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    • 75. 发明授权
    • 자석부재의 가공장치 및 가공방법
    • 处理装置和磁铁部件的加工方法
    • KR100547753B1
    • 2006-02-01
    • KR1019997011358
    • 1999-04-02
    • 가부시키가이샤 네오맥스
    • 곤도사다히코
    • B24B7/17
    • B24B41/005B24B7/17B24B7/22
    • 연마될 자석부재를 한 방향으로 안내하기 위한 반송로와; 상기 자석부재를 상기 반송로로 연속적으로 보내기 위하여 반송방향으로 다수개의 자석부재를 밀기 위한 반송수단과; 상기 반송된 자석부재의 대향면을 연마하기 위하여 상기 반송로를 사이에 두도록 배치된 한쌍의 연마수단 및; 상기 반송방향의 반대방향으로 상기 자석부재를 밀어내기 위하여 상기 연마수단의 하류쪽에 배치된 밀어내기 수단을 포함하여 구성되는 자석부재의 가공장치.
      이러한 구성으로, 우수한 생산성으로 자석부재를 소정의 형상으로 가공하는 것이 가능하다.
    • 传送路径,用于引导所述磁体构件在一个方向上被抛光; 传送装置,用于沿传送方向推动多个磁性构件,以连续地将磁性构件传送到传送路径; 一对抛光装置,其设置成夹住输送路径以抛光所输送的磁体构件的相对表面; 设置在研磨装置下游的推动装置用于沿与输送方向相反的方向推动磁体构件。
    • 78. 发明授权
    • 열전 변환 재료
    • 열전변환재료
    • KR100398939B1
    • 2003-10-10
    • KR1020007004420
    • 1998-08-05
    • 가부시키가이샤 네오맥스
    • 야마시타오사무사다토미노부히로사이고추네카주
    • H01L35/14
    • H01L35/22H01L23/49872H01L23/49883H01L23/53271H01L23/5328H01L35/16H01L2924/0002H01L2924/00
    • A novel silicon-base thermoelectric transducing material containing a P- or N-type semiconductor obtained by adding various impurities to Si, which is produced with good productivity at low cost and has a stable quality and a high performance index. Generally when various elements are added to Si, the Seebeck coefficient of the material decreases with the carrier concentration until the carrier concentration exceeds 10 M/m , and a minimum value of the Seebeck coefficient is in a range from 10 to 10 M/m . The material of the invention is a P- or N-type semiconductor having a carrier concentration of 10 to 10 M/m and containing Si and 0.001 to 0.5 atomic % of one or more elements of Be, Mg, Ca, Sr, Ba Zn, Cd, Hg, B, Al, Ga, In, and Tl, or one or more elements of N, P, As, Sb, Bi, O, S, Se, and Te, and another material is a P- or N-type semiconductor having a carrier concentration of 10 to 10 M/m and containing Si and 0.5 to 10 atomic % of one or more of the elements.
    • 一种新型的硅基热电转换材料,其含有通过向硅中添加各种杂质而获得的P-或N-型半导体,其以低成本以良好生产率生产且具有稳定的品质和高性能指数。 通常当将各种元素加入到Si中时,材料的塞贝克系数随着载流子浓度而降低,直到载流子浓度超过10 18。 M / m 3,并且塞贝克系数的最小值在10 18至100的范围内。 至10 19。 M / M< 3。 本发明的材料是载流子浓度为10 17的P-或N-型半导体。 至10 20。 M / M&LT 3的密度; 并含有Si和0.001〜0.5原子%的Be,Mg,Ca,Sr,Ba,Zn,Cd,Hg,B,Al,Ga,In和Tl中的一种或多种元素或N,P ,As,Sb,Bi,O,S,Se和Te,并且另一种材料是载流子浓度为10 19的P-或N-型半导体。 至10 21。 M / M&LT 3的密度; 并含有Si和0.5-10原子%的一种或多种元素。 <图像>
    • 80. 发明授权
    • 고내식성 R-Fe-B계 본드 자석의 제조 방법
    • 고내식성R-Fe-B계드자석의제조방법
    • KR100371786B1
    • 2003-02-12
    • KR1020007004639
    • 1998-10-19
    • 가부시키가이샤 네오맥스
    • 요시무라고시기쿠이후미아키니시우치다케시
    • H01F41/02
    • B24B31/14H01F41/026
    • A method of manufacturing R-Fe-B bonded magnets, capable of forming various corrosion resisting films on a R-Fe-B bonded magnet uniformly with a very high bonded strength so as to attain such a very high corrosion resistance thereof that prevents the bonded magnet from being rusted even in a long-period high-temperature high-humidity test; comprising barrel-polishing a porous R-Fe-B bonded magnet by a dry method using as media an abrasive stone formed by sintering inorganic powder of Al2O3, SiC, ZrO and MgO, or a mixture of an abrasive for metal balls and vegetable media, such as vegetable skin chips, sawdust, rind of a fruit and a core of corn, or a mixture of vegetable media the surfaces of which are modified by the above-mentioned abrasive and the above-mentioned inorganic pulverized bodies, so as to enable a surface of the magnet to be smoothed and sealed; or immersing a magnet material in a neutral or alkali bath so as to enable a layer of electroless plating to be formed thereon; or subjecting a magnet material to electrolytic plating so as to enable a film of markedly high bonded strength and dimensional accuracy to be formed thereon, whereby an object R-Fe-B bonded magnet of a high dimensional accuracy and a high corrosion resistance is obtained.
    • 一种制造R-Fe-B粘结磁体的方法,该方法能够在R-Fe-B粘结磁体上以非常高的粘结强度均匀地形成各种耐腐蚀膜,从而获得非常高的耐腐蚀性,从而防止粘结 即使在长时间的高温高湿试验中也不会生锈; 该方法包括使用通过烧结Al2O3,SiC,ZrO和MgO的无机粉末或者用于金属球和植物介质的磨料的混合物形成的磨石作为介质,通过干法对多孔R-Fe-B粘结磁体进行滚筒抛光, 例如蔬菜皮屑,木屑,水果皮和玉米芯,或其表面被上述磨料和上述无机粉碎体改性的植物培养基的混合物,以使得 平滑和密封磁体的表面; 或将磁性材料浸入中性或碱性浴中以便在其上形成无电镀层; 或者对磁体材料进行电解电镀,以便能够在其上形成具有明显高的结合强度和尺寸精度的膜,从而获得高尺寸精度和高耐腐蚀性的目标R-Fe-B粘结磁体。