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    • 77. 发明公开
    • 적외선 방사 손실 차단용 저방사 코팅막 제조
    • 用于防止红外辐射损失的低辐射涂层及其制造方法
    • KR1020090099759A
    • 2009-09-23
    • KR1020080024932
    • 2008-03-18
    • 한국세라믹기술원아프로시스템 주식회사
    • 임형미이승호유중환김대성윤준호강병수강동필
    • B32B15/04B32B15/01B32B15/18B32B15/20
    • B32B15/01B32B15/04B32B15/18B32B15/20B32B2307/202
    • PURPOSE: A method for manufacturing a low-emissivity coating film for preventing the loss of infrared radiation is provided to show excellent durability and low emissivity, which results from an oxide layer coated on the coating film. CONSTITUTION: A method for manufacturing a low-emissivity coating film for preventing the loss of infrared radiation comprises a step of coating a first metal oxide layer on a metal substrate. The first metal oxide layer is composed of metal oxides. The low-emissivity coating film shows low emissivity and high heat resistance. The metal substrate comprises one kind of metal or an alloy consisting of one or more kinds of metals, which show no deformation even at 300°C or higher. The first metal oxide layer and second metal oxide layer contain one or more materials selected from the group consisting of ATO, ZnO, ITO, SnO2 and MgO.
    • 目的:提供一种制造用于防止红外辐射损失的低辐射涂膜的方法,以显示由涂覆在涂膜上的氧化物层产生的优异的耐久性和低发射率。 构成:用于制造用于防止红外辐射损失的低辐射涂膜的方法包括在金属基底上涂覆第一金属氧化物层的步骤。 第一金属氧化物层由金属氧化物构成。 低发射率涂膜显示出低发射率和高耐热性。 金属基材包括一种金属或由一种或多种金属组成的合金,即使在300℃以上也不显示变形。 第一金属氧化物层和第二金属氧化物层含有选自由ATO,ZnO,ITO,SnO 2和MgO组成的组中的一种或多种。