼此相对。 引线4形成为与凸块2的宽度相同或更小的形状,并且通过化学镀方法在表面上形成镀锡薄膜5。 在芯片1和基板3之间,设置密封树脂6,其在约160℃和200℃之间的温度下硬化以显示粘合力。 芯片1,基板3和树脂6在约180℃下进行热压接,直到凸块2的端部2a与引线4相接触,凸块2的宽度几乎与 引线4的端部的边缘部分,以通过薄膜5来引导凸块2和引线4之间的连接,并且在间歇工艺中密封芯片1和基板3之间的空间。