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    • 68. 发明公开
    • 흡진 및 흡습이 양호한 여과용형상태물
    • 过滤配置优良,具有超高性能和高性能
    • KR1020010025902A
    • 2001-04-06
    • KR1019990036958
    • 1999-09-01
    • 한국하이테크공업(주)
    • 이충진
    • B01D39/00
    • B01D39/2058B01D39/06B01D39/16B01D46/0001B01D46/0036B01D2239/0464B01D2239/10B01D2239/1275
    • PURPOSE: A filterable configuration excellent in exhaustion and hydroscopicity is provided, which is made by configuring the inside fine holes of activated carbon to have penetrated uneven faces, so that the contact area of the activated carbon is enlarged greatly. CONSTITUTION: The system comprises the following steps: (i) depositing foamed resin having penetrated superfine holes to the surface of glass-fiber of bulk, the resin being diffused with powdered activated carbon having fine holes in the shape of penetrated uneven faces; (ii) cutting the glass fiber of bulk into a proper configuration; (iii) making the glass fiber body into a cylinder form; and (iv) including the foamed resin in this glass fiber body.
    • 目的:通过将活性炭的内部细孔配置成具有贯通的凹凸面,从而能够大幅度地扩大活性炭的接触面积,从而能够提供排气性和吸水性优异的过滤性构造。 构成:该系统包括以下步骤:(i)将具有穿透的超细孔的发泡树脂沉积到本体玻璃纤维的表面,该树脂用具有穿透凹凸形状的细孔的粉状活性炭扩散; (ii)将本体的玻璃纤维切割成适当的构型; (iii)使玻璃纤维体成圆柱形; 和(iv)在该玻璃纤维体中包含发泡树脂。
    • 69. 发明公开
    • 화학필터의 제조 방법
    • 生产化学过滤器的方法
    • KR1020010008500A
    • 2001-02-05
    • KR1019990026376
    • 1999-07-01
    • 에스케이하이닉스 주식회사
    • 최재성정창영
    • B01D39/06
    • B01D39/2068B01D46/0001B01D2239/10G03F7/26G03F7/70933
    • PURPOSE: A process of preparing a chemical filter capable of increasing removing efficiency of amine impurities in air and using a filter permanently (in case of zeolite) only by a simple operation by using clay (or zeolite) capable of selectively absorbing materials having a specified size and basicity as air filtering materials in a chemical filter is provided, which reduces production cost by reuse of the filter and increases yield in a case an element is developed and produced using a DUV exposing equipment. CONSTITUTION: In a process of manufacturing a filter for removing amine impurities in air in a process for producing a photolithography using an exposing equipment of a semiconductor wafer, a chemical filter (106) is formed by filling the inner space of a filter with clay to absorb amine impurities in air flowing into an inlet of the filter and substituting strong acidic H+ for cationic inorganic material as a counter cation. In reusing a chemical filter prepared by use of zeolite, amine impurities filtered by the filter are removed by depressurizing to 10 -3 to 1 Torr in heating the chemical filter at 100 to 700deg.C or blowing nitrogen.
    • 目的:一种制备化学过滤器的方法,其能够通过使用能够选择性吸收具有规定的材料的粘土(或沸石),通过简单的操作,能够增加空气中胺杂质的去除效率和永久使用过滤器(在沸石的情况下) 提供了一种化学过滤器中的空气过滤材料的尺寸和碱度,其通过使用过滤器来降低生产成本,并且在使用DUV曝光设备开发和生产元件的情况下提高产量。 构成:在使用半导体晶片的曝光设备的用于制造光刻的工艺中制造用于除去空气中的胺杂质的过程中,通过用过滤器填充粘土的内部空间来形成化学过滤器(106) 吸收流入过滤器入口的空气中的胺杂质,并用强酸性H +代替阳离子无机材料作为抗衡阳离子。 在重新使用通过使用沸石制备的化学过滤器时,通过在100至700℃加热化学过滤器或吹入氮气下将通过过滤器过滤的胺杂质通过减压至10 -3至1乇来除去。