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21. 发明公开

KR1020150127278A 구리 화학 기계적 평탄화 후 수성 세정 조성물 审中-实审
标题翻译：后期化学机械平面化的清洁组合物
公开(公告)号：KR1020150127278A
公开(公告)日：2015-11-16
申请号：KR1020157029297
申请日：2014-03-13
申请人： 캐보트 마이크로일렉트로닉스 코포레이션
发明人： 코,쳉-유안
IPC分类号： C23G1/18 , C23G1/20 , C11D11/00 , C11D3/00 , C11D3/20 , C11D3/26 , C11D3/28 , C11D3/33 , C11D3/36 , H01L21/02
CPC分类号： C11D7/3281 , C11D3/0073 , C11D3/2086 , C11D3/26 , C11D3/28 , C11D3/30 , C11D3/33 , C11D3/361 , C11D3/364 , C11D3/365 , C11D7/265 , C11D7/32 , C11D7/3209 , C11D7/3245 , C11D7/36 , C11D11/0047 , C23G1/18 , C23G1/20 , H01L21/02074
摘要： 구리화학기계적평탄화후 수성세정조성물이제공된다. 상기조성물은유기염기, 구리에천트, 유기리간드, 부식억제제및 물을포함하며, 여기서유기염기는적어도 200 ppm의농도이고, 구리에천트는적어도 200 ppm의농도이고, 유기리간드는적어도 50 ppm의농도이고, 부식억제제는적어도 10 ppm의농도이다. 구리화학기계적평탄화후 세정절차에사용시에, 상기수성세정조성물은웨이퍼표면으로부터잔류오염물을효과적으로제거하고, 웨이퍼표면상의결함수를감소시키며, 동시에웨이퍼에대해보다양호한표면조도를부여할수 있다.

22. 发明公开

KR1020150100465A 섬유유연제 조성물 无效
标题翻译：织物肥皂组合物
公开(公告)号：KR1020150100465A
公开(公告)日：2015-09-02
申请号：KR1020140102207
申请日：2014-08-08
申请人： 주식회사 엘지생활건강
发明人： 조윤진 , 차경온 , 김세훈 , 심연수
IPC分类号： C11D3/20 , C11D3/48
CPC分类号： C11D3/26 , C11D3/001 , C11D3/20 , C11D3/382 , C11D7/263
摘要： 본 발명은 다량의 유기산, 발효식초, 향료를 함유한 투명 섬유유연제의 투명 안정성과 향취 유지를 위한 매우 효과적인 섬유유연제 조성물에 관한 것으로, 본 발명에 따른 섬유유연제 조성물은 에틸렌옥사이드가 부가된 지방산 및 에틸렌옥사이드가 부가된 지방알코올을 가용화제로 사용하여 식초 내 초산으로 인한 악취를 제거해 향취 만족도가 우수한 효과를 가진다.
摘要翻译：本发明涉及含有大量有机酸，发酵醋和香料的织物柔软剂的组合物，从而非常有效地保持透明度稳定性和透明织物柔软剂的香味。根据本发明，织物柔软剂用组合物具有通过使用添加有环氧乙烷的脂肪酸和作为增溶剂添加有环氧乙烷的脂肪醇，使香味优异的优点，使得臭味异味在醋中被乙酸除去。

23. 发明公开

KR1020130129369A 티타늄 니트라이드 부식을 억제하기 위한 조성물 및 방법 审中-实审
标题翻译：抑制氮化钛腐蚀的组合物和方法
公开(公告)号：KR1020130129369A
公开(公告)日：2013-11-28
申请号：KR1020137011978
申请日：2011-10-13
申请人： 엔테그리스, 아이엔씨. , 인터내셔널 비지네스 머신즈 코포레이션
发明人： 쿠퍼엠마뉴엘아이 , 토티르조지가브리엘 , 페인마코넨
IPC分类号： C11D7/32 , H01L21/304 , H01L21/027 , G03F7/42
CPC分类号： C11D3/0073 , C11D3/046 , C11D3/26 , C11D3/3942 , C11D3/3947 , C11D11/0047 , G03F7/423 , G03F7/425 , H01L21/02063 , H01L21/02074 , H01L21/76814 , C11D7/3209 , H01L21/0273
摘要： Cleaning compositions and processes for cleaning residue from a microelectronic device having said residue thereon. The composition comprises at least one amine, at least one oxidizing agent, water, and at least one borate species and achieves highly efficacious cleaning of the residue material, including post-ash residue, post-etch residue, post-CMP residue, particles, organic contaminants, metal ion contaminants, and combinations thereof from the microelectronic device while simultaneously not damaging the titanium nitride layers and low-k dielectric materials also present on the device.

24. 发明公开

KR1020130043945A 살균, 소취 및 세정효과가 우수한 식탁용 세정제 조성물 无效
标题翻译：清洗剂组合物对于消毒，除臭和清洗效果较好的表
公开(公告)号：KR1020130043945A
公开(公告)日：2013-05-02
申请号：KR1020110108153
申请日：2011-10-21
申请人： 김병만 , 정은경
发明人： 김병만 , 정은경
IPC分类号： C11D3/48 , C11D3/38 , C11D3/26 , C11D3/43
CPC分类号： C11D3/48 , C11D1/72 , C11D3/26 , C11D3/382
摘要： PURPOSE: A detergent composition for dining tables is provided to remove oil stains or food wastes without damaging and enhancing safety, sterilization, deodorization and cleaning effects. CONSTITUTION: A detergent composition for dining tables comprises 0.05-0.3 wt% of benzalconium chloride, 0.01-0.07 wt% of monolauryl diamino ethylglycine hydrochloride, 0.01-1.0 wt% of phytoncide, 0.005-0.05 wt% of polyhexamethylene biguanid HCl, and residual amount of ionized water. The detergent composition for dining tables additionally includes one of 3-10 wt% of ethyl alcohol, 0.1-2.0 wt% of an aloe extract, and 0.1-1.0 wt% of polyoxy ethylene octyl phenyl ether.
摘要翻译：目的：提供餐桌用洗涤剂组合物，以消除油污或食物废物，而不会损坏和增强安全性，灭菌，除臭和清洁效果。构成：餐桌用洗涤剂组合物含有0.05〜0.3重量％的苄基氯化锡，0.01-0.07重量％的单月桂基二氨基乙基甘氨酸盐酸盐，0.01-1.0重量％的植物杀灭剂，0.005-0.05重量％的聚六亚甲基双胍，的电离水。餐桌用洗涤剂组合物还包括3-10重量％的乙醇，0.1-2.0重量％的芦荟提取物和0.1-1.0重量％的聚氧乙烯辛基苯基醚中的一种。

25. 发明公开

KR1020120106928A 세정 포뮬레이션 및 세정 포뮬레이션을 사용하는 방법 有权
标题翻译：清洁配方和使用清洁配方的方法
公开(公告)号：KR1020120106928A
公开(公告)日：2012-09-27
申请号：KR1020120027406
申请日：2012-03-16
申请人： 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드
发明人： 우,아이핑 , 이,이-치아 , 리우,웬다르 , 라오,마드허카르브하스카라 , 반네르지,가우탐
IPC分类号： G03F7/42 , C11D3/26 , C11D7/32
CPC分类号： C11D11/0047 , C11D3/0073 , C11D3/044 , C11D3/2034 , C11D3/2058 , C11D3/2086 , C11D3/28 , C11D3/30 , C11D3/43 , C11D7/06 , C11D7/261 , C11D7/265 , C11D7/3218 , C11D7/3281 , C11D7/5004 , C23G1/22 , G03F7/42 , C11D3/26 , G03F7/34
摘要： PURPOSE: Cleaning formulation and a method for using the same are provided to improve the compatibility to an aluminum-containing substrate and to lower aluminum and silicon etching rate. CONSTITUTION: Cleaning formulation includes about 2-15 weight% of hydroxylamine, about 50-80 weight% of water, about 0.01-5.0 weight% of a corrosion inhibitor, about 5-45 weight% of a compound which is selected from a group including one or more alkanol amine, one or more water miscible solvent, and the mixture of the same. The pKa of the alkanol amine is more than 9.0. The alkanol amine is selected from a group including triethanolamine, diethanolamine, diisopropanolamine, N-methyldiethanolamine, and the mixture of the same.
摘要翻译：目的：提供清洁配方及其使用方法，以提高与含铝基材的相容性，降低铝和硅蚀刻速率。构成：清洁制剂包含约2-15重量％的羟胺，约50-80重量％的水，约0.01-5.0重量％的腐蚀抑制剂，约5-45重量％的选自以下的化合物：一种或多种链烷醇胺，一种或多种水混溶性溶剂及其混合物。烷醇胺的pKa大于9.0。链烷醇胺选自三乙醇胺，二乙醇胺，二异丙醇胺，N-甲基二乙醇胺及其混合物。

26. 发明公开

KR1020080080280A 포토레지스트 제거용의 다목적 동력학적 조성물 및 이의 사용방법 有权
标题翻译：用于去除光电的动态多用途组合物及其使用方法
公开(公告)号：KR1020080080280A
公开(公告)日：2008-09-03
申请号：KR1020087010205
申请日：2006-10-24
申请人： 다이나로이 엘엘씨
发明人： 페니스마이클티 , 존슨로리레니 , 찬레이몬드 , 쉘레다이안마리 , 폴라드킴벌리도나 , 괴벨진
IPC分类号： G03F7/32
CPC分类号： G03F7/426 , C11D1/004 , C11D3/26 , C11D3/30 , C11D3/43 , C11D7/32 , C11D7/3218 , C11D7/5009 , C11D11/0047 , G03F7/425
摘要： Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
摘要翻译：提供了用于从基底去除一个，两个或更多个光致抗蚀剂层的改进的干燥剥离剂溶液。汽提溶液包括二甲基亚砜，季铵氢氧化物和链烷醇胺，任选的第二溶剂和小于约3重量％的水和/或至少约1的干燥系数。制备和使用改进的方法还提供了干脱皮溶液。

27. 发明公开

KR1020080059442A 금속 상용성 포토레지스트 및/또는 희생 반사방지 코팅제거 조성물 无效
标题翻译：金属兼容的光催化剂和/或有害反应选择性去除组合物
公开(公告)号：KR1020080059442A
公开(公告)日：2008-06-27
申请号：KR1020087011387
申请日：2006-10-12
申请人： 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드
发明人： 라스멜리사케이 , 베른하드데이비드디 , 바움토마스에이치 , 찌앙핑 , 쪼우런찌에 , 코르젠스키마이클비
IPC分类号： G03F7/42 , G03F7/30 , G03F7/32 , G03F7/34
CPC分类号： C11D3/26 , C09D9/04 , C11D3/30 , C11D3/3773 , C11D3/43 , C11D7/32 , C11D7/3209 , C11D11/0047 , C23G1/20 , G03F7/425 , G03F7/426 , H01L21/02063 , H01L21/3212
摘要： A liquid removal composition and process for removing photoresist and/or sacrificial anti-reflective coating (SARC) material from a microelectronic device having same thereon. The liquid removal composition includes at least one organic quaternary base and at least one surface interaction enhancing additive. The composition achieves at least partial removal of photoresist and/or SARC material in the manufacture of integrated circuitry with minimal etching of metal species on the microelectronic device, such as copper and cobalt, and without damage to low-k dielectric materials employed in the microelectronic device architecture.
摘要翻译：一种液体去除组合物和用于从其上具有其的微电子器件去除光致抗蚀剂和/或牺牲抗反射涂层（SARC）材料的方法。液体去除组合物包括至少一种有机季碱和至少一种表面相互作用增强添加剂。组合物在集成电路的制造中至少部分去除光致抗蚀剂和/或SARC材料，其中微电子器件（例如铜和钴）上的金属物质的蚀刻最小，并且不损坏微电子器件中使用的低k电介质材料设备架构。

28. 发明授权

KR100786610B1 플루오라이드를 포함하는 수계 잔류물 제거제 有权
标题翻译：含有氟化物的基于水的残留物除去
公开(公告)号：KR100786610B1
公开(公告)日：2007-12-21
申请号：KR1020060009456
申请日：2006-01-31
申请人： 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드
发明人： 존로비토로베르토 , 우아이핑
IPC分类号： G03F7/42
CPC分类号： C11D11/0047 , C11D3/042 , C11D3/2075 , C11D3/24 , C11D3/26 , C11D3/28 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3281 , G03F7/425 , G03F7/426
摘要： 본 발명은 잔류물, 예컨대 애싱된 포토레지스트 및/또는 처리 잔류물을 선별적으로 제거하기 위한 조성물 및 이 조성물을 포함하는 방법에 관한 것이다. 하나의 구체예에서, 잔류물을 제거하기 위한 조성물이 제공되고, 이때 조성물은 약 2 내지 약 9의 pH 범위를 갖고, 유기산 및 이 유기산의 짝염기를 10:1 내지 1:10의 범위인 산:염기의 몰비로 포함하는 완충 용액, 플루오라이드, 및 물을 포함하며, 단 조성물에는 첨가된 유기 용매가 실질적으로 없다. 또다른 구체예에서, 조성물은 부식 억제제 및/또는 계면활성제를 더 포함할 수 있다.

29. 发明公开

KR1020020018050A 세탁 및 세정 방법 无效
标题翻译：洗涤和冲洗方法
公开(公告)号：KR1020020018050A
公开(公告)日：2002-03-07
申请号：KR1020010052002
申请日：2001-08-28
申请人： 시바 홀딩 인크
发明人： 하젠캄프멘노 , 바흐만프랑크 , 마코브카코르넬리아 , 슈링로프귄터 , 리히터그리트 , 바인가르트너페터 , 단나허요세프 , 뒤브마리-호세
IPC分类号： C11D3/39
CPC分类号： C11D3/3951 , C11D1/02 , C11D1/83 , C11D3/26 , C11D11/0017 , D06L4/10
摘要： PURPOSE: A method for washing and rinsing by using a washing, rinsing, disinfecting or bleaching composition containing a salen catalyst is provided. Therefore, in the case of treating a fiber fabric with a washing liquid containing the composition, the bleaching action of hydrogen peroxide is surprisingly increased without damaging fibers and dyed products. CONSTITUTION: This method for washing, rinsing, disinfecting and bleaching comprises using a water-based bath containing a peroxide and 0.5 to 50mg, per 1 litter of the bath, of a compound represented by the formula 1 in which A is an anion. The washing, rinsing, disinfecting or bleaching composition comprises: (i) 0 to 50% by weight of an anionic surfactant and/or a non-ionic surfactant, (ii) 0 to 70% by weight of an improver, (iii) 1 to 99% by weight of peroxides, and (iv) 0.5 to 50mg/L compound of formula 1.
摘要翻译：目的：提供使用含有salen催化剂的洗涤，漂洗，消毒或漂白组合物进行洗涤和漂洗的方法。因此，在用含有该组合物的洗涤液处理纤维织物的情况下，过氧化氢的漂白作用令人惊奇地增加，而不损害纤维和染色产品。构成：这种洗涤，漂洗，消毒和漂白方法包括使用含有过氧化物的水基浴和每1L浴0.5至50mg的由式1表示的化合物，其中A是阴离子。洗涤，漂洗，消毒或漂白组合物包含：（i）0至50重量％的阴离子表面活性剂和/或非离子表面活性剂，（ii）0至70重量％的改进剂，（iii）1 至99重量％的过氧化物，和（iv）0.5至50mg / L的式1化合物。

30. 发明公开

KR1020000053238A 알칼리 수성 과산소 표백제를 함유한 조성물 无效
标题翻译：含碱性碱性过氧化物含有组合物
公开(公告)号：KR1020000053238A
公开(公告)日：2000-08-25
申请号：KR1019997004215
申请日：1997-11-06
申请人： 더 프록터 앤드 갬블 캄파니
发明人： 페트리마르코 , 트라니마리나
IPC分类号： C11D1/04 , C11D3/04 , C11D3/39 , C11D3/395
CPC分类号： C11D3/0084 , C11D1/75 , C11D1/90 , C11D1/92 , C11D1/94 , C11D3/18 , C11D3/20 , C11D3/26 , C11D3/28 , C11D3/36 , C11D3/361 , C11D3/364 , C11D3/3947 , C11D3/48
摘要： PURPOSE: Provided is aqueous alkaline peroxygen bleach-containing compositions, and more particularly, stabilized and buffered compositions. CONSTITUTION: A stable liquid aqueous cleaning composition has a pH above 8, and comprises a peroxygen bleach, a radical scavenger, a chelating agent and a pH buffer. In a preferred embodiment, the composition further comprises an antimicrobial compound like an antimicrobial essential oil and/or an active thereof. In another preferred embodiment, the composition further comprises a solvent and/or a surfactant.
摘要翻译：目的：提供含碱性过氧漂白剂的组合物，更具体地说，是稳定和缓冲的组合物。构成：稳定的液体水性清洁组合物的pH值高于8，并包含过氧漂白剂，自由基清除剂，螯合剂和pH缓冲液。在优选的实施方案中，组合物还包含抗微生物化合物，如抗微生物精油和/或其活性物质。在另一个优选的实施方案中，组合物还包含溶剂和/或表面活性剂。

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