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31. 发明公开

KR1020120078325A 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자 有权
标题翻译：阳离子敏感性树脂组合物，使用其制备的感光树脂层和包含感光树脂层的半导体器件
公开(公告)号：KR1020120078325A
公开(公告)日：2012-07-10
申请号：KR1020100140594
申请日：2010-12-31
申请人： 제일모직주식회사
发明人： 차명환 , 이종화 , 임미라 , 정민국 , 정지영 , 조현용 , 전환승
IPC分类号： G03F7/039 , G03F7/016 , H01L21/027
CPC分类号： H01L23/296 , G03F7/0226 , G03F7/0233 , G03F7/0751 , H01L2924/0002 , G03F7/0395 , G03F7/0163 , H01L21/0274 , H01L2924/00
摘要： PURPOSE: A positive type photosensitive resin composition, a photosensitive resin film using the same, and a semiconductor device including the film are provided to improve residual film rate by adjusting the dissolution speed of an exposing part and a non-exposing part. CONSTITUTION: A positive type photosensitive resin composition includes a polybenzoxazole precursor, a dissolution adjusting agent, a photosensitive diazoquinone compound, a silane compound, and a solvent. The dissolution adjusting agent includes a compound represented by chemical formula 6. The polybenzoxazole precursor is selected from a group including a first polybenzoxazole precursor, a second polybenzoxazole precursor, and the combination of the same. The first polybenzoxazole precursor includes a repeating unit represented by chemical formula 1, a repeating unit represented by chemical formula 2, or the combination of the same. A thermal polymerizable functional group is arranged at one or more end parts of the first polybenzoxazole precursor. The second polybenzoxazole precursor includes a repeating unit represented by chemical formula 4, a repeating unit represented by chemical formula 5, or the combination of the same. In chemical formula 6, Z1 and Z2 are identical or different and are respectively single bonds, O, CO, CONH, S, or SO_2-substituted or non-substituted C1 to C10 alkyleneoxy groups(OR203) or -substituted or non-substituted C6 to C15 aryleneoxy groups(OR204); in the alkyleneoxy groups, R203 is a substituted or non-substituted alkylene group; in the aryleneoxy group, R204 is a substituted or non-substituted arylene group; and G1 is a hydrogen element, a substituted or non-substituted C1 to C30 aliphatic organic group, a substituted or non-substituted C3 to C30 alicyclic organic group, a substituted or non-substituted C6 to C30 aromatic organic group, a substituted or non-substituted C2 to C30 heterocyclic group, or -Ti-R300.
摘要翻译：目的：提供正型感光性树脂组合物，使用其的感光性树脂膜和包含该膜的半导体装置，通过调整曝光部和非曝光部的溶解速度来提高残膜率。构成：正型感光性树脂组合物包括聚苯并恶唑前体，溶解调节剂，感光性重氮醌化合物，硅烷化合物和溶剂。溶解调节剂包括由化学式6表示的化合物。聚苯并恶唑前体选自包括第一聚苯并恶唑前体，第二聚苯并恶唑前体及其组合的组。第一聚苯并恶唑前体包括由化学式1表示的重复单元，由化学式2表示的重复单元或其组合。第一聚苯并恶唑前体的一个或多个端部设置有热聚合性官能团。第二聚苯并恶唑前体包括由化学式4表示的重复单元，由化学式5表示的重复单元或其组合。在化学式6中，Z 1和Z 2相同或不同，分别为O，CO，CONH，S或SO 2 - 取代或未取代的C1至C10亚烷基氧基（OR203）或取代或未取代的C6 C15亚芳氧基（OR204）; 在亚烷氧基中，R 2 O 3是取代或未取代的亚烷基; 在芳氧基中，R204是取代或未取代的亚芳基; 取代或未取代的C 3至C 30脂族有机基团，取代或未取代的C 6至C 30芳族有机基团，取代或未取代的C 1至C 30脂族有机基团，取代或未取代的C 3至C 30脂族有机基团，取代的C2至C30杂环基或-Ti-R300。

32. 发明公开

KR1020120078324A 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자 有权
标题翻译：阳离子敏感性树脂组合物，使用其制备的感光树脂层和包含感光树脂层的半导体器件
公开(公告)号：KR1020120078324A
公开(公告)日：2012-07-10
申请号：KR1020100140593
申请日：2010-12-31
申请人： 제일모직주식회사
发明人： 이종화 , 조현용 , 임미라 , 전환승 , 정민국 , 정지영 , 차명환
IPC分类号： G03F7/039 , G03F7/016 , H01L21/027
CPC分类号： G03F7/0233 , G03F7/0236 , G03F7/0751 , H01L23/293 , H01L2924/0002 , G03F7/0395 , G03F7/0163 , H01L21/0274 , H01L2924/00
摘要： PURPOSE: A positive type photosensitive resin composition, a photosensitive resin film using the composition, and a semiconductor device including the film are provided to adjust the dissolution speed of an exposing part and a non-exposing part. CONSTITUTION: A positive type photosensitive rein composition includes a polybenzoxazole precursor, a novolak resin, a photosensitive diazoquinone compound, a silane compound, and a solvent. The novolak resin includes a compound with a repeating unit represented by chemical formula 6. The polybenzoxazole precursor is selected from a group including a first polybenzoxazole precursor, a second polybenzoxazole precursor, and the combination of the same. The first polybenzoxazole precursor includes a repeating unit represented by chemical formula 1, a repeating unit represented by chemical formula 2, or the combination of the same. A thermal polymerizable functional group is arranged at one end part of the first polybenzoxazole precursor. The second polybenzoxazole precursor includes a repeating unit represented by chemical formula 4, a repeating unit represented by chemical formula 5, or the combination of the same. In chemical formula 6, R7 is identical or different in each repeating unit and is a C1 to C20 aliphatic organic group.
摘要翻译：目的：提供正型感光性树脂组合物，使用该组合物的感光性树脂膜和包含该膜的半导体装置，以调节曝光部和非曝光部的溶解速度。构成：正型感光性组合物包括聚苯并恶唑前体，酚醛清漆树脂，感光性重氮醌化合物，硅烷化合物和溶剂。酚醛清漆树脂包括具有由化学式6表示的重复单元的化合物。聚苯并恶唑前体选自包括第一聚苯并恶唑前体，第二聚苯并恶唑前体及其组合的组。第一聚苯并恶唑前体包括由化学式1表示的重复单元，由化学式2表示的重复单元或其组合。第一聚苯并恶唑前体的一个端部设置有热聚合性官能团。第二聚苯并恶唑前体包括由化学式4表示的重复单元，由化学式5表示的重复单元或其组合。在化学式6中，R7在每个重复单元中相同或不同，为C1至C20脂族有机基团。

33. 发明公开

KR1020120072971A 포지티브형 감광성 수지 조성물 및 이를 이용한 감광성 수지막 有权
标题翻译：正极型感光树脂组合物和使用它的感光树脂层
公开(公告)号：KR1020120072971A
公开(公告)日：2012-07-04
申请号：KR1020100134927
申请日：2010-12-24
申请人： 제일모직주식회사
发明人： 유용식 , 이종화 , 이정우 , 정민국 , 정지영 , 조현용 , 차명환 , 전환승
IPC分类号： G03F7/039 , G03F7/022 , G03F7/11
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/0392 , G03F7/0758
摘要： PURPOSE: A positive type photosensitive resin composition, and a photosensitive resin film using the same, and semiconductor electronic parts including the same are provided to form a surface protective film or an interlayer dielectric layer with superior film property. CONSTITUTION: A positive type photosensitive resin composition includes a polyamide polymer represented by chemical formula 1, an esterificated quinonediazide compound, a phenol novolak resin, and a solvent. The weight average molecular weight of the phenol novolak resin is between 3,000 and 9,000 g/mol. The content of the phenol novolak resin is 0.1 to 30 parts by weight of based on 100 parts by weight of the polyamide polymer. In chemical formula 1, E1 and E2 are identical or different and are hydrogen elements, carboxylic acid anhydrides, single carboxylic acid groups, or the residue of the active derivatives of the same; if E1 is a hydrogen element, E2 is not a hydrogen element; Xn is X1 or X2; X1 and X2 are identical or different and are divalent to tetravalent organic groups; Y1 and Y2 are identical or different and are trivalent to hexavalent organic groups; R1 and R2 are identical or different and are hydrogen elements or C1 to C5 organic groups; m1 and m2 are average values and are respectively 0 to 100; and the sum of m1 and m2 are 1 to 100.
摘要翻译：目的：提供正型感光性树脂组合物和使用该感光性树脂的感光性树脂膜，以及包含该感光性树脂的半导体电子部件，形成具有优异的膜特性的表面保护膜或层间电介质层。构成：正型感光性树脂组合物包括由化学式1表示的聚酰胺聚合物，酯化醌二叠氮化合物，苯酚酚醛清漆树脂和溶剂。酚醛清漆树脂的重均分子量为3,000〜9,000g / mol。酚醛清漆树脂的含量相对于聚酰胺聚合物100重量份为0.1〜30重量份。在化学式1中，E1和E2相同或不同，为氢元素，羧酸酐，单羧酸基或其活性衍生物的残基; 如果E1是氢元素，E2不是氢元素; Xn为X1或X2; X1和X2相同或不同，为二价至四价有机基团; Y1和Y2是相同或不同的并且是三价至六价有机基团; R1和R2相同或不同，为氢元素或C1至C5有机基团; m1和m2是平均值，分别为0至100; m1和m2的和为1〜100。

34. 发明公开

KR1020110069467A 오르토-니트로벤질 에스테르 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물 无效
标题翻译：邻氨基苯甲酸酯化合物和包含其的阳性类型的感光性树脂组合物
公开(公告)号：KR1020110069467A
公开(公告)日：2011-06-23
申请号：KR1020090126211
申请日：2009-12-17
申请人： 제일모직주식회사
发明人： 정민국 , 유용식 , 조현용 , 이정우 , 정지영 , 이종화 , 정두영 , 전환승
IPC分类号： C07C205/42 , C08G73/22 , C08K5/32 , G03F7/004
CPC分类号： C07C205/42 , C08G73/22 , C08K5/32 , G03F7/004 , G03F7/0045 , G03F7/039 , G03F7/0392
摘要： PURPOSE: A positive type photosensitive resin composition including an ortho-nitrobenzyl ester compound is provided to ensure excellent sensitivity, resolution, pattern formation capablity and residue removal proeprty. CONSTITUTION: An ortho-nitrobenzyl ester compound includes a compound represented by chemical formula 1, a compound represented by chemical formula 2, or combination thereof. In chemical formulas 1 and 2, R1, R2, R5 and R6 are the same and different and represent substituted or unsubstituted aliphatic organic group or substituted or unsubstituted alicyclic organic group; R3 and R7 are the same and different and represent a single bond, or substituted or unsubstituted divalent organic group; R4, R8 and R9 are the same and different and represent substituted or unsubstituted aliphatic organic group or substituted or unsubstituted alicyclic organic group; n1 is an integer of 1-5; n2 is an integer of 0-3; n3 is an integer of 0-4; and n2+n3 is an integer of 1 or greater.
摘要翻译：目的：提供包含邻硝基苄基酯化合物的正型感光性树脂组合物，以确保优异的灵敏度，分辨率，图案形成能力和残留物去除率。构成：邻硝基苄基酯化合物包括由化学式1表示的化合物，由化学式2表示的化合物或其组合。在化学式1和2中，R 1，R 2，R 5和R 6相同且不同，表示取代或未取代的脂族有机基团或取代或未取代的脂环族有机基团; R3和R7相同且不同，表示单键或取代或未取代的二价有机基团; R4，R8和R9相同且不同，表示取代或未取代的脂族有机基团或取代或未取代的脂环族有机基团; n1为1-5的整数; n2是0-3的整数; n3是0-4的整数; n2 + n3为1以上的整数。

35. 发明公开

KR1020110051617A 포지티브형 감광성 수지 조성물 失效
标题翻译：正性感光树脂组合物
公开(公告)号：KR1020110051617A
公开(公告)日：2011-05-18
申请号：KR1020090108273
申请日：2009-11-10
申请人： 제일모직주식회사
发明人： 정지영 , 정민국 , 조현용 , 정두영 , 이종화 , 유용식 , 이정우 , 전환승
IPC分类号： G03F7/039 , G03F7/075 , G03F7/016
CPC分类号： G03F7/0233 , G03F7/40
摘要： PURPOSE: A positive type photosensitive resin composition is provided to improve the sensitivity, the resolution, the pattern forming property, the impurity eliminating property, and the reliability of the composition and accelerate a developing process based on an alkaline developing solution. CONSTITUTION: A positive type photosensitive resin composition includes a polybenzoxazole precursor, a photosensitive diazoquinone compound, a phenol compound, a silane compound, and a solvent. The polybenzoxazole precursor includes a repeating unit represented by chemical formula 1, a repeating unit represented by chemical formula 2, and the combination of the same. A thermally polymerizable functional group is arranged at least one end part of the polybenzoxazole precursor. The phenol compound includes a crosslinkable functional group. In the chemical formulas 1 and 2, X1 is an aromatic organic group. X2 is an aromatic organic group, bivalent to hexavalent cycloaliphatic organic group, or a functional group represented by chemical formula 3. Y1 and Y2 are identical or different and are respectively aromatic organic group or bivalent to hexavalent cycloaliphatic organic group.
摘要翻译：目的：提供正型感光性树脂组合物，以提高基于碱性显影液的灵敏度，分辨率，图案形成性质，杂质除去性能和组合物的可靠性，并加速显影处理。构成：正型感光性树脂组合物包括聚苯并恶唑前体，感光性重氮醌化合物，酚化合物，硅烷化合物和溶剂。聚苯并恶唑前体包括由化学式1表示的重复单元，由化学式2表示的重复单元及其组合。热聚合性官能团配置在聚苯并恶唑前体的至少一个端部。酚化合物包括可交联官能团。在化学式1和2中，X1是芳族有机基团。 X2是芳族有机基团，二价至六价脂环族有机基团或由化学式3表示的官能团.Y1和Y2相同或不同，分别为芳族有机基团或二价至六价脂环族有机基团。

36. 发明授权

KR100995079B1 포지티브형 감광성 수지 조성물 有权
标题翻译：正型感光树脂组合物
公开(公告)号：KR100995079B1
公开(公告)日：2010-11-18
申请号：KR1020080095575
申请日：2008-09-29
申请人： 제일모직주식회사
发明人： 정두영 , 정지영 , 정민국 , 조현용 , 이종화 , 유용식 , 차명환 , 이길성
IPC分类号： G03F7/039
摘要： 본 발명은 포지티브형 감광성 수지 조성물에 관한 것으로서, 이 포지티브형 감광성 수지 조성물은 (A) 하기 화학식 1로 표시되는 반복단위를 가지며, 적어도 한쪽의 말단 부분에 열경화 전에는 친수성을 띄어 현상성을 증가시키고, 열 경화시에 열중합성 관능기로 변하는 말단 관능기를 갖는 폴리벤조옥사졸 전구체; (B) 감광성 디아조퀴논 화합물;(C) 실란 화합물; (D) 페놀 화합물; 및 (E) 용매를 포함한다.
[화학식 1]

(상기 화학식 1에서, 각 치환기의 명세서에서 정의한 바와 같다.)
본 발명의 포지티브형 감광성 수지 조성물은 노광 부위의 현상성을 매우 높여 감도 개선 효과를 얻을 수 있으며, 패턴 형상이 양호하고, 우수한 해상도를 나타낼 수 있다. 또한, 열경화 시 효율적으로 가교를 형성할 수 있어 경화 전 고분자의 분자량을 저하시킬 수 있어, 경화 후 매우 우수한 막의 기계적 물성, 우수한 잔여물 제거성, 낮은 흡습성을 얻을 수 있다.
포지티브형, 감광성 폴리벤조옥사졸 전구체 조성물, 용해조절제, 열중합 가 교제, 알칼리 수용액, 반도체 장치
摘要翻译：本发明涉及一种正型感光性树脂组合物，正型感光性树脂组合物（A）具有由式表示的重复单元（1），调出亲水性热固化前提高显影性中的至少一个和所述端子部具有在热固化时变成热固性官能团的末端官能团的聚苯并恶唑前体; （B）光敏重氮醌化合物;（C）硅烷化合物; （D）酚化合物; 和（E）溶剂。

37. 发明公开

KR1020100075075A 포지티브형 감광성 수지 조성물 失效
标题翻译：正型型感光树脂组合物
公开(公告)号：KR1020100075075A
公开(公告)日：2010-07-02
申请号：KR1020080133686
申请日：2008-12-24
申请人： 제일모직주식회사
发明人： 유용식 , 조현용 , 정두영 , 이종화 , 정민국 , 정지영 , 이길성 , 차명환
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , C08F290/06 , C08L79/08 , G03F7/0226 , G03F7/0233 , G03F7/0392 , G03F7/0758
摘要： PURPOSE: A positive photosensitive resin composition, a positive photosensitive resin layer using thereof, and a semi-conductor purpose electronic component including thereof are provided to develop a pattern with the high definition using an alkali solution. CONSTITUTION: A positive photosensitive resin composition contains a polyamide polymer marked with chemical formula 1, an esterified quinonediazide compound, a carbohydrate compound, and a solvent. In the chemical formula 1, n is either 1 or 2. X1 and X2 are divalent or tetravalent organic groups. E1 and E2 are moieties selected from the group consisting of hydrogen, carboxylic acid anhydride, single carboxylic acid, or their activity derivatives. R1 and R2 are the hydrogen or an organic group with the carbon number of 1~5.
摘要翻译：目的：使用正型感光性树脂组合物，使用其的正性感光性树脂层和包含其的半导体用电子部件，以使用碱溶液形成具有高清晰度的图案。构成：正型感光性树脂组合物含有用化学式1标记的聚酰胺聚合物，酯化醌二叠氮化合物，碳水化合物化合物和溶剂。在化学式1中，n为1或2. X1和X2为二价或四价有机基团。 E1和E2是选自氢，羧酸酐，单羧酸或其活性衍生物的部分。 R1和R2是氢或碳数为1〜5的有机基团。

38. 发明公开

KR1020100045773A 포지티브형 감광성 수지 조성물 有权
标题翻译：正性感光树脂组合物
公开(公告)号：KR1020100045773A
公开(公告)日：2010-05-04
申请号：KR1020080104871
申请日：2008-10-24
申请人： 제일모직주식회사
发明人： 정두영 , 조현용 , 이종화 , 정지영 , 정민국 , 차명환 , 유용식 , 이길성
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , C07D498/04 , G03F7/0007 , G03F7/0045 , G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/0388 , G03F7/105
摘要： PURPOSE: A positive photosensitive resin composition is provided to prevent the degradation of photonic property of a micro stepped unit from generating while coating a substrate with a polybenzoxazole or a polyimide precursor. CONSTITUTION: A positive photosensitive resin composition contains 100 parts of polybenzoxazole precursor including a heat-polymerizing functional group on one end by weight, 5~100 parts of photosensitive diazoquinone compound by weight, 0.1~3 parts of silane compound by weight, 1~30 parts of phenol compound by weight, and 0.1~5 parts of cardo-based resin by weight, and 200~900 parts of solvent by weight. The polybenzoxazole precursor has the average molecular weight of 3,000~300,000.
摘要翻译：目的：提供一种正型感光性树脂组合物，以防止在用聚苯并恶唑或聚酰亚胺前体涂布基材时产生微步进单元的光子性质的劣化。构成：正型感光性树脂组合物含有100份聚苯并恶唑前体，其一端重量为热聚合官能团，5〜100份光敏重氮醌化合物，0.1〜3份硅烷化合物重量，1〜30份酚类化合物的份数和重量为0.1〜5份的cardo基树脂，以及重量为200〜900份的溶剂。聚苯并恶唑前体的平均分子量为3,000〜30万。

39. 发明公开

KR1020100044125A 포지티브형 감광성 수지 조성물 有权
标题翻译：正型型感光树脂组合物
公开(公告)号：KR1020100044125A
公开(公告)日：2010-04-29
申请号：KR1020090099842
申请日：2009-10-20
申请人： 제일모직주식회사
发明人： 정두영 , 정지영 , 조현용 , 유용식 , 정민국 , 이종화 , 이길성 , 차명환
IPC分类号： G03F7/039 , G03F7/075
CPC分类号： G03F7/0233 , G03F7/0048 , Y10S430/107
摘要： PURPOSE: A positive photosensitive resin composition is provided to reduce the content of a solid part of a first polybenzoxazole precursor, and to improve the definition, the pattern layout, and residue elimination property. CONSTITUTION: A positive photosensitive resin composition contains: a recurring unit marked as the chemical formula 1; a first polybenzoxazole precursor with a thermal polymerization functional group; a second polybenzoxazole precursor with a recurring unit marked as the chemical formula 3; a photosensitivity diazoquinone compound; and a silane compound, and a solvent. In chemical formula 1, X1 is an alicyclic organic radical or an aromatic organic group. M1 and n1 is molar ratios.
摘要翻译：目的：提供正型感光性树脂组合物，以降低第一聚苯并恶唑前体的固体部分的含量，并提高定义，图案布局和残留物消除性能。构成：正型感光性树脂组合物含有：标记为化学式1的重复单元; 具有热聚合官能团的第一聚苯并恶唑前体; 具有标记为化学式3的重复单元的第二聚苯并恶唑前体; 光敏性重氮醌化合物; 硅烷化合物和溶剂。在化学式1中，X1是脂环族有机基团或芳族有机基团。 M1和n1是摩尔比。

40. 发明授权

KR101400192B1 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자 有权
公开(公告)号：KR101400192B1
公开(公告)日：2014-05-27
申请号：KR1020100140594
申请日：2010-12-31
申请人： 제일모직주식회사
发明人： 차명환 , 이종화 , 임미라 , 정민국 , 정지영 , 조현용 , 전환승
IPC分类号： G03F7/039 , G03F7/016 , H01L21/027
CPC分类号： H01L23/296 , G03F7/0226 , G03F7/0233 , G03F7/0751 , H01L2924/0002 , H01L2924/00
摘要： (A) 화학식 1로 표시되는 반복단위, 화학식 2로 표시되는 반복단위, 또는 이들의 조합을 포함하고, 적어도 한 쪽의 말단 부분에 열중합성 관능기를 갖는 제1 폴리벤조옥사졸 전구체(polybenzoxazole precursor), 화학식 4로 표시되는 반복단위, 화학식 5로 표시되는 반복단위, 또는 이들의 조합을 포함하는 제2 폴리벤조옥사졸 전구체, 및 이들의 조합으로 이루어진 군에서 선택되는 폴리벤조옥사졸 전구체; (B) 용해 조절제; (C) 감광성 디아조퀴논 화합물; (D) 실란 화합물; 및 (E) 용매를 포함하고, 상기 용해 조절제는 화학식 6으로 표시되는 화합물을 포함하는 것인 포지티브형 감광성 수지 조성물 및 이를 사용하여 제조된 감광성 수지막을 제공한다.

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