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    • 63. 发明授权
    • 신규의 헵타 코발트 아미노알콕사이드 화합물 및 그 제조방법
    • 新型羟丙基氨基氧化铝复合物及其制备方法
    • KR100816543B1
    • 2008-03-25
    • KR1020060100399
    • 2006-10-16
    • 한국화학연구원
    • 김창균이영국정택모안기석이선숙박민정
    • C07F15/06B82B1/00
    • C07F15/06B82B1/00C01G51/04C01G51/42C01P2004/64C22B23/00C22C19/07C22C38/10C23C16/18C23C16/40
    • A cobalt precursor material, which is existent in very stable black solid state and is used to prepare cobalt and a cobalt oxide nano-material and an alloy including the cobalt, is provided to prepare a cobalt and a cobalt oxide thin films through various deposition methods. A cobalt amino alkoxide compound is represented by the formula(1) of Co7[O-A-NR^1R^2]6(H2O)3(OH)6O6, wherein A is linear or branched C2-4 alkylene substituted or unsubstituted by halogen; and each R^1 and R^2 is independently linear or branched C1-4 alkyl substituted or unsubstituted by halogen. A method for preparing the cobalt amino alkoxide compound of the formula(1) comprises a step of reacting a cobalt compound represented by the formula(3) of [Co(NH3)5X]X2 with an amino alkoxide alkali metal salt compound represented by the formula(4) of MO-A-NR^1R^2, wherein X is Cl, Br or I; M is Li, Na, or K; and A, each R^1 and R^2 is independently linear or branched C1-4 alkyl substituted or unsubstituted by halogen. Further, the method additionally comprises a step of performing work-up in air.
    • 提供以非常稳定的黑色固态存在并用于制备钴和钴氧化物纳米材料的钴前体材料和包含钴的合金,以通过各种沉积方法制备钴和氧化钴薄膜 。 钴氨基烷氧基化合物由式(1)表示为Co7 [O-A-NR] 1R ^ 2] 6(H2O)3(OH)6O6,其中A为被卤素取代或未取代的直链或支链C 2-4亚烷基; 并且每个R 1和R 2独立地是被卤素取代或未取代的直链或支链C 1-4烷基。 制备式(1)的氨基钴酸钴化合物的方法包括使[Co(NH 3)5 X] X 2的式(3)表示的钴化合物与由 式(4)的MO-A-NR ^ 1R ^ 2,其中X为Cl,Br或I; M为Li,Na或K; 和A,每个R 1和R 2独立地是被卤素取代或未取代的直链或支链C 1-4烷基。 此外,该方法还包括在空气中进行后处理的步骤。
    • 64. 发明授权
    • 신규의 네오디뮴 화합물 및 그 제조 방법
    • 신규의네오디뮴화합물및그제조방법
    • KR100684993B1
    • 2007-02-22
    • KR1020060031579
    • 2006-04-06
    • 한국화학연구원
    • 이영국김창균정택모안기석이선숙박미현
    • C01G55/00
    • A neodymium complex represented by specific formula as precursor of neodymium oxide thin film is provided to show thermal stability and increased volatile property advantageous to form the thin film of neodymium oxide with high quality by reacting neodymium compound with alkali metal salt compound then substitution reacting the reactive product with alcohol compound. The neodymium oxide precursor is represented by a formula of Nd[O-A-N(R^3)-B-NR(^1)R(^2)]3 wherein A is C2 to C5 alkylene; B is C1-C4 alkylene; A and B are substituted by at least one of linear or branched alkyl group; and R^1, R^2 and R^3 are independently H or C1 to C5 linear or branched alkyl group. More particularly, the neodymium oxide precursor is represented by a formula of Nd[OCR(^4)R(^5)(CH2)mN(R(^3))-(CH2)nNR(^1)R(^2)]3 wherein R^1,R^2,R^3,R^4 and R^5 are independently H or C1 to C5 linear or branched alkyl group, and m and n are integer of 1 to 4. The neodymium oxide precursor is grown into neodymium oxide by MOCVD or ALD.
    • 提供由具体化学式表示的钕络合物作为氧化钕薄膜的前体,以显示热稳定性和增加的挥发性,其有利于通过使钕化合物与碱金属盐化合物反应形成高质量的氧化钕薄膜, 产品与酒精化合物。 氧化钕前体由式[Nd-O-A-N(R 3)-B-NR(R 1)R(R 2)] 3表示,其中A是C 2至C 5亚烷基; B是C1-C4亚烷基; A和B被至少一个直链或支链烷基取代; 并且R 1,R 2和R 3独立地为H或C 1至C 5直链或支链烷基。 更具体地说,氧化钕前体由式[Nd(O)(CH 2)m N(R(R 3)) - (CH 2)n NR(R 1)R(R 2) ] 3其中R 1,R 2,R 3,R 4和R 5独立地为H或C 1至C 5直链或支链烷基,并且m和n为1至4的整数。氧化钕前体 通过MOCVD或ALD生长成氧化钕。