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31. 发明公开

KR1020100008951A 트리클로로에틸렌 또는 테트라클로로에틸렌을 함유하는세정 조성물 失效
标题翻译：含有三氯乙烯或四氯乙烯的清洁组合物
公开(公告)号：KR1020100008951A
公开(公告)日：2010-01-27
申请号：KR1020080069594
申请日：2008-07-17
申请人： 호서대학교 산학협력단
发明人： 김진배 , 김세현 , 전경민 , 임대근
IPC分类号： C11D7/30 , C11D3/24 , C11D1/72 , C11D7/50 , C11D3/43 , C11D11/00
CPC分类号： C11D7/30 , C11D1/72 , C11D3/24 , C11D3/43 , C11D7/5004 , C11D11/0047
摘要： PURPOSE: A cleaning composition is provided to effectively remove only anisotropic conductive film from a printed circuit board while not damaging the printed circuit board by using low toxic trichloroethylene or tetrachloroethylene. CONSTITUTION: A cleaning composition for removing an anisotropic conductive film of a printed circuit board comprises 80-98 weight% one or more solvents selected from the group consisting of trichloroethylene and tetrachloroethylene; and 2-20 weight% one or more thickening agents selected from the group consisting of xanthan gum, cellulose, ethylcellulose, liquid paraffin, paraffin wax and gelatin.
摘要翻译：目的：提供一种清洁组合物，以有效地从印刷电路板除去各向异性导电膜，同时通过使用低毒三氯乙烯或四氯乙烯不损坏印刷电路板。构成：用于除去印刷电路板的各向异性导电膜的清洁组合物包含80-98重量％的一种或多种选自三氯乙烯和四氯乙烯的溶剂; 和2-20重量％的一种或多种选自由黄原胶，纤维素，乙基纤维素，液体石蜡，石蜡和明胶组成的组的增稠剂。

32. 发明公开

KR1020100003526A 박리제 및 상기 박리제를 사용한 표시판의 제조 방법 无效
标题翻译：使用其制造显示面板的剥离器和方法
公开(公告)号：KR1020100003526A
公开(公告)日：2010-01-11
申请号：KR1020080063461
申请日：2008-07-01
申请人： 삼성디스플레이 주식회사 , 주식회사 동진쎄미켐
发明人： 홍선영 , 박홍식 , 정종현 , 이지선 , 서남석 , 김봉균 , 최영주 , 이병진 , 김병욱 , 정종현 , 윤석일 , 신성건 , 허순범 , 정세환 , 장두영
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , C11D1/72 , G02F1/1333 , G02F1/13458 , G02F1/136227 , G03F7/34 , H01L27/124
摘要： PURPOSE: A stripper is provided to ensure excellent strippability of a photosensitive film, to remarkably reduce swelling phenomenon in a color filter and insulating layer, and to suppress display defects by preventing the unevenness caused by swelling of the surface of the color filter and insulating layer. CONSTITUTION: A stripper comprises 1-20 weight% cyclic amine compound, 10-90 weight% glycol ether compound, and the remaining amount of polar solvent. A method for manufacturing a display panel using a release agent comprises the steps of: forming a gate electrode(124); forming an insulating layer(140) on the gate electrode; forming a semiconductor(151) on the gate insulating layer; forming a source electrode(173) and a drain electrode(175) on the semiconductor; forming a color filter(230) on the source electrode and drain electrode; and forming pixel electrode(191) on the insulating layer.
摘要翻译：目的：提供剥离器，以确保感光膜的优异的剥离性，显着减少滤色器和绝缘层中的溶胀现象，并且通过防止由滤色器和绝缘层的表面膨胀引起的不均匀性来抑制显示缺陷。构成：剥离剂包含1-20重量％的环胺化合物，10-90重量％的二醇醚化合物和剩余量的极性溶剂。使用脱模剂制造显示面板的方法包括以下步骤：形成栅电极（124）; 在栅电极上形成绝缘层（140）; 在栅绝缘层上形成半导体（151）; 在半导体上形成源电极（173）和漏电极（175）; 在源电极和漏电极上形成滤色器（230）; 以及在所述绝缘层上形成像素电极（191）。

33. 发明公开

KR1020090073909A 복합탈지제 및 이를 이용한 탈지 방법 无效
标题翻译：公司退役代理人及其使用方法
公开(公告)号：KR1020090073909A
公开(公告)日：2009-07-03
申请号：KR1020070141979
申请日：2007-12-31
申请人： 현대하이스코 주식회사
发明人： 박영록 , 정용수 , 이영수
IPC分类号： C23G5/02 , C11D3/00 , C11D3/04 , C11D1/72 , C11D3/33
CPC分类号： C23G5/02 , C11D1/72 , C11D3/0026 , C11D3/0073 , C11D3/044 , C11D3/33
摘要： A degreasing agent and a degreasing method are provided to ensure low bubbles in a continuous coloring line and good degreasing ability, to reduce costs and environmental contamination. A degreasing agent comprises sodium hydroxide 15-20 parts by weight, a corrosion inhibitor 22.5-40 parts by weight, an emulsifying and dispersing agent 2-7 parts by weight, a chelating agent 1-5 parts by weight and a coupling agent 0.1-4 parts by weight. The anticorrosive agent is used with an alkali group. The emulsifying and dispersing agent comprises polyoxyethylene alkyl ether. The chelating agent includes one selected from sodium tripolyphosphate, sodium metaphosphate, sodium gluconate and ethylene diamine tetracetate.
摘要翻译：提供脱脂剂和脱脂方法，以确保连续着色线中的低气泡和良好的脱脂能力，以降低成本和环境污染。脱脂剂包括15-20重量份的氢氧化钠，22.5-40重量份的腐蚀抑制剂，2-7重量份的乳化分散剂，1-5重量份的螯合剂和偶联剂0.1- 4重量份。防腐剂与碱性基团一起使用。乳化分散剂包括聚氧乙烯烷基醚。螯合剂包括选自三聚磷酸钠，偏磷酸钠，葡糖酸钠和乙二胺四乙酸酯中的一种。

34. 发明公开

KR1020090035462A 개량된 경질 표면 세정용 조성물 无效
标题翻译：改进的硬表面清洁组合物
公开(公告)号：KR1020090035462A
公开(公告)日：2009-04-09
申请号：KR1020087009057
申请日：2007-07-18
申请人： 레킷트 뱅키저 (유케이) 리미티드
发明人： 페리리사 , 영제임스
IPC分类号： C11D1/835 , C11D1/62 , C11D1/72 , C11D3/04 , C11D3/20 , C11D3/22 , C11D17/00
CPC分类号： C11D3/042 , C11D1/62 , C11D1/72 , C11D1/835 , C11D3/2075 , C11D3/2086 , C11D3/225 , C11D17/003
摘要： The present invention relates to hard surface cleaning compositions useful in cleaning, and optionally a disinfecting or sanitizing benefit which are particularly adapted to clean lavatory appliances, particularly toilets and the like. The compositions are largely aqueous, thickened, acidic compositions which comprise an acid, a thickening constituent or constituents which form a thickener system, at least one detersive surfactant and at least one superwetter surfactant which is based on a narrow range ethoxylated alcohol nonionic surfactant having two cloud points.
摘要翻译：本发明涉及用于清洁和任选的消毒或消毒益处的硬表面清洁组合物，其特别适用于清洁厕所器具，特别是厕所等。组合物主要是含水，增稠的酸性组合物，其包含酸，增稠组分或形成增稠剂体系的组分，至少一种去污表面活性剂和至少一种超级表面活性剂，其基于窄范围乙氧基化醇非离子表面活性剂，其具有两个云点。

35. 发明公开

KR1020080080293A 액체 세정제 有权
标题翻译：液体洗涤剂
公开(公告)号：KR1020080080293A
公开(公告)日：2008-09-03
申请号：KR1020087013074
申请日：2006-12-26
申请人： 카오카부시키가이샤
发明人： 마키마사타카 , 다세유이치로 , 이시즈카히토시 , 야마구치노부요시
IPC分类号： C11D3/39 , C11D3/395 , C11D1/722 , C11D17/08
CPC分类号： C11D3/3947 , C11D1/72 , C11D3/0047 , C11D3/042 , C11D3/046 , C11D3/2065 , C11D3/221 , C11D3/3907 , C11D17/0017 , D06L4/12
摘要： Disclosed is a liquid detergent which comprises (a) hydrogen peroxide or a compound capable of producing hydrogen peroxide in water, (b) 0.1 to 10% by mass of a bleach activator, (c) 45 to 80% by mass of a nonionic surfactant, (d) water, (e) at least one compound selected from boric acid, borax and a borate salt and (f) a polyol compound and shows a pH value of 4 to 7 at 20°C. Also disclosed is a liquid bleaching detergent composition containing hydrogen peroxide, wherein the composition comprises an water-in-oil-type emulsion having an aqueous droplet dispersed in a surfactant-containing continuous phase.
摘要翻译：公开了一种液体洗涤剂，其包含（a）过氧化氢或能够在水中产生过氧化氢的化合物，（b）0.1〜10质量％的漂白活化剂，（c）45〜80质量％的非离子表面活性剂，（d）水，（e）至少一种选自硼酸，硼砂和硼酸盐的化合物和（f）多元醇化合物，并且在20℃下的pH值为4至7。还公开了含有过氧化氢的液体漂白洗涤剂组合物，其中组合物包含具有分散在含表面活性剂的连续相中的水滴的油包水型乳液。

36. 发明公开

KR1020080069698A 포토리소그래피용 세정액 및 이것을 사용한 노광 장치의세정 방법 有权
标题翻译：用于摄影的洗涤液，以及使用其洗涤曝光装置的方法
公开(公告)号：KR1020080069698A
公开(公告)日：2008-07-28
申请号：KR1020087014757
申请日：2006-11-22
申请人： 도오꾜오까고오교 가부시끼가이샤
发明人： 고시야마준 , 사와다요시히로 , 요코야지로 , 히라노도모유키
IPC分类号： C11D1/66 , C11D3/43 , G03F7/20 , H01L21/027
CPC分类号： C11D3/43 , C11D1/66 , C11D1/667 , C11D1/72 , C11D3/18 , C11D3/181 , C11D3/182 , C11D3/184 , C11D3/188 , G03F7/2041 , G03F7/70341 , G03F7/70925 , G03F7/70983
摘要： [PROBLEMS] To provide a washing liquid for photolithography, which, in a liquid immersion exposure process, can efficiently wash and remove contaminants of an exposure device site (particularly an optical lens part) derived from an elution component from a photoresist, can realize simple waste liquid treatment, can realize high replacement with a liquid immersion medium, and does not cause any problem with throughput in the manufacture of semiconductors, and a method for washing an exposure device using the same. [MEANS FOR SOLVING PROBLEMS] A washing liquid for photolithography for use in washing of an exposure device in a liquid immersion exposure process in which exposure is carried out in such a state that a part between the exposure device in its optical lens part and an object for exposure mounted on a wafer stage is filled with a liquid immersion medium, the washing liquid comprising (a) a surfactant, (b) a hydrocarbon solvent, and (c) water, and a method for washing an exposure device using the washing liquid.
摘要翻译：提供一种用于光刻的洗涤液，其在浸液曝光工艺中可以有效地清洗和去除来自光致抗蚀剂的洗脱组分衍生的曝光装置部位（特别是光学透镜部分）的污染物，可以实现简单的废液处理，可以通过液浸介质实现高替换，并且在半导体的制造中不会产生任何的通过量问题，以及使用其的曝光装置的清洗方法。解决问题的手段在液浸式曝光工序中的曝光装置的清洗用的光刻用洗涤液中，其中在其光学透镜部分中的曝光装置与物体之间的部分的状态下进行曝光为了曝光安装在晶片台上的液体浸渍介质，洗涤液包含（a）表面活性剂，（b）烃溶剂和（c）水，以及使用该洗涤液洗涤曝光装置的方法。

37. 发明授权

KR100843993B1 멸균 렌즈 패키지를 포함하는 제품, 콘택트 렌즈 패키징 용액, 소수성 콘택트 렌즈의 패키징 방법 및 소수성 콘택트 렌즈의 저장방법 有权
标题翻译：一种制品，其包括无菌镜片包装，隐形眼镜包装溶液，用于包装疏水性隐形眼镜的方法和用于存储疏水性隐形眼镜的方法
公开(公告)号：KR100843993B1
公开(公告)日：2008-07-07
申请号：KR1020037007652
申请日：2001-11-14
申请人： 존슨 앤드 존슨 비젼 케어, 인코포레이티드
发明人： 몰락프랑크에프. , 포드제임스디. , 메이든애니씨. , 러브로버트엔.
IPC分类号： A61L12/00
CPC分类号： C11D1/667 , A61L12/00 , C11D1/521 , C11D1/662 , C11D1/72 , C11D1/722 , C11D1/74 , C11D1/75 , C11D3/0078
摘要： 본 발명은 소수성 콘택트 렌즈에 사용하기 위한 패키징 용액을 제공한다. 본 발명의 패키징 용액은 패키지 표면 렌즈가 부착되는 것을 실질적으로 방지하여 렌즈의 변형 또는 파손을 방지한다.
패키징 용액, 소수성 콘택트 렌즈, 계면활성제, 친수기-소수기 평형, 변형 및 파손

38. 发明公开

KR1020080045144A 의료용 액체 세정제 조성물 有权
标题翻译：液体洗涤剂组合物
公开(公告)号：KR1020080045144A
公开(公告)日：2008-05-22
申请号：KR1020087004046
申请日：2006-09-14
申请人： 라이온 가부시키가이샤
发明人： 오누키이즈미 , 타치카와토시히코 , 오노메구무 , 오카모토타카히로 , 카타기테츠야
IPC分类号： C11D17/08 , C11D1/72 , C11D1/75
CPC分类号： C11D3/3418 , C11D1/44 , C11D1/62 , C11D1/72 , C11D1/835 , C11D1/94
摘要： Disclosed is a liquid detergent composition for clothes characterized by containing (A) polyoxyethylene alkyl ether, (B) a compound represented by the general formula (I) below, (C) a semipolar surface active agent, an amphoteric surface active agent or a compound represented by the general formula (II) or (III) below, and (D) 1-hydroxyethane-1,1-diphosphonic acid or a salt thereof. (I) (In the formula (I), X, Y and Z respectively represent a hydrogen atom, CnH2n+1 or (CH3)2CH (wherein n is an integer of 1-3); and M represents a hydrogen atom, an alkali metal atom, an alkaline earth metal atom, NH4+ or an alkanolamine.) (II) (III) (In the formulae (II) and (III), R11, R12 and R13 respectively represent an alkyl group, an alkenyl group, a straight chain hydroxyalkyl group, a tolyl group, a phenyl group or a benzyl group; EO represents an ethylene oxide group; a and b respectively represent a number not less than 0 and a + b is not less than 10; and X- represents an anion.)
摘要翻译：公开了一种用于衣服的液体洗涤剂组合物，其特征在于含有（A）聚氧乙烯烷基醚，（B）下述通式（I）表示的化合物，（C）半极性表面活性剂，两性表面活性剂或化合物由下述通式（II）或（III）表示，和（D）1-羟基乙烷-1,1-二膦酸或其盐。（I）（式（I）中，X，Y，Z分别表示氢原子，C n H 2n + 1或（CH 3）2 CH（n为1-3的整数），M表示氢原子，碱金属原子，碱土金属原子，NH 4 +或链烷醇胺）（II）（III）（式（II）和（III））中，R 11，R 12和R 13分别表示烷基，烯基，直链羟烷基，甲苯基，苯基或苄基; EO表示环氧乙烷基; a和b分别表示不小于0且a + b不小于10的数; X表示阴离子。）

39. 发明授权

KR100805470B1 자동 분석 장치용 알칼리성 세제, 자동 분석 장치의 세정방법, 및 자동 분석 장치 有权
标题翻译：用于自动分析装置的碱洗剂，用于清洁自动分析装置的方法和自动分析装置
公开(公告)号：KR100805470B1
公开(公告)日：2008-02-20
申请号：KR1020060051361
申请日：2006-06-08
申请人： 가부시끼가이샤 도시바 , 도시바 메디칼 시스템즈 코포레이션
发明人： 다카야마히로코 , 다케우치미치아키
IPC分类号： C11D1/66 , C11D1/722 , C11D3/43 , C11D11/00
CPC分类号： G01N35/1004 , C11D1/72 , C11D1/722 , C11D3/201 , C11D3/43 , C11D11/0041
摘要： 본 발명은 자동 분석 장치용 알칼리성 세제, 자동 분석 장치의 세정 방법, 및 자동 분석 장치에 관한 것으로서, 비이온 계면활성제로서의 폴리옥시알킬렌알킬에테르와 담점(曇点) 조정용 유기 용매를 함유하는 알칼리성 용액을 포함하는 것을 특징으로 하는 자동 분석 장치용 알칼리성 세제이다.

40. 发明公开

KR1020080009939A 이머젼 리소그라피 공정을 이용한 반도체 소자 제조방법 无效
标题翻译：半导体器件的制造方法使用渗透层析工艺
公开(公告)号：KR1020080009939A
公开(公告)日：2008-01-30
申请号：KR1020060069758
申请日：2006-07-25
申请人： 에스케이하이닉스 주식회사
发明人： 김태환
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , C11D1/72 , C11D1/721 , G03F7/2041 , H01L21/67028
摘要： A method for manufacturing a semiconductor device using an immersion lithography process is provided to obtain vertical patterns by improving the top loss of a photoresist pattern by neutralizing acid existing on a surface of a resist layer. A method for manufacturing a semiconductor device using an immersion lithography process includes the steps of: forming the resist film on an etched layer of a semiconductor wafer; coating an aqueous solution including a basic compound and a non-ionic surfactant on a surface of the resist film; performing an exposing process by using immersion lithography equipment; baking the product of third step after exposure; and obtaining a desired pattern by developing the product of the fourth step.
摘要翻译：提供了使用浸没式光刻工艺制造半导体器件的方法，以通过中和存在于抗蚀剂层表面上的酸来改善光致抗蚀剂图案的最大损耗来获得垂直图案。使用浸没式光刻工艺制造半导体器件的方法包括以下步骤：在半导体晶片的蚀刻层上形成抗蚀剂膜; 在抗蚀剂膜的表面上涂布包含碱性化合物和非离子表面活性剂的水溶液; 通过使用浸没式光刻设备进行曝光处理; 暴露后烘烤第三步的产品; 并通过开发第四步骤的产物来获得所需的图案。

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