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61. 发明公开

KR1020100029962A 광유체적 리소그래피 시스템 및 마이크로구조물 제조방법 有权
标题翻译：光学光刻系统，两层微流体通道的制造方法和三维微结构的制造方法
公开(公告)号：KR1020100029962A
公开(公告)日：2010-03-18
申请号：KR1020080088683
申请日：2008-09-09
申请人： 서울대학교산학협력단
发明人： 권성훈 , 이승아 , 박욱 , 정수은
IPC分类号： B81C1/00 , G03F7/20 , G02B27/00
CPC分类号： G03F7/70341 , B29C64/106 , B29L2031/756 , B33Y30/00 , B81C99/0095 , B81C2201/0159 , F15B7/08 , F15B15/10 , G03B27/54 , G03F7/20 , G03F7/70416
摘要： PURPOSE: An optofluidic lithography system, a manufacturing method of a two-layered microfluidic channel, and a manufacturing method of a three-dimensional microstructure are provided to control the height of a fluid channel by deforming a membrane. CONSTITUTION: An optofluidic lithography system comprises a membrane(15), a fluid channel(14), and a pneumatic chamber(12). The membrane is located between the pneumatic chamber and the fluid channel. The fluid channel has the height corresponding to the displacement of the membrane. The fluid channel accepts fluid. A microstructure is formed by hardening the fluid using light irradiated from the bottom of the fluid channel. The pneumatic chamber leads the displacement of the membrane.
摘要翻译：目的：提供光流体光刻系统，双层微流体通道的制造方法和三维微结构的制造方法，以通过使膜变形来控制流体通道的高度。构成：光流体光刻系统包括膜（15），流体通道（14）和气动室（12）。膜位于气动室和流体通道之间。流体通道的高度对应于膜的位移。流体通道接受流体。通过使用从流体通道的底部照射的光来硬化流体而形成微结构。气动室导致膜的位移。

62. 发明公开

KR1020090026082A 노광장치, 노광방법, 및 디바이스의 제조방법 无效
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：KR1020090026082A
公开(公告)日：2009-03-11
申请号：KR1020080087508
申请日：2008-09-05
申请人： 캐논 가부시끼가이샤
发明人： 타케나카츠토무
IPC分类号： H01L21/027
CPC分类号： G03B27/54 , G03F9/7026 , G03F9/7065 , G03F9/7088 , H01L21/682
摘要： An exposure apparatus, and a manufacturing method of a device and an exposure method are provided to prevent the measurement error from being generated by the chromatic aberration during TTL(Through-The-Lens) process. An exposure apparatus comprises an illumination optical system(IL) for illuminating the disk with the exposure light from the light source of exposure(LS1); a projection optical system(PO) projecting the pattern of disk on the top of the substrate; a measuring unit for measuring the relative position between the substrate and the disk through the projection optical system. An exposure apparatus exposes the substrate to the exposure light of the wavelength of plural wavelengths or the broadband. The measuring unit converts the wavelength of the exposure light into the wavelength of the specific or the narrow band.
摘要翻译：提供曝光装置，以及装置的制造方法和曝光方法，以防止TTL（透镜）处理期间的色差产生测量误差。曝光装置包括用于利用来自曝光光源（LS1）的曝光光来照亮盘的照明光学系统（IL）。投影光学系统（PO）将盘的图案投影在基板的顶部上; 测量单元，用于通过投影光学系统测量基板和盘之间的相对位置。曝光装置将衬底暴露于多个波长或宽带的波长的曝光光。测量单元将曝光光的波长转换成特定或窄带的波长。

63. 发明公开

KR1020080114598A 노광장치 및 디바이스 제조방법 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：KR1020080114598A
公开(公告)日：2008-12-31
申请号：KR1020080060555
申请日：2008-06-26
申请人： 캐논 가부시끼가이샤
发明人： 안도미와코
IPC分类号： H01L21/027
CPC分类号： G03B27/54 , G03F7/70091 , G03F9/7003 , G03F9/7069
摘要： An exposure apparatus and manufacturing method of device are provided to prevent excessive degradation of measuring accuracy by including a projection optical system. An exposure apparatus includes an illumination optical system(IL), a round stage(RS), a projection optical system(PO), a wafer stage(WS), an measuring system(M), and a controller(CNT). The illumination optical system changes a lighting condition. The round stage maintains the round. The wafer stage maintains the wafer. A pattern of the round stage is projected on a target substrate through the projection optical system by illuminating a corresponding round stage using the illumination optical system. The measuring system performs an exposure control measurement using a first mark arranged on the round stage and a second mark arranged on the wafer stage. The controller sets up an illumination condition different from a predetermined illumination condition.
摘要翻译：提供了一种曝光装置和装置的制造方法，以通过包括投影光学系统来防止测量精度的过度劣化。曝光装置包括照明光学系统（IL），圆台（RS），投影光学系统（PO），晶片台（WS），测量系统（M）和控制器（CNT）。照明光学系统改变照明条件。圆舞台保持轮回。晶片台保持晶片。通过使用照明光学系统照射相应的圆形台阶，圆台的图案通过投影光学系统投射在目标基板上。测量系统使用布置在圆台上的第一标记和布置在晶片台上的第二标记来执行曝光控制测量。控制器建立与预定照明条件不同的照明条件。

64. 发明公开

KR1020080094593A 노광장치 및 디바이스 제조방법 无效
标题翻译：曝光装置和装置制造方法
公开(公告)号：KR1020080094593A
公开(公告)日：2008-10-23
申请号：KR1020080035851
申请日：2008-04-18
申请人： 캐논 가부시끼가이샤
发明人： 아라이타다시 , 하세가와야스오
IPC分类号： H01L21/027
CPC分类号： G03B27/54 , G03F7/70941
摘要： An exposure apparatus and a device manufacturing method are provided to prevent deterioration or variation of imaging performance by varying an aperture shape of a diaphragm according to exposition conditions. An exposure apparatus includes a light system(120), a projection optical system(106), and a diaphragm(108). The light system lights a light area of a disc(111). The projection optical system projects a pattern of the disc on a substrate(109). The diaphragm blocks flare components among flare lights from the projection optical system toward the substrate and passes the rest components of the flare lights. A shape of an aperture of the diaphragm is different from that of the light area. The aperture shape of the diaphragm is varied based on a distance from the aperture in a second direction across a first direction in parallel with a scanning direction of the substrate.
摘要翻译：提供曝光装置和装置制造方法，以通过根据曝光条件改变隔膜的孔径形状来防止成像性能的劣化或变化。曝光装置包括光系统（120），投影光学系统（106）和光圈（108）。光系统点亮盘（111）的光区域。投影光学系统将盘的图案投影在基板（109）上。隔膜块将投影光学系统的耀斑光中的组分向基板照射，并通过火炬灯的其余部分。隔膜的孔径形状与光区域不同。隔膜的孔径形状基于与基板的扫描方向平行的第一方向的第二方向上的孔的距离而变化。

65. 发明公开

KR1020080070494A 광원 장치 无效
标题翻译：光源设备
公开(公告)号：KR1020080070494A
公开(公告)日：2008-07-30
申请号：KR1020070092904
申请日：2007-09-13
申请人： 하마마츠 포토닉스 가부시키가이샤
发明人： 마츠이료타로
IPC分类号： H01J61/52 , H01J61/84 , G03B27/54 , G03F7/20
CPC分类号： G03B27/54 , G03B21/16 , G03B21/20 , G03B21/2026 , G03F7/70016 , H01J61/52
摘要： A light source is provided to prevent a reflective surface from being blurred by spraying inertia gas on the reflective surface using a gas spray structure. A light source device includes a light source, a reflective mirror(4), and a gas spray structure(5). The reflective mirror reflects the light radiated from the light source on a reflective surface and emits the light from an exit opening. The gas spray structure includes a through-hole, where the light from the reflective mirror penetrates. The gas spray structure sprays gas on the reflective surface. The light source device includes a case(2), where the light source, the reflective mirror, and the gas spray structure are contained. The case circulates the air from outside. The gas spray structure includes a supply unit, a spray unit, and a distributing path.
摘要翻译：提供光源以通过使用气体喷射结构在反射表面上喷射惯性气体来防止反射表面模糊。光源装置包括光源，反射镜（4）和气体喷射结构（5）。反射镜将从光源辐射的光反射在反射表面上并从出口开口发射光。气体喷射结构包括通孔，其中来自反射镜的光穿透。气体喷射结构在反射面上喷射气体。光源装置包括壳体（2），其中包含光源，反射镜和气体喷射结构。这种情况从外面传播空气。气体喷射结构包括供给单元，喷射单元和分配路径。

66. 发明公开

KR1020080066876A 도광 부재 및 이를 이용한 선형 광원 장치 失效
标题翻译：光引导构件和线性光源装置使用相同
公开(公告)号：KR1020080066876A
公开(公告)日：2008-07-16
申请号：KR1020087013780
申请日：2006-12-25
申请人： 로무 가부시키가이샤
发明人： 사와다히데끼 , 이마무라노리히로 , 쇼오지모또아리
IPC分类号： F21S2/00 , F21V8/00 , G03B27/54
CPC分类号： G02B6/0038 , F21S43/235 , G02B6/0018 , G02B6/0068 , G03B27/54 , H04N1/02815 , H04N1/02835 , H04N1/0289 , H04N1/0311 , H04N1/0315 , H04N2201/03112 , H04N2201/03125 , H04N2201/03133 , H04N2201/03141 , H04N2201/03145 , H04N2201/0317
摘要： A light guiding member is formed of a material having translucency and extends along a direction (x). The light guiding member is provided with a light outputting surface (13) including a lens surface (31) having light focusing effects in a direction (y), and a light incoming surface (11) positioned at one end in the direction (x). On a portion of the light outputting surface (13) close to the light inputting surface (11), a transition area (13a) including the lens surface (31) and a cylindrical surface (32) is formed. In the transition area (13a), the closer the transition area becomes to the light inputting surface (11), the smaller the rate of the area occupied by the lens surface (31) in the direction (x) becomes.
摘要翻译：导光构件由具有半透明度的材料形成，并且沿着方向（x）延伸。导光构件设置有光输出表面（13），其包括在方向（y）上具有光聚焦效果的透镜表面（31）和位于方向（x）上的一端的光入射表面（11）。在光输入面（13）的靠近光输入面（11）的一部分上形成有包括透镜面（31）和圆筒面（32）的过渡区域（13a）。在过渡区域（13a）中，过渡区域越接近光输入表面（11）越靠近透镜表面（31）在方向（x）上占据的区域的速率越小。

67. 发明公开

KR1020080056094A 노광 장치 및 디바이스 제조 방법 无效
标题翻译：曝光装置和装置制造方法
公开(公告)号：KR1020080056094A
公开(公告)日：2008-06-20
申请号：KR1020070130568
申请日：2007-12-14
申请人： 캐논 가부시끼가이샤
发明人： 우에무라타카노리
IPC分类号： H01L21/027
CPC分类号： G03B27/54 , G03F7/70091 , G03F7/70333
摘要： An exposure apparatus and a method for manufacturing a device are provided to improve the quality of a pattern image even though a depth of focus is increased by exposing a substrate under a condition that a normal line of the substrate is tilted with respect to an optical axis. An illumination optical system(20) illuminates a reticle(30) arranged on a target illumination surface with light from a light source(10). A projection optical system(40) projects a pattern of the reticle onto a substrate. A stage(60) drives the substrate. The illumination optical system includes an optical distribution forming unit(200) for forming an intensity distribution of a trapezoid shape over the target illumination surface along a scanning direction of the reticle to illuminate each point on the target illumination surface. The stage tilts a normal line of the substrate with respect to an optical axis of the projection optical system to expose the substrate with the intensity distribution and an optical angle distribution formed by the optical distribution forming unit.
摘要翻译：提供一种曝光装置和装置的制造方法，以便即使在基板的法线相对于光轴倾斜的条件下曝光基板来增加图案图像的质量。照明光学系统（20）利用来自光源（10）的光照射布置在目标照明表面上的掩模版（30）。投影光学系统（40）将掩模版的图案投影到基板上。舞台（60）驱动衬底。照明光学系统包括：光分布形成单元，用于沿着标线板的扫描方向在目标照射面上形成梯形的强度分布，照射目标照明面上的各点。该阶段相对于投影光学系统的光轴倾斜基板的法线，以便以光分布形成单元形成的强度分布和光学角度分布露出基板。

68. 发明公开

KR1020050088138A 대형 필드 단위 확대 투사 광학 시스템 无效
标题翻译：大型场放大投影系统
公开(公告)号：KR1020050088138A
公开(公告)日：2005-09-01
申请号：KR1020057011854
申请日：2003-12-22
申请人： 울트라테크 인크.
发明人： 메르카도로메오아이
IPC分类号： G03B27/54
CPC分类号： G02B17/0852 , G02B17/008 , G02B17/0892 , G03B27/54 , G03F7/70225
摘要： An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over a broad spectral range. The optical system includes a positive lens group having three elements: a plano-convex element and two negative meniscus elements. The lens group is arranged adjacent to but spaced apart from a concave mirror along the mirror axis. A projection photolithography system that employs the optical system is also disclosed.
摘要翻译：公开了一种用于投影光刻的光学系统。光学系统是能够在宽光谱范围内成像大场的修改的戴森系统。光学系统包括具有三个元件的正透镜组：平凸元件和两个负弯月面元件。透镜组布置成与镜轴相邻但与凹面镜隔开。还公开了采用光学系统的投影光刻系统。

69. 发明公开

KR1020000062701A 노광 방법 및 그 장치 无效
标题翻译：曝光方法和设备
公开(公告)号：KR1020000062701A
公开(公告)日：2000-10-25
申请号：KR1020000010321
申请日：2000-03-02
申请人： 후지쯔 가부시끼가이샤
发明人： 마에다류지 , 우에무라미쓰구
IPC分类号： H01L21/027
CPC分类号： G03F7/70358 , G03B27/54
摘要： 본발명은필드의이음부분의치수차및 단차의발생을방지하고, 또한노광시간이길어지는일이없는노광방법및 그장치를제공하는것을목적으로한다. 처음의스캔으로노광되는필드의스캔종료위치와, 피노광기판을이동시켜다음의스캔으로노광되는필드의스캔개시위치를중첩하여이음부분을노광할때에, 처음의스캔의스캔종료위치에서의노광을불연속적으로행하고, 또한다음의스캔으로노광되는필드의스캔개시위치에서의노광을불연속으로하는불연속노광수단(15a)을가진다. 이때문에, 이음부분에서는처음의스캔의노광과다음의스캔의노광이평균화되고, 이음부분에서치수차및 단차가발생하는것을방지할수 있다.

70. 发明公开

KR20180031812A 리소그래피 장치 및 방법 审中-公开
标题翻译：光刻设备和方法
公开(公告)号：KR20180031812A
公开(公告)日：2018-03-28
申请号：KR20187007749
申请日：2011-03-17
申请人： ASML NETHERLANDS BV
发明人： YAKUNIN ANDREI , BANINE VADIM , LOOPSTRA ERIK , VAN DER SCHOOT HARMEN , STEVENS LUCAS , VAN KAMPEN MAARTEN
IPC分类号： G03F1/62 , C01B32/20 , G02B5/08 , G02B5/20 , G03F1/24 , G03F7/20 , H01L21/027
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： 리소그래피장치는방사선빔을생성하도록구성된방사선소스, 및패터닝디바이스를지지하도록구성된지지체를포함한다. 패터닝디바이스는패터닝된방사선빔을형성하기위해방사선빔에패턴을부여하도록구성된다. 방사선소스와패터닝디바이스사이에는챔버가위치된다. 챔버는방사선빔을반사시키도록구성된적어도 1 이상의광학구성요소를포함하고, 방사선소스로부터의방사선이이를통과하는것을허용하도록구성된다. 멤브레인(44)이멤브레인을통한방사선빔의통과를허용하고, 오염입자(54)들의통과를방지하도록구성된다. 챔버내부로부터챔버외부로우회경로를따라가스가흐르는것을허용하도록입자포획구조체(52)가구성된다. 우회경로는챔버내부로부터챔버외부로의오염입자(58)들의통과를실질적으로방지하도록구성된다.
摘要翻译：光刻设备包括被配置为产生辐射束的辐射源。该光刻设备还包括被配置为支撑图案形成装置的支撑件。图案形成装置被配置为将辐射束赋予图案以形成图案化的辐射束。该支撑件提供有包括石墨烯层的薄膜。

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