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61. 发明公开

KR1020130010850A 레지스트 조성물 및 레지스트 패턴의 제조 방법 审中-实审
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：KR1020130010850A
公开(公告)日：2013-01-29
申请号：KR1020120078186
申请日：2012-07-18
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 이찌까와,고지 , 안류,유까꼬 , 후지따,신고
IPC分类号： G03F7/004 , G03F7/038 , G03F7/26 , G03F7/20
CPC分类号： G03F7/0045 , C07C303/32 , C07C309/06 , C07C309/12 , C07D333/46 , C07D335/02 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/38 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/123 , G03F7/0382
摘要： PURPOSE: A resist composition and a manufacturing method of a resist pattern are provided to have excellent critical dimensional uniformity without defects. CONSTITUTION: A resist composition comprises a resin which has a structure unit indicated in chemical formula 1 and comprises an insoluble or poorly soluble into an alkali water solution but can be soluble into the alkali water solution by acid, and comprises a resin which does not comprises a resin indicated in chemical formula 1, and an acid-generator which is indicated in chemical formula 2. In chemical formula 1, R1 is hydrogen or a methyl group, A1 is a C1-C6 alkanediyl group, and R2 is a C1-C10 hydrocarbon group which has a fluorine atom. In chemical formula 2, each of RII1 and RII2 is a fluorine atom or a C1-C6 perfluoroalkyl, and LII1 is a C1-C6 alkanediyl, C4-C8 divalent alicyclic hydro carbon group, -(CH2)t-CO-O-* or -(CH2)t-CO-O-CH2-(CH2)u-*.
摘要翻译：目的：提供抗蚀剂组合物和抗蚀剂图案的制造方法以具有优异的临界尺寸均匀性而没有缺陷。构成：抗蚀剂组合物包含具有化学式1所示结构单元的树脂，其包含不溶于或难溶于碱水溶液但可通过酸溶于碱水溶液中的树脂，并且包含不包含化学式1表示的树脂和化学式2表示的酸发生剂。在化学式1中，R1为氢或甲基，A1为C1-C6烷二基，R2为C1-C10 具有氟原子的烃基。在化学式2中，RII1和RII2各自为氟原子或C1-C6全氟烷基，LII1为C1-C6烷二基，C4-C8二价脂环族碳氢基， - （CH2）t-CO-O- * 或 - （CH 2）t -CO-O-CH 2 - （CH 2）u - 。

62. 发明公开

KR1020130010849A 레지스트 조성물 및 레지스트 패턴의 제조 방법 审中-实审
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：KR1020130010849A
公开(公告)日：2013-01-29
申请号：KR1020120078185
申请日：2012-07-18
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 이찌까와,고지 , 가마부찌,아끼라
IPC分类号： G03F7/004 , G03F7/038 , G03F7/26 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/004 , G03F7/0045 , G03F7/0382 , G03F7/2002 , G03F7/26
摘要： PURPOSE: A resist pattern and a manufacturing method of the resist pattern are provided to have sufficiently wide focus margin and to prevent defects. CONSTITUTION: A resist pattern comprises a resin with a structure unit indicated in chemical formula 1, a resin structure unit indicated in chemical formula 2, and an acid generator. In chemical formula 1, R1 is a hydrogen atom or methyl group, A1 is a C1-C6 alkanediyl group, A13 is a C1-C18 divalent aliphatic hydrocarbon group which can has one or more halogen atom, X12 is *-CO-O- or *-O-CO-, * is a bond with A13, and A14 is a C1-C17 aliphatic hydrocarbon group which can have one or more halogen atoms. In chemical formula 2, R3 is C1-C6 alkyl group which can have a hydrogen atom, halogen atom or one or more halogen atoms.
摘要翻译：目的：提供抗蚀剂图案和抗蚀剂图案的制造方法以具有足够宽的聚焦余量并防止缺陷。构成：抗蚀剂图案包括具有化学式1所示结构单元的树脂，化学式2表示的树脂结构单元和酸产生剂。在化学式1中，R 1是氢原子或甲基，A 1是C 1 -C 6烷二基，A 13是可以具有一个或多个卤素原子的C 1 -C 18二价脂族烃基，X 12是* -CO-O- 或* -O-CO-，*是与A13的键，A14是可具有一个或多个卤素原子的C 1 -C 17脂族烃基。在化学式2中，R 3是可以具有氢原子，卤素原子或一个或多个卤素原子的C 1 -C 6烷基。

63. 发明公开

KR1020120102527A 염, 레지스트 조성물 및 레지스트 패턴의 제조 방법 审中-实审
标题翻译：盐，抗性组合物和生产耐药图案的方法
公开(公告)号：KR1020120102527A
公开(公告)日：2012-09-18
申请号：KR1020120023156
申请日：2012-03-07
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 야마구찌,사또시 , 이찌까와,고지
IPC分类号： C07D335/12 , C07D335/10 , H01L21/312
CPC分类号： C07D327/08 , C07C309/04 , C07C309/06 , C07C309/13 , G03F7/0045 , G03F7/0046 , G03F7/029 , G03F7/0397 , G03F7/2041 , Y10S430/121 , Y10S430/123
摘要： PURPOSE: A resist composition containing acid generator with salt and resin is provided to prepare a resist pattern with excellent margin of focus(DOF). CONSTITUTION: A salt is denoted by chemical formula I. An acid generator contains the salt of chemical formula I. A resist composition contains the acid generator and resin. The resin is non-soluble and insoluble in an alkali solution and is dissolved in alkaline solution. The resist composition further contains a base compound and solvent. A method for preparing the resist pattern comprises: a step of applying a substrate with a resist composition; a step of drying the composition and forming a composition layer; a step of exposing the composition layer; a step of heating and developing the composition layer.
摘要翻译：目的：提供含有盐和树脂的酸产生剂的抗蚀剂组合物以制备具有优异的焦距（DOF）的抗蚀剂图案。构成：盐由化学式I表示。酸产生剂含有化学式I的盐。抗蚀剂组合物含有酸发生剂和树脂。树脂不溶于碱溶液，溶于碱性溶液。抗蚀剂组合物还含有碱性化合物和溶剂。制备抗蚀剂图案的方法包括：用抗蚀剂组合物涂覆基材的步骤; 干燥组合物并形成组合物层的步骤; 暴露组合物层的步骤; 加热和显影组合物层的步骤。

64. 发明公开

KR1020120098480A 레지스트 조성물 및 레지스트 패턴의 제조 방법 审中-实审
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：KR1020120098480A
公开(公告)日：2012-09-05
申请号：KR1020120018904
申请日：2012-02-24
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 이찌까와,고지 , 야스에,다까히로
IPC分类号： G03F7/038 , G03F7/26
CPC分类号： G03F7/38 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , Y10S430/108 , Y10S430/111
摘要： PURPOSE: A resist composition and a method for manufacturing resist patterns using the same are provided to reduce the defects of the resist patterns and to improve the line edge roughness of the resist patterns. CONSTITUTION: A resist composition includes a resin with a structural unit represented by chemical formula I, a resin which is insoluble or hardly soluble in an alkali aqueous solution by the action of acid; an acid generator, and a compound represented by chemical formula II. In chemical formula I, R1 is a hydrogen atom or a methyl group; A1 is a C1-6 alkandiyl group; and R2 is a C1-10 hydrocarbon group with a fluorine atom. In chemical formula II, R3 and R4 are respectively C1-12 hydrocarbon groups, C1-6 alkoxy groups, C2-7 acyl groups, C2-7 acyloxy groups, C2-7 alkoxycarbonyl groups, nitro groups, or halogen atoms; m' and n' are respectively the integer of 0 to 4; if m' is 2 or more, a plurality of R3s are identical or different; and If n'2 is 2 or more, a plurality of R4s are identical or different.
摘要翻译：目的：提供抗蚀剂组合物和使用其制造抗蚀剂图案的方法，以减少抗蚀剂图案的缺陷并改善抗蚀剂图案的线边缘粗糙度。构成：抗蚀剂组合物包括具有由化学式I表示的结构单元的树脂，其是通过酸作用而不溶于或难溶于碱性水溶液的树脂; 酸产生剂和由化学式II表示的化合物。在化学式I中，R 1是氢原子或甲基; A1是C1-6烷撑基; R2是具有氟原子的C1-10烃基。在化学式II中，R3和R4分别为C1-12烃基，C1-6烷氧基，C2-7酰基，C2-7酰氧基，C2-7烷氧基羰基，硝基或卤素原子; m'和n'分别为0〜4的整数; 如果m'为2以上，则多个R3相同或不同; 如果n'2为2以上，则多个R4相同或不同。

65. 发明公开

KR1020120098478A 레지스트 조성물 및 레지스트 패턴의 제조 방법 审中-实审
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：KR1020120098478A
公开(公告)日：2012-09-05
申请号：KR1020120018900
申请日：2012-02-24
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 이찌까와,고지 , 가마부찌,아끼라
IPC分类号： G03F7/038 , G03F7/26
CPC分类号： G03F7/0045 , C07D498/04 , G03F7/0035 , G03F7/0046 , G03F7/027 , G03F7/0392 , G03F7/0397 , G03F7/38
摘要： PURPOSE: A resist composition and a method for manufacturing resist patterns using the same are provided to reduce the defects of the resist patterns and to improve the focus margin of the resist patterns. CONSTITUTION: A resist composition includes a resist with a structural unit represented by chemical formula I, a resin with a structural unit represented by chemical formula II, and an acid generator. The resin with the structural unit represented by chemical formula II is insoluble or hardly soluble with respect to an alkali aqueous solution and is capable of being dissolved in the alkali aqueous solution by the action of acid. In chemical formula I, R1 is a hydrogen atom or a methyl group; A1 is -(CH_2)m1-, -(CH_2)m2-O-(CH_2)m3-, or -(CH_2)m4-CO-O-(CH_2)m5-, and m1 to m5 are respectively the integer of 1 to 6; and R2 is a C1-C10 hydrocarbon group with a fluorine atom. In chemical formula II, R3 is a hydrogen atom, a halogen atom, or a C1-6 alkyl group with/without a halogen atom; and X1 is a C2-36 heterocyclic group, and hydrogen atoms in the heterocyclic group is substitutable with halogen atoms, hydroxyl groups, C1-24 hydrocarbon groups, C1-12 alkoxy groups, C2-4 acyl groups, or C2-5 acyoxy groups.
摘要翻译：目的：提供抗蚀剂组合物和使用其制造抗蚀剂图案的方法，以减少抗蚀剂图案的缺陷并提高抗蚀剂图案的聚焦余量。构成：抗蚀剂组合物包括具有由化学式I表示的结构单元的抗蚀剂，由化学式II表示的结构单元的树脂和酸产生剂。具有由化学式II表示的结构单元的树脂相对于碱性水溶液是不溶或难溶的，并且能够通过酸的作用溶解在碱性水溶液中。在化学式I中，R 1是氢原子或甲基; A1是 - （CH_2）m1-， - （CH_2）m2-O-（CH_2）m3-或 - （CH_2）m4-CO-O-（CH_2）m5-，m1至m5分别为1 至6; R2是具有氟原子的C1-C10烃基。在化学式II中，R3是氢原子，卤素原子或具有/不具有卤素原子的C1-6烷基; 并且X1是C2-36杂环基，杂环基中的氢原子可以与卤素原子，羟基，C1-24烃基，C1-12烷氧基，C2-4酰基或C2-5酰氧基取代。

66. 发明公开

KR1020120043644A 레지스트 조성물 및 레지스트 패턴의 제조 방법 审中-实审
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：KR1020120043644A
公开(公告)日：2012-05-04
申请号：KR1020110109072
申请日：2011-10-25
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 마스야마,다쯔로 , 야마모또,사또시 , 이찌까와,고지
IPC分类号： G03F7/004 , G03F7/038 , G03F7/00
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/00 , G03F7/004 , G03F7/038 , G03F7/0382
摘要： PURPOSE: A resist composition and a method for manufacturing resist patterns using the same are provided to improve the critical dimension uniformity of the resist patterns by including resin with specific structural units. CONSTITUTION: A resist composition includes a structural unit represented by chemical formula aa, a resin represented by chemical formula ab, and an acid generator. In chemical formula aa, Raa1 is a hydrogen element or a methyl group; Aaa1 is a substitutable C1 to C6 alkandiyl group or a group represented by chemical formula a-1; and Raa2 is a substitutable C1 to C18 aliphatic hydrocarbon group, and one or more CH_2 moieties are capable of being substituted with O moieties or CO moieties. In chemical formula a-1, s is 0 or 1; X10 and X11 are respectively oxygen elements, carbonyl groups, carbonyl oxy groups, or oxycarbonyl groups; A10, A11, and A12 are respectively substitutable C1 to C5 aliphatic hydrocarbon groups; and * represents the bond to carbon elements.
摘要翻译：目的：提供抗蚀剂组合物和使用其制造抗蚀剂图案的方法，以通过包括具有特定结构单元的树脂来改善抗蚀剂图案的临界尺寸均匀性。构成：抗蚀剂组合物包括由化学式aa表示的结构单元，由化学式ab表示的树脂和酸产生剂。在化学式aa中，Raa1是氢元素或甲基; Aaa1是可取代的C1至C6亚烷基或由化学式a-1表示的基团; 并且Raa2是可取代的C 1至C 18脂族烃基，并且一个或多个CH 2部分能够被O部分或CO部分取代。在化学式a-1中，s为0或1; X10和X11分别是氧元素，羰基，羰基氧基或氧羰基; A10，A11和A12分别是可取代的C1至C5脂族烃基; 和*表示与碳元素的键。

67. 发明公开

KR1020120001646A 염, 산 발생제 및 레지스트 조성물 无效
标题翻译：盐，酸发生器和耐腐蚀组合物
公开(公告)号：KR1020120001646A
公开(公告)日：2012-01-04
申请号：KR1020110062723
申请日：2011-06-28
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 히라오까,다까시 , 사까모또,히로무 , 이찌까와,고지
IPC分类号： C07D211/46 , C07D211/44 , G03F7/004 , G03F7/00
CPC分类号： G03F7/0045 , C07D207/12 , C07D211/46 , C07D233/60 , C07D307/77 , C07D327/08 , G03F7/0046 , G03F7/0397 , C07D211/44 , G03F7/00 , G03F7/0047
摘要： PURPOSE: An acid generating agent and a resist composition are provided to widen focus margin of a pattern. CONSTITUTION: An acid generating agent contains salt of chemical formula I. A resist composition contains the acid generating agent and resin. The resin has acid instability and insolubility in an alkaline solution. The resist composition further contains basic compounds. A method for manufacturing the resist pattern comprises: a step of applying the resist composition on a substrate; a step of drying the composition after application to form a composition layer; a step of exposing the composition layer; a step of heating the composition layer; and a step of developing the composition using a developing device.
摘要翻译：目的：提供酸产生剂和抗蚀剂组合物以扩大图案的聚焦边缘。构成：酸产生剂含有化学式I的盐。抗蚀剂组合物含有酸产生剂和树脂。该树脂在碱性溶液中具有酸不稳定性和不溶性。抗蚀剂组合物还含有碱性化合物。抗蚀剂图案的制造方法包括：将抗蚀剂组合物涂布在基板上的工序; 施用后干燥组合物以形成组合物层的步骤; 暴露组合物层的步骤; 加热组合物层的步骤; 以及使用显影装置显影组合物的步骤。

68. 发明公开

KR1020110023839A 수지, 레지스트 조성물 및 레지스트 패턴의 제조 방법 有权
标题翻译：树脂，耐蚀组合物和生产耐火图案的方法
公开(公告)号：KR1020110023839A
公开(公告)日：2011-03-08
申请号：KR1020100084571
申请日：2010-08-31
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 이찌까와,고지 , 가마부찌,아끼라 , 무까이,유이찌
IPC分类号： C08F20/52 , C08F22/40 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F220/60 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/20 , G03F7/2041 , C08F20/52 , C08F22/40 , G03F7/0047 , H01L21/027
摘要： PURPOSE: A resin and a resist composition is provided to form patterns with excellent pattern form and wide focus margin(DOF). CONSTITUTION: A resin comprises a structural unit derived from a compound represented by the formula (I), wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; and X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more -CH2- contained in the heterocyclic group may be replaced by -CO- or -O-.
摘要翻译：目的：提供树脂和抗蚀剂组合物以形成具有优异图案形式和宽焦距（DOF）的图案。构成：树脂包含衍生自由式（I）表示的化合物的结构单元，其中R 1表示氢原子，卤素原子或任选具有一个或多个卤素原子的C 1至C 6烷基; X1表示C2〜C36杂环基，杂环基中含有的一个以上氢原子可以被卤素原子，羟基，C1〜C24烃基，C1〜C12烷氧基，C2〜C4 酰基或C2〜C4酰氧基，杂环基中所含的一个或多个-CH 2可以被-CO-或-O-代替。

69. 发明公开

KR1020070056962A 착색 감광성 수지 조성물 无效
标题翻译：着色感光树脂组合物
公开(公告)号：KR1020070056962A
公开(公告)日：2007-06-04
申请号：KR1020060116745
申请日：2006-11-24
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 이찌까와,고지 , 아끼야마,유지
IPC分类号： G03F7/004 , G03F7/028
CPC分类号： G03F7/0007 , G02B5/223 , G03F7/028
摘要： Provided is a colored photosensitive resin composition, which leaves little residue after development in developing a pattern for forming a color filter for image sensors or various display devices. The colored photosensitive resin composition comprises: (A) a colorant; (B) a binder resin; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, wherein the photopolymerizable compound comprises 2,2,2-tris(acryloyloxy)methylethyl phthalate. In the photopolymerizable compound, 2,2,2-tris(acryloyloxy)methylethyl phthalate is used in an amount of at least 10 wt%, and preferably of at least 30 wt%.
摘要翻译：提供一种着色感光性树脂组合物，其在显影用于形成图像传感器或各种显示装置的滤色器的图案的显影后留下少量残留物。着色感光性树脂组合物包含：（A）着色剂; （B）粘合剂树脂; （C）可光聚合化合物; （D）光聚合引发剂; 和（E）溶剂，其中所述光聚合化合物包含邻苯二甲酸2,2,2-三（丙烯酰氧基）甲基乙酯。在光聚合性化合物中，使用0.2重量％以上，优选30重量％以上的2,2,2-三（丙烯酰氧基）甲基乙基邻苯二甲酸酯。

70. 发明授权

KR101995072B1 레지스트 조성물 및 레지스트 패턴의 제조 방법 有权
公开(公告)号：KR101995072B1
公开(公告)日：2019-07-02
申请号：KR1020120078211
申请日：2012-07-18
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 이찌까와,고지 , 야마구찌,사또시 , 스즈끼,유끼
IPC分类号： G03F7/004 , G03F7/038 , G03F7/26 , G03F7/20

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