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    • 26. 发明公开
    • 자가 세정 기능을 위한 자가복원용 고분자 복합체 및 그 제조방법
    • 用于自清洁的聚合物复合材料及其制造方法
    • KR1020130098934A
    • 2013-09-05
    • KR1020130021863
    • 2013-02-28
    • 부산대학교 산학협력단
    • 고정상김형훈권봉현전형진
    • C08K9/10C08L91/00C08K3/04C08K7/00
    • C08K9/10B81C2201/0149C08K3/04C08K7/00C08L91/00C09D5/1681C09K2200/0637
    • PURPOSE: A polymer composite for self-recovery is provided to recover water repellency by itself by emitting hydrophobic material dipped therein to the outside when an external force is applied to a microcapsule filled with hydrophobic materials with carbon nanotubes attached to the surface thereof. CONSTITUTION: A polymer composite for self-recovery includes microcapsules formed of a polymer membrane and a hydrophobic liquid filled in the microcapsule. A manufacturing method the polymer composite comprises a step of supplying hydrophobic liquid to a first microchannel (21); a step of supplying an organic solvent solution to two microchannels (23); a step of separating the organic solvent solution mixed with the hydrophobic liquid into droplets (10) by supplying a polyvinyl alcohol solution through a third microchannel; and a step of manufacturing a polymer composite by drying the organic solvent solution in the droplets.
    • 目的:提供一种用于自我恢复的聚合物复合材料,用于当将外力施加到填充有附着在其表面上的碳纳米管的疏水性材料的微胶囊时,通过将疏水材料浸入其中而自身回收拒水性。 构成:用于自我回收的聚合物复合物包括由聚合物膜形成的微胶囊和填充在微胶囊中的疏水性液体。 聚合物复合材料的制造方法包括向第一微通道(21)供应疏水性液体的步骤; 向两个微通道(23)供给有机溶剂溶液的步骤; 通过将聚乙烯醇溶液通过第三微通道提供而将与疏水性液体混合的有机溶剂溶液分离成液滴(10)的步骤; 以及通过干燥液滴中的有机溶剂溶液来制造聚合物复合物的步骤。
    • 28. 发明公开
    • 유도된 자가정렬 공정을 이용한 반도체 소자의 미세패턴 형성 방법
    • 使用方向自组装过程形成半导体器件精细图案的方法
    • KR1020130034778A
    • 2013-04-08
    • KR1020110098838
    • 2011-09-29
    • 주식회사 동진쎄미켐
    • 이정열장유진이재우김재현
    • H01L21/027
    • H01L21/3086B81C1/00031B81C2201/0149G03F7/0002H01L21/0271H01L21/0337H01L21/0274
    • PURPOSE: A method for forming a fine pattern of a semiconductor device using a directed self assembly process is provided to improve semiconductor manufacturing efficiency by using a guide pattern developed with negative tone developers without a curing process of the guide pattern. CONSTITUTION: A photoresist layer(34) is formed on a substrate(30) with an organic antireflection layer(32). A guide pattern(36) is formed by exposing the photoresist layer and developing the photoresist layer with negative tone developers. A neutral layer(38) is formed on the substrate with the guide pattern. A neutral layer(38a) is formed by removing the guide pattern using the developers. A neutral pattern is formed by coating the substrate coated with the neutral layer with block copolymers and heating the substrate over a glass transition temperature of the block copolymer. A fine pattern(40a) is formed by selectively etching a low etching resistive part(40b) of the neutral pattern with plasma.
    • 目的:提供一种使用定向自组装工艺形成半导体器件的精细图案的方法,以通过使用不带引导图案的固化处理的负色调显影器开发的引导图案来提高半导体制造效率。 构成:在具有有机抗反射层(32)的基板(30)上形成光致抗蚀剂层(34)。 引导图案(36)通过曝光光致抗蚀剂层并用负色调显影剂显影光致抗蚀剂层而形成。 在引导图案的基板上形成中性层(38)。 通过使用显影剂去除引导图案形成中性层(38a)。 通过用嵌段共聚物涂覆涂覆有中性层的基材并在嵌段共聚物的玻璃化转变温度下加热基材来形成中性图案。 通过用等离子体选择性地蚀刻中性图案的低蚀刻电阻部分(40b)来形成精细图案(40a)。