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    • 52. 发明授权
    • 반도체 광스위치 제조방법
    • 制造半导体光开关的工艺
    • KR1019970004495B1
    • 1997-03-28
    • KR1019930018267
    • 1993-09-10
    • 한국전자통신연구원주식회사 케이티
    • 오광룡박기성박종대김홍만
    • H01L29/86H01L29/8605
    • Y02E10/50
    • A semiconductor light-switch manufacturing method using band rate change to light waveguide by current infusion. In case of previouse light-switch having to Zn spreading inside of waveguide line, by making P electrode inside of Zn spreading area, in production limitation was given in decreasing waveguide width and minus contact area. The purpose of this invention is providing method of manufacturing semiconductor light-switch in order to design waveguide line width freely. The said method comprising the steps of : on the n type InP board using epitecthing method orderly growing n type waveguide line layer and n type InP, spreading Zn at front side, spreading P type electrode at reflecting sife depositing n typr electrode after etching each layer on the waveguide line layer.
    • 一种半导体光开关制造方法,其通过电流注入对光波导进行带隙变化。 在Zn扩散到波导线内部的先行光开关的情况下,通过使P电极在Zn扩散区域内部,在波导宽度和负接触面积减小的情况下进行限制。 本发明的目的是提供制造半导体光开关的方法,以便自由地设计波导线宽度。 所述方法包括以下步骤:在n型InP板上,使用具有顺序生长的n型波导线层和n型InP的n型InP板,在正面扩展Zn,在蚀刻每层之后扩散P型电极以反射生长n型电极 在波导线层上。
    • 60. 发明公开
    • 반사형 반도체 광증폭기 및 수퍼 루미네센스 다이오드
    • 反射半导体光放大器(R-SOA)和反射超光二极管(R-SLD)
    • KR1020080052093A
    • 2008-06-11
    • KR1020060124135
    • 2006-12-07
    • 한국전자통신연구원
    • 오수환박상기백용순오광룡
    • H01S3/0941
    • G02B6/1228G02B2006/121H01L33/0045H01S5/026H01S5/028H01S5/101H01S5/1014H01S5/227H01S5/50
    • A reflective type semiconductor optical amplitude and a reflective type super luminescent diode are provided to allow an optical source to reduce power consumption with large gain and a lower critical current in lower current. A reflective type semiconductor optical amplitude includes a substrate(11). An optical waveguide has a lower clad layer, an active layer(14), and an upper clad layer(33) sequentially stacked on the substrate. The optical waveguide has a linear waveguide region, a bended waveguide region, and a tapered waveguide region. A current blocking layer is formed around the optical waveguide to block current flowing to an exterior of the active layer. The linear waveguide region and the bended waveguide region have a single BH(Buried Hetero) structure. The tapered waveguide region has a double BH structure. A passive waveguide(12) is arranged at a lower portion of the active layer. The active layer and the tapered optical waveguide are connected by a butt-coupling.
    • 提供反射型半导体光学振幅和反射型超发光二极管,以允许光源在较低电流下以大的增益和较低的临界电流来降低功耗。 反射型半导体光学振幅包括基板(11)。 光波导具有下覆盖层,有源层(14)和顺序地层叠在基板上的上覆层(33)。 光波导具有线性波导区域,弯曲波导区域和锥形波导区域。 在光波导周围形成电流阻挡层,以阻挡流向有源层外部的电流。 线性波导区域和弯曲波导区域具有单个BH(埋入异质)结构。 锥形波导区域具有双BH结构。 无源波导(12)布置在有源层的下部。 有源层和锥形光波导通过对接连接。