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    • 63. 发明公开
    • 표시 장치 및 그 제조 방법
    • 显示装置及其制造方法
    • KR1020140094880A
    • 2014-07-31
    • KR1020130007483
    • 2013-01-23
    • 삼성디스플레이 주식회사
    • 박홍식김선일문민호공향식김연태정창오
    • G02F1/136G02F1/1343
    • G02F1/13458G02F1/133305G02F1/133377G02F1/1341G02F1/136286G02F1/1368
    • The present invention relates to a display device and a method of fabricating the same for removing a disqualified layer, which may be formed during a process. The method of fabricating the display device according to an embodiment of the present invention includes: forming a thin film transistor on a substrate having a plurality of pixel regions; forming a pixel electrode connected to the thin film transistor in the pixel region; forming a sacrifice layer on the pixel electrode; forming a barrier layer on the sacrifice layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode layer; forming an inlet by patterning the barrier layer, the common electrode, and the roof layer to expose a part of the sacrifice layer; forming a fine space in each of the plurality of pixel regions by removing the sacrifice layer; removing the barrier layer; injecting a liquid crystal into the fine space through the inlet; and sealing the fine space by forming a cover layer on the roof layer.
    • 本发明涉及一种显示装置及其制造方法,用于去除可能在处理过程中形成的不合格层。 根据本发明的实施例的制造显示装置的方法包括:在具有多个像素区域的基板上形成薄膜晶体管; 形成与像素区域中的薄膜晶体管连接的像素电极; 在像素电极上形成牺牲层; 在牺牲层上形成阻挡层; 在阻挡层上形成公共电极; 在公共电极层上形成屋顶层; 通过图案化阻挡层,公共电极和屋顶层来形成入口以暴露部分牺牲层; 通过去除牺牲层在多个像素区域中的每一个中形成精细空间; 去除阻挡层; 通过入口将液晶注入精细空间; 并通过在屋顶层上形成覆盖层来密封细小空间。
    • 65. 发明公开
    • 표시 기판 및 이의 제조 방법
    • 显示基板及其制造方法
    • KR1020140064040A
    • 2014-05-28
    • KR1020120130920
    • 2012-11-19
    • 삼성디스플레이 주식회사
    • 이용수공향식강윤호나현재유세환차명근
    • G02F1/1368H01L29/786
    • H01L29/7869H01L29/45H01L29/66742H01L29/66969H01L27/1225H01L27/124H01L27/1248
    • A display substrate includes a base substrate, a data line which is arranged on the base substrate, a gate line which crosses the data line, a first insulation layer which is arranged on the base substrate, an active pattern which is arranged on the first insulation layer and includes a channel which includes an oxide semiconductor, a source electrode which is connected to the channel, and a drain electrode connected to the channel, a second insulation layer which is arranged on the active pattern and is in contact with the source electrode and the drain electrode, a gate electrode which is arranged on the second insulation layer and overlaps the channel, a passivation layer which is arranged on the second insulation layer and the gate electrode, and a pixel electrode which is electrically connected to the drain electrode through a first contact hole formed by the second insulation layer and the passivation layer.
    • 显示基板包括基底基板,布置在基底基板上的数据线,与数据线交叉的栅极线,布置在基底基板上的第一绝缘层,布置在第一绝缘层上的有源图案 层,并且包括通道,其包括氧化物半导体,连接到沟道的源电极和连接到沟道的漏电极,布置在有源图案上并与源电极接触的第二绝缘层,以及 所述漏电极,布置在所述第二绝缘层上且与所述沟道重叠的栅电极,布置在所述第二绝缘层和所述栅电极上的钝化层,以及通过一电极电连接到所述漏电极的像素电极, 第一接触孔由第二绝缘层和钝化层形成。
    • 66. 发明公开
    • 표시 장치용 글라스 기판 및 이의 제조 방법
    • 用于显示装置的玻璃基板及其制造方法
    • KR1020130110701A
    • 2013-10-10
    • KR1020120032860
    • 2012-03-30
    • 삼성디스플레이 주식회사
    • 이용수공향식강윤호유세환
    • C03B33/02C03B33/033C03C21/00G02F1/13
    • B32B17/10137B32B17/10036C03B33/074C03C17/06C03C17/225C03C17/23C03C21/002C03C2217/213C03C2217/214C03C2217/26C03C2217/281C03C2218/33Y02P40/57Y10T428/24777
    • PURPOSE: A production method of a glass substrate for a display device is provided to produce the glass substrate having high intensity with low costs by cutting at a non-reinforced cut thin film pattern using a wheel and using a chemically reinforced glass thin film. CONSTITUTION: A glass substrate for a display device includes a glass thin film (101) and a cut thin film pattern (102a). The glass thin film has a first chemically reinforced unit on the upper surface, a non-reinforced unit on the edge of the upper surface, and a second chemically reinforced unit on the lower surface. The cut thin film pattern is formed on the non-reinforced unit, and has a thickness of 1,000-10,000 angstroms. A production method of the glass substrate comprises the following steps: forming a cut thin film on a mother glass substrate; forming the cut thin film pattern for the ion exchange process suppression on a scribe line of the mother glass substrate; forming the first chemically reinforced unit, the non-reinforced unit, and the second chemically reinforced unit on the mother glass substrate; and cutting the upper side of the cut thin film pattern for cutting the non-reinforced unit.
    • 目的:提供一种显示装置用玻璃基板的制造方法,通过使用车轮并使用化学强化玻璃薄膜以非增强切割薄膜图案切割,以低成本制造高强度玻璃基板。 构成:用于显示装置的玻璃基板包括玻璃薄膜(101)和切割薄膜图案(102a)。 玻璃薄膜在上表面具有第一化学增强单元,在上表面的边缘上具有非增强单元,在下表面上具有第二化学增强单元。 切割的薄膜图案形成在非增强单元上,并且具有1,000-10,000埃的厚度。 玻璃基板的制造方法包括以下步骤:在母玻璃基板上形成切割薄膜; 在母玻璃基板的划线上形成用于离子交换过程抑制的切割薄膜图案; 在母玻璃基板上形成第一化学增强单元,非增强单元和第二化学增强单元; 并切割切割的薄膜图案的上侧以切割非增强单元。