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51. 发明公开

KR1020110066098A 네가티브형 레지스트 조성물 및 패턴 형성 방법 有权
标题翻译：负极组合物和图案过程
公开(公告)号：KR1020110066098A
公开(公告)日：2011-06-16
申请号：KR1020100125368
申请日：2010-12-09
申请人： 신에쓰 가가꾸 고교 가부시끼가이샤
发明人： 다나까,아끼노부 , 마스나가,게이이찌 , 도몬,다이스께 , 와따나베,사또시
IPC分类号： G03F7/027 , G03F7/004 , H01L21/027
CPC分类号： G03F7/038 , G03F1/08 , G03F7/0045 , G03F7/0382 , G03F7/20 , Y10S430/111 , G03F7/0047 , G03F7/027 , H01L21/027 , H01L21/0271
摘要： PURPOSE: A negative resist composition and a resist pattern producing method using thereof are provided to prevent the generation of a bridge at a space unit, and to produce a pattern with the minimum line width less than 50nm. CONSTITUTION: A negative resist composition contains an alkali-soluble base polymer capable of becoming alkali-insoluble by acid, an acid generator, and a basic component. The base polymer includes a recurring unit marked with chemical formula 1 or chemical formula 2, and contains a polymer with the weight average molecular weight of 1,000~10,000. In the chemical formulas, R1 is either a hydrogen atom or a methyl group. R2 is the hydrogen atom or an alkyl group with 1~6 carbons.
摘要翻译：目的：提供一种负性抗蚀剂组合物及其抗蚀剂图案制造方法，以防止在空间单元处产生桥，并产生最小线宽小于50nm的图案。构成：负性抗蚀剂组合物含有能够由酸，酸发生剂和碱性成分变成碱不溶性的碱溶性碱性聚合物。基础聚合物包括具有化学式1或化学式2的重复单元，并且含有重均分子量为1,000〜10,000的聚合物。在化学式中，R 1是氢原子或甲基。 R2是氢原子或具有1〜6个碳原子的烷基。

52. 发明公开

KR1020110061488A 네가티브형 레지스트 조성물 및 패턴 형성 방법 有权
标题翻译：负极组合物和图案过程
公开(公告)号：KR1020110061488A
公开(公告)日：2011-06-09
申请号：KR1020100120309
申请日：2010-11-30
申请人： 신에쓰 가가꾸 고교 가부시끼가이샤
发明人： 다나까,아끼노부 , 마스나가,게이이찌 , 도몬,다이스께 , 와따나베,사또시
IPC分类号： G03F7/004 , H01L21/027
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/004 , G03F7/0047 , H01L21/027 , H01L21/0271
摘要： PURPOSE: A negative resist composition is provided to prevent bridge hardly to occur, to ensure low substrate dependence and to form a pattern with a high sensitivity and a high resolution. CONSTITUTION: A negative resist composition comprises at least: (A) a base resin that is alkaline-soluble and is made alkaline-insoluble by action of an acid, and/or a combination of a base resin that is alkaline-soluble and is made alkaline-insoluble by reaction with a crosslinker by action of an acid, with a crosslinker; (B) an acid generator; and (C) a compound containing a nitrogen atom as a basic component, wherein the base resin contains at least repeating units represented by the following general formula (1) and general formula (2) and has a weight average molecular weight of 1,000 to 10,000.
摘要翻译：目的：提供负的抗蚀剂组合物以防止几乎不发生桥，以确保低的基板依赖性并形成具有高灵敏度和高分辨率的图案。构成：负性抗蚀剂组合物至少包括：（A）碱溶性碱性树脂，通过酸的作用而成为碱不溶性的碱性树脂和/或碱溶性碱性树脂的组合通过与交联剂的交联剂与交联剂的反应而碱性不溶; （B）酸发生剂; 和（C）含有氮原子作为碱性成分的化合物，其中，所述基础树脂至少含有由以下通式（1）和通式（2）表示的重复单元，其重均分子量为1,000〜10,000 。

53. 发明授权

KR101008816B1 고분자 화합물, 레지스트 재료 및 이것을 이용한 패턴 형성방법 有权
标题翻译：新型聚合物，耐腐蚀组合物和使用该方法的方法
公开(公告)号：KR101008816B1
公开(公告)日：2011-01-14
申请号：KR1020070102970
申请日：2007-10-12
申请人： 신에쓰 가가꾸 고교 가부시끼가이샤
发明人： 다께다,다까노부 , 와따나베,오사무 , 와따나베,사또시 , 고이따바시,류지 , 마스나가,게이이찌 , 와따나베,다모쯔
IPC分类号： C08F212/00 , C08F212/12 , C08F212/02
CPC分类号： G03F7/0397 , Y10S430/106
摘要： 본 발명은 종래의 포지티브형 레지스트 재료를 상회하는 고해상도성을 가지고, 현상 후의 레지스트 패턴의 기판(예를 들면 마스크 블랭크) 상면 내 크기 균일성이 양호하며, 또한 높은 에칭 내성을 갖는 고분자 화합물, 레지스트 재료, 특히 화학 증폭 포지티브형 레지스트 재료를 제공한다.
본 발명은 적어도, 하기 화학식 1 및 2로 표시되는 반복 단위를 가지고, 질량 평균 분자량이 1,000 내지 500,000인 것을 특징으로 하는 고분자 화합물을 제공한다.

레지스트 재료, 고분자 화합물, 미세 패턴, 소수성 파라미터, 고해상성

54. 发明公开

KR1020100129227A 화학 증폭형 레지스트 재료 및 패턴 형성 방법 有权
标题翻译：化学稳定组合物和图案形成过程
公开(公告)号：KR1020100129227A
公开(公告)日：2010-12-08
申请号：KR1020100050179
申请日：2010-05-28
申请人： 신에쓰 가가꾸 고교 가부시끼가이샤
发明人： 마스나가,게이이찌 , 와따나베,사또시 , 다나까,아끼노부 , 도몬,다이스께
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/004 , G03F7/0046 , H01L21/027 , H01L21/0271
摘要： PURPOSE: A resist material is provided to avoid pattern peeling and pattern collapse using a polymer with a sulfonic acid sulfonate containing a fluorinatd alkyl chain at a side chain. CONSTITUTION: A chemically amplified resist composition comprises a polymer comprising units having polarity to impart adhesion and acid labile units adapted to turn alkali soluble under the action of acid. The polymer comprises repeating units having formula(1) wherein R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or CF2CF3, A is a divalent hydrocarbon group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl. Recurring units containing an aromatic ring structure are present in an amount of 60 mol % or more and the recurring units having formula(1) are present in an amount less than 5 mol %.
摘要翻译：目的：提供抗蚀剂材料以避免图案剥离和图案塌陷，所述聚合物与侧链上含有氟代烷基链的磺酸磺酸盐形成聚合物。构成：化学放大抗蚀剂组合物包含含有极性赋予粘合性的单元的聚合物和适于在酸的作用下使碱溶性转变的酸不稳定单元。聚合物包含具有式（1）的重复单元，其中R 1是H，F，CH 3或CF 3，R f是H，F，CF 3或CF 2 CF 3，A是二价烃基，R 2和R 3是烷基，烯基，芳基，芳烷基或芳氧基烷基。含有芳环结构的重复单元的存在量为60摩尔％以上，并且具有式（1）的重复单元的存在量小于5摩尔％。

55. 发明公开

KR1020100129223A 네가티브형 레지스트 조성물 및 이것을 이용한 패턴 형성 방법 有权
标题翻译：使用它的负极性组合物和图案处理方法
公开(公告)号：KR1020100129223A
公开(公告)日：2010-12-08
申请号：KR1020100050149
申请日：2010-05-28
申请人： 신에쓰 가가꾸 고교 가부시끼가이샤
发明人： 다나까,아끼노부 , 마스나가,게이이찌 , 도몬,다이스께 , 와따나베,사또시
IPC分类号： G03F7/004 , H01L21/027
CPC分类号： G03F7/0382 , G03F7/004 , G03F7/0045 , H01L21/027 , H01L21/0271
摘要： PURPOSE: A negative resist composition is provided to adopt chemically amplified resists as a photoresist, to exhibit excellent sensitivities to such high energy radiations and to provide higher resolutions. CONSTITUTION: A negative resist composition comprises (A) a base polymer which is soluble in alkali and which is insolubilized in alkali by an action of an acid; and/or a combination of a crosslinking agent and a base polymer which is soluble in alkali and which is reacted with the crosslinking agent by an action of an acid to thereby be insolubilized in alkali, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component. The polymer to be used as the base polymer is: a polymer, which is obtained by polymerizing two or more kinds of monomers represented by the following general formula(1), or which is obtained by polymerizing a monomer mixture containing one or more kinds of monomers represented by the general formula(1) and one or more kinds of styrene monomers represented by the following general formula(2); or a polymer obtained by subjecting the functional groups of the polymerizedly obtained polymer to a further chemical conversion. The repeating units derived from the monomers represented by the general formula(1) are included in the obtained polymer at a sum ratio of 50 mole% or more relative to a total amount of all repeating units constituting the obtained polymer.
摘要翻译：目的：提供负抗蚀剂组合物以采用化学放大抗蚀剂作为光致抗蚀剂，以对这种高能量辐射表现出优异的敏感性并提供更高的分辨率。构成：负性抗蚀剂组合物包含（A）可溶于碱的碱性聚合物，其通过酸的作用在碱中不溶解; 和/或交联剂和碱性聚合物的组合，其可溶于碱，并通过酸的作用与交联剂反应，从而不溶于碱，（B）酸产生剂，和（C）作为基本成分的含氮化合物。用作基础聚合物的聚合物是：通过聚合由以下通式（1）表示的两种或更多种单体获得的聚合物，或通过将含有一种或多种由通式（1）表示的单体和由以下通式（2）表示的一种或多种苯乙烯单体; 或通过使聚合获得的聚合物的官能团进一步进行化学转化而获得的聚合物。衍生自由通式（1）表示的单体的重复单元相对于构成所得聚合物的全部重复单元的总量，以50摩尔％以上的总和比包含在所得聚合物中。

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