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21. 发明公开

KR1020090079256A ＥＵＶ 소스에서 데브리 억제를 위한 차폐 전극 失效
标题翻译：在电源中抑制电阻的电极
公开(公告)号：KR1020090079256A
公开(公告)日：2009-07-21
申请号：KR1020097011714
申请日：2007-11-21
申请人： 에이에스엠엘 네델란즈 비.브이.
发明人： 반헤르펜,마르텐마리누스요한네스 , 소어,보우터안톤
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70175 , H05G2/003 , H05G2/005
摘要： A radiation source (50) having self-shading electrodes (31,32) is disclosed. Debris originating (31,32) from the electrodes (31,32) is reduced. The path from the electrodes (31,32) to the EUV optics (10) is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris. In an embodiment, one or two contamination barriers (12) may be used to prevent debris reaching parts (60,61) of the optical element (10) which are not in the shadow of both electrodes (31,32).
摘要翻译：公开了一种具有自遮光电极（31,32）的辐射源（50）。从电极（31,32）起始（31,32）的碎片减少。从电极（31,32）到EUV光学器件（10）的路径被部分电极本身（称为自阴影）阻挡。这可能会显着减少电极产生的碎片的数量。在一个实施例中，可以使用一个或两个污染屏障（12）来防止碎屑到达不在两个电极（31,32）的阴影中的光学元件（10）的部分（60,61）。

22. 发明公开

KR1020080019708A 단락에 대한 방사원 보호 방법 无效
标题翻译：用于保护辐射源的方法，用于产生针对短路的EUV辐射和/或软X射线
公开(公告)号：KR1020080019708A
公开(公告)日：2008-03-04
申请号：KR1020087000998
申请日：2006-06-06
申请人： 코닌클리케 필립스 엔.브이.
发明人： 바우드레반게,도미니크마르셀 , 존커스,예로엔
IPC分类号： G21H5/00 , G21G4/00 , G03F7/20
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a method of protecting a radiation source producing extreme ultraviolet radiation (EUV) and/or soft X-rays against short circuits. The method applies to radiation sources producing said EUV-radiation and/or soft X-rays by means of an electrically operated discharge, which is ignited in a vapor between at least two electrodes (1, 2) in a discharge space, wherein said vapor is produced from a metal melt (6), which is applied to a surface in said discharge space and at least partially evaporated by an energy beam (9). Such a radiation source has one or several small gaps (17) between said electrodes (1, 2) and/or between components (4, 5) electrically connected to said electrodes (1, 2). These gaps (17) can cause short circuits when evaporated metal condenses there. In the present method during operation of the radiation source at least one surface bordering said gaps (17) and/or one or several protective elements (16, 18) covering said gaps (17) or arranged inside said gaps (17) are heated to a temperature at which the vapor pressure of said metal is high enough to evaporate metal material condensed on said surface or protective elements. With the present method the lifetime of the radiation source is extended. ® KIPO & WIPO 2008
摘要翻译：本发明涉及一种保护产生极紫外辐射（EUV）和/或软X射线的辐射源免于短路的方法。该方法适用于通过在放电空间中的至少两个电极（1,2）之间的蒸气中点燃的电操作放电产生所述EUV辐射和/或软X射线的辐射源，其中所述蒸气由金属熔体（6）制成，其被施加到所述放电空间中的表面并且被能量束（9）至少部分蒸发。这种辐射源在所述电极（1,2）之间和/或电连接到所述电极（1,2）的部件（4,5）之间具有一个或几个小间隙（17）。当蒸发的金属在那里冷凝时，这些间隙（17）可能导致短路。在本方法中，在辐射源的操作期间，覆盖所述间隙（17）和/或覆盖所述间隙（17）或布置在所述间隙（17）内的一个或多个保护元件（16,18）的至少一个表面被加热到所述金属的蒸汽压高到足以蒸发在所述表面上凝结的金属材料或保护元件的温度。利用本方法，延长了辐射源的寿命。 ®KIPO＆WIPO 2008

23. 发明公开

KR1020080011048A 극단 자외광 광원 장치 및 극단 자외광 발생 방법 无效
标题翻译：极光紫外线光源装置和超极紫外光发生方法
公开(公告)号：KR1020080011048A
公开(公告)日：2008-01-31
申请号：KR1020070056007
申请日：2007-06-08
申请人： 우시오덴키 가부시키가이샤
发明人： 시라이다카히로 , 벳소가즈노리 , 사토히로토 , 데라모토유스케
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/005
摘要： An EUV(Extreme Ultra Violet) light source apparatus and an extreme ultra violet light generating method are provided to suppress the movement of debris into an EUV condenser while supplying plasma raw material to a discharge region. An EUV light source apparatus includes a case, a raw material supplying device(2), an energy beam irradiating device, a pair of discharge electrodes(1a,1b), a pulse power supplying device, a light collecting optical device, and an EUV light extracting unit. The raw material supplying device emits the EUV light inside the case and supplies liquid or solid raw material(2a). The energy beam irradiating device irradiates the energy beam to the raw material and vaporizes the raw material. The pair of discharge electrodes generate plasma at a high temperature and are spaced apart from each other at a predetermined distance. The pulse power supplying device supplies a pulse power to the discharge electrodes. The light collecting device collects the EUV light emitted from the plasma at a high temperature. The EUV light extracting unit extracts the collected EUV light.
摘要翻译：提供了一种EUV（Extreme Ultra Violet）光源装置和极紫外光发生方法，用于在向等离子体原料供给放电区域时抑制碎片进入EUV冷凝器的运动。 EUV光源装置包括壳体，原料供给装置（2），能量束照射装置，一对放电电极（1a，1b），脉冲供电装置，聚光光学装置以及EUV 光提取单元。原料供给装置在壳体内发射EUV光，供给液体或固体原料（2a）。能量束照射装置将能量束照射到原料并蒸发原料。一对放电电极在高温下产生等离子体并且以预定距离彼此间隔开。脉冲供电装置向放电电极供给脉冲电力。光收集装置在高温下收集从等离子体发射的EUV光。 EUV光提取单元提取收集的EUV光。

24. 发明公开

KR1020070003996A ＥＵＶ광원 有权
标题翻译： EUV光源
公开(公告)号：KR1020070003996A
公开(公告)日：2007-01-05
申请号：KR1020067020324
申请日：2005-02-24
申请人： 사이머 엘엘씨
发明人： 파틀로윌리암엔. , 보워링노베르트에르. , 어쇼브알렉산더아이. , 포멘코브이고르브이. , 올리버아이.로저 , 비아텔라존 , 자크로버트엔.
IPC分类号： H01J35/20 , G03F9/00 , G03F7/20 , H01J65/04
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (" LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device. ® KIPO & WIPO 2007
摘要翻译：公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交接近所需的等离子体引发位点。等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号所述至少两个成像装置。目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号对第二成像装置中的图像进行分析。 ®KIPO＆WIPO 2007

25. 发明授权

KR100614438B1 플라즈마 초점 고에너지 광자소스 失效
标题翻译：等离子体聚焦高能光源
公开(公告)号：KR100614438B1
公开(公告)日：2006-08-21
申请号：KR1019997010428
申请日：1998-03-18
申请人： 사이머 엘엘씨
发明人： 파틀로윌리암노만
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： 고에너지 광자소스. 한 쌍의 플라즈마 핀치 전극(8)이 진공 챔버에 위치된다. 작용가스 공급 시스템은 원하는 스펙트럼선을 만들도록 선택되는 활성가스 및 불활성 완충 가스를 포함하는 작용 가스를 공급한다. 펄스전력소스(10)는 활성가스의 스펙트럼선의 방사선을 제공하는 작용가스에서 초고온 고밀도 플라즈마 핀치가 발생되도록 전극사이에 방전을 발생시키는 데에 충분한 고전압 및 최소한 100Hz 주파수에서의 전기 펄스를 만든다. 외부 반사방사 컬렉터-디렉터(4)는 플라즈마 핀치에서 생긴 방사선을 수집하고, 원하는 방향으로 방사선을 나아가게 한다. 바람직한 실시예에서, 활성가스는 리튬이고, 완충가스는 헬륨이며, 방사-컬렉터는 전극으로 사용되는 물질로 코팅되어 있다. 이 물질은 텅스텐이다.
불활성 가스, 완충가스, 컬렉터, 디렉터, 활성가스, 스펙트럼선, 방사, 펄스 전력소스, 방전, 플라즈마, 광자

26. 发明授权

KR100598639B1 방사선소스, 리소그래피장치 및 디바이스 제조방법 有权
标题翻译： 방사선소스，리소그래피장치및디바이스제조방법
公开(公告)号：KR100598639B1
公开(公告)日：2006-07-07
申请号：KR1020030064886
申请日：2003-09-18
申请人： 에이에스엠엘 네델란즈 비.브이.
发明人： 코셀레프콘스탄틴니콜라에비치 , 바니넨바딤예프예비치 , 이바노프블라디미르비탈레비치 , 키에프트에릭레네 , 루프스트라에릭로엘로프 , 슈테벤스루카스헨리쿠스요하네스 , 지델코프유리빅토로비치 , 콜로쉬니코프브셀볼로드그리고레비치 , 크리브트슨블라디미르미하일로비치 , 가야초프로베르트라필레비치 , 프리욘스올라프발데마르블라디미르
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.
摘要翻译：辐射源包括阳极和阴极，阳极和阴极被配置和布置为在阳极和阴极之间的空间中的气体或蒸汽中产生放电，并且形成等离子体箍缩以便产生电磁辐射。气体或蒸气可以包含氙，铟，锂和/或锡。辐射源可以包括多个放电元件，每个放电元件仅用于短的间隔，然后选择另一个放电元件。辐射源还可以包括触发装置，该装置可以有助于改进夹点形成的准确时间并且因此改善EUV辐射的脉冲。辐射源也可以被构造成具有低电感，并且以自触发机制操作。

27. 发明公开

KR1020050116137A 방전 공간에서 전기 방전을 통하여 플라스마를 발생시키기위한 방법 및 장치 有权
标题翻译：通过放电空间中的放电等离子体生成的方法和装置
公开(公告)号：KR1020050116137A
公开(公告)日：2005-12-09
申请号：KR1020057016748
申请日：2004-03-05
申请人： 코닌클리케 필립스 엔.브이.
发明人： 보쉬,에릭,제라더스,데오도어 , 존커스,제르엔 , 네프,윌리 , 데라,귄더,핸스
IPC分类号： H05H1/24 , H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05H1/48
摘要： The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate (38) is provided at least at the evaporation spot, the boiling point of said sacrificial substrate (38) during discharge operation lying below the melting point of the carrier material (30), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate (38).
摘要翻译：本发明涉及一种用于在放电空间中通过放电产生等离子体的方法和装置，其包含至少两个电极，其中至少一个电极由基质材料或载体材料构成，使得易受侵蚀至少由电流形成具有蒸发点的区域。为了呈现通过放电产生等离子体的方法或装置，建议至少在蒸发点处提供牺牲衬底（38），在放电操作期间所述牺牲衬底（38）的沸点位于低于载体材料（30）的熔点，使得在电流中产生的电荷载体主要从牺牲衬底（38）产生。

28. 发明公开

KR1020020003292A 방사원, 리소그래피 장치, 디바이스 제조방법 및 이것에의해 제조된 디바이스 失效
标题翻译：辐射源，光刻设备，器件的制造方法及其制造的器件
公开(公告)号：KR1020020003292A
公开(公告)日：2002-01-12
申请号：KR1020010038232
申请日：2001-06-29
申请人： 에이에스엠엘 네델란즈 비.브이.
发明人： 코셀레프콘스탄틴니콜라에비치 , 비요케르크프레드릭 , 주카플쉬빌리기비게오르기비치 , 코로브에프게니드미트리비치 , 이바노프블라디미르비탈레비치
IPC分类号： H01L21/027
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： PURPOSE: A radiation source is provided to have an effective self-initiation that allows making use of the dynamical pinch effect to create a high-temperature, high-density plasma for an enhanced conversion efficiency of electrical energy into radiation. CONSTITUTION: A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of the radiation source to initiate the discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.
摘要翻译：目的：提供辐射源以具有有效的自引发，其允许利用动态夹紧效应来产生高温高密度等离子体，以提高电能转换成辐射的转换效率。构成：辐射源包括用于在阳极和阴极之间的空间中的蒸气中产生放电并形成工作蒸气的等离子体以产生电磁辐射的阳极和阴极。阴极限定了通过孔径与放电区域连通的中空腔体，该孔口围绕辐射源的中心轴线具有基本上环形的形状以开始放电。驱动器蒸气被供应到阴极腔，并且工作蒸气在阳极和阴极之间的中心轴线周围的区域中供应。

29. 发明公开

KR1020000076846A 플라즈마 초점 고에너지 포톤 소스 失效
公开(公告)号：KR1020000076846A
公开(公告)日：2000-12-26
申请号：KR1020000012713
申请日：2000-03-14
申请人： 사이머 엘엘씨
发明人： 파틀로윌리엄엔. , 포멘코프이고르브이. , 벅스다니엘엘.
IPC分类号： H01L21/263
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： 고에너지광자원. 한쌍의플라즈마핀치전극이진공챔버에위치되어있다. 요구되는스펙트럼라인을제공하기위해선택되는활성가스와불활성버퍼가스를포함하는작용가스. 펄스전력원은활성가스의스펙트럼라인에서방사를제공하는작용가스에서고 밀도플라즈마핀치, 초고온을발생하기위해전극간의전기방전을발생시키기에충분히높은전압에서전기펄스를제공한다. 외부의반사방사컬렉터-디렉터는플라즈마핀치에서발생된방사를수집하고요구되는방향으로방사를향하게한다. 바람직한실시예에서, 활성가스는리튬이고완충가스는헬륨이며방사컬렉터-디렉터는전극에사용되는물질로코팅된다. 양호하게선택되는물질은텅스텐이다. 제 2의바람직한실시예에서완충가스는아르곤이고리튬가스는동축의전극구성의중심전극축을따라홀에위치된고형또는액체리튬의증기화에의해발생된다. 기타바람직한실시예에서는방사컬렉터-디렉터상부로원추형내포파편컬렉터가사용된다.

30. 发明公开

KR1020170095245A 패싯형 ＥＵＶ 광학 요소 审中-实审
标题翻译：多面EUV光学元件
公开(公告)号：KR1020170095245A
公开(公告)日：2017-08-22
申请号：KR1020177016944
申请日：2015-11-10
申请人： 에이에스엠엘 네델란즈 비.브이.
发明人： 브란트데이비드크레이그 , 에르쇼프알렉산더이고르비치 , 포멘코프이고르블라디미로비치
IPC分类号： G03F7/20 , G02B19/00 , G02B5/08 , G02B5/09 , G21K1/06 , H05G2/00
CPC分类号： G03F7/7015 , G02B5/0891 , G02B5/09 , G02B19/0019 , G02B19/0095 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G03F7/70933 , G21K1/062 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： 서로이격되어인접하는패싯들사이에각각의틈을형성하는패싯어레이로서구성된콜렉터거울과같은반사형 EUV 광학기구가개시된다. 틈은한 패싯을가로지르는가스유동에대한입구로서사용되며, 그래서유동은광학표면에평행하게도입된다. 패싯들은 EUV 광학기구의반사면적의손실이최소화될수 있도록오프셋을가지고만들어질수 있다. 가스는패싯의표면으로부터타겟재료를제거하는것을용이하게해준다.
摘要翻译：公开了反射EUV光学器件，例如收集器反射镜，其被配置为在相邻且间隔开的小面之间形成相应间隙的小面阵列。该间隙被用作穿过一个小平面的气体流动的入口，以便流体被平行于光学表面引入。这些刻面可以用偏移来制作，以最大限度地减少EUV光学器件的反射面积的损失。气体有助于从面的表面去除目标材料。

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