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21. 发明公开

KR1020040043620A 포토레지스트 현상액 조성물 有权
标题翻译：光电开发商组合
公开(公告)号：KR1020040043620A
公开(公告)日：2004-05-24
申请号：KR1020020071987
申请日：2002-11-19
申请人： 주식회사 동진쎄미켐
发明人： 박찬석 , 김길래 , 박춘호 , 김경아
IPC分类号： G03F7/32
摘要： PURPOSE: A photoresist developer composition is provided, to improve miscibility and to suppress or minimize the generation of residue after development, thereby enhancing the precision of photoresist pattern. CONSTITUTION: The photoresist developer composition comprises 1-10 wt% of an inorganic alkali; 0.1-3.0 wt% of an organic solvent; 1.0-20.0 wt% of a surfactant; and 67-97.9 wt% of water. Preferably the inorganic alkali is selected from the group consisting of KOH, NaOH, sodium phosphate, sodium silicate, sodium carbonate, sodium bicarbonate and their mixtures; the organic solvent is selected from the group consisting of methanol, ethanol, 1-propanol, 2-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropyl glycol monomethyl ether, dipropyl glycol monoethyl ether and their mixtures; and the surfactant is a mixture of a nonionic surfactant and an anionic surfactant.
摘要翻译：目的：提供光致抗蚀剂显影剂组合物，以改善混溶性并抑制或最小化显影后残留物的产生，从而提高光致抗蚀剂图案的精度。构成：光致抗蚀剂显影剂组合物包含1-10重量％的无机碱; 0.1-3.0重量％的有机溶剂; 1.0-20.0重量％的表面活性剂; 和67-97.9重量％的水。优选地，无机碱选自KOH，NaOH，磷酸钠，硅酸钠，碳酸钠，碳酸氢钠及其混合物; 有机溶剂选自甲醇，乙醇，1-丙醇，2-丙醇，丁醇，双丙酮醇，乙二醇单甲醚，乙二醇单乙醚，乙二醇单丁醚，二甘醇单甲醚，二甘醇单甲醚醚，二丙二醇单甲醚，二丙二醇单乙醚及其混合物; 并且表面活性剂是非离子表面活性剂和阴离子表面活性剂的混合物。

22. 发明授权

KR100756552B1 씬너 조성물 失效
标题翻译：更薄的组成
公开(公告)号：KR100756552B1
公开(公告)日：2007-09-07
申请号：KR1020010036103
申请日：2001-06-23
申请人： 주식회사 동진쎄미켐
发明人： 박찬석 , 김길래 , 박춘호 , 김경아
IPC分类号： G03F7/32
摘要： 본 발명은 TFT LCD 디바이스와 반도체 디바이스 제조 공정에서 기판 위에 코팅되는 레지스트 막의 가장자리 부분 또는 기판의 후면에 형성되는 불필요한 막 성분을 제거하기 위한 씬너 조성물에 관한 것으로서, a) 유기 아민 0.1 내지 5 중량%, b) 유기용제 0.1 내지 30 중량%, c) 음이온계 계면활성제 및 비이온계 계면활성제로 이루어진 계면활성제 0.01 내지 5 중량%, 및 d) 물 60 내지 99 중량 %를 포함하는 것을 특징으로 하는 레지스트 제거용 씬너 조성물을 제공한다. 상기 레지스트 제거용 씬너 조성물은 레지스트 제거 능력이 우수하며, 장비에 대한 부식의 우려가 없다.

TFT LCD, 반도체 디바이스, 씬너, 레지스트

23. 发明公开

KR1020070079864A 칼라 필터용 잉크, 이를 이용한 칼라 필터의 제조 방법 및 칼라 필터 有权
标题翻译：用于彩色滤光片的墨水，使用其的彩色滤色片的制造方法和彩色滤光片
公开(公告)号：KR1020070079864A
公开(公告)日：2007-08-08
申请号：KR1020060010885
申请日：2006-02-03
申请人： 삼성디스플레이 주식회사 , 주식회사 동진쎄미켐
发明人： 강윤호 , 이광호 , 김병주 , 김장섭 , 곽창훈 , 권성규 , 박찬석 , 김경아 , 조현일 , 김길래
IPC分类号： C09D11/30 , G02B5/20 , C09D11/101
CPC分类号： C09D11/30
摘要： Provided are an ink for a color filter which is improved in the wettability to a black matrix or a glass substrate to prevent the formation of irregular part on a color filter inside a pixel, a method for preparing a color filter by using the ink, and a color filter prepared by the method. The ink comprises a polymer binder which comprises an acrylate or methacrylate containing a hydroxyl group, a crosslinking monomer, a solvent, a pigment and a polymerization initiator. Preferably the polymer binder is represented by the formula 1 or 2, wherein R is H or a methyl group; X is H, an alkyl group, an aryl group, a halogen atom, a nitro group, or an alkoxy group; m is an integer of 1-10,000; n and o are an integer of 0-10,000.
摘要翻译：提供一种用于滤色器的油墨，其提高了对黑色矩阵或玻璃基板的润湿性，以防止在像素内的滤色器上形成不规则部分，使用该油墨制备滤色器的方法，以及通过该方法制备的滤色片。油墨包含含有羟基的丙烯酸酯或甲基丙烯酸酯，交联单体，溶剂，颜料和聚合引发剂的聚合物粘合剂。优选地，聚合物粘合剂由式1或2表示，其中R是H或甲基; X是H，烷基，芳基，卤素原子，硝基或烷氧基; m为1-10,000的整数; n和o是0-10,000的整数。

24. 发明公开

KR1020040031228A 현상 마진 및 기판과의 접착성이 우수한 감광성 수지 조성물 有权
标题翻译：具有改进发展性和粘合特性的感光树脂
公开(公告)号：KR1020040031228A
公开(公告)日：2004-04-13
申请号：KR1020020060605
申请日：2002-10-04
申请人： 주식회사 동진쎄미켐
发明人： 박찬석 , 김길래 , 김승근
IPC分类号： G02B5/20
摘要： PURPOSE: A photosensitive resin having a prominent development margin and adhesive characteristic is provided to improve the development margin and the adhesive characteristic by using a crosslinked bond between a monomer having active hydrogen and a silane coupling agent within a binder. CONSTITUTION: A photosensitive resin having a prominent development margin and adhesive characteristic includes a binder of 5 to 30 weight percent, a crosslinkable monomer of 5 to 30 weight percent, paints of 10 to 60 weight percent, a photopolymerization initiator of 0.5 to 5 weight percent, a solvent of 20 to 80 weight percent, and a silane coupling agent of 0.1 to 2 weight percent. The binder melts in alkali aqueous solution. The crosslinkable monomer is formed with two or more ethylene-based double bond. The silane coupling agent has one or more isocyanate base.
摘要翻译：目的：提供具有突出的显影边缘和粘合特性的感光性树脂，以通过在粘合剂内使用具有活性氢的单体和硅烷偶联剂之间的交联键来改善显影余量和粘合特性。构成：具有突出的显影边缘和粘合特性的感光性树脂包括5至30重量％的粘合剂，5至30重量％的可交联单体，10至60重量％的涂料，0.5至5重量％的光聚合引发剂，20〜80重量％的溶剂和0.1〜2重量％的硅烷偶联剂。粘合剂在碱性水溶液中熔化。可交联单体由两个或更多个乙烯基双键形成。硅烷偶联剂具有一个或多个异氰酸酯基。

25. 发明公开

KR1020040011904A 미세 도전성 분말 분산용 알칼리 가용성의 네가형 고점도포토레지스트 조성물 失效
标题翻译：具有高粘度性的碱性可溶型负离子型电致发光组合物，用于分散精细导电粉
公开(公告)号：KR1020040011904A
公开(公告)日：2004-02-11
申请号：KR1020020045204
申请日：2002-07-31
申请人： 주식회사 동진쎄미켐
发明人： 박찬석 , 김길래 , 김봉기
IPC分类号： G03F7/027
摘要： PURPOSE: A negative type photoresist composition which has excellent dispersion ability of fine conductive powder, coating property, stability during storage, and rapid developing time in aqueous alkali solution due to its high viscosity and adhesiveness without the crystallization of macromolecular resin is provided by introducing monomers having self-plasticity. CONSTITUTION: An alkali-soluble negative type photoresist composition with high viscosity used for dispersing fine conductive powder comprises: (a) 30-70 wt% of acrylate copolymer represented by formula 1 incorporating monomers having self-plasticity; (b) 0.5-5 wt% of a photo-initiator for photopolymerization; (c) 10-30 wt% of photopolymerizable monomer; (d) 0.1-5 wt% of an antifoaming agent; (e) 0.1-2 wt% of a leveling agent; and (f) 0.05-3 wt% of a stabilizer. In formula 1, R1 is carboxylic, aromatic, C1-20 of alkyl group, or copolymer of monomers comprising hydroxy group; R2 is ethylhexyl, isobutyl, tert-butyl, octyl, 3-methoxybutyl or methoxy propylene glycol group; n1 is an integer of 8 to 40; n2 is an integer of 1 or 2. The composition has a viscosity of 10000 to 20000 and a molecular weight of 15000 to 50000.
摘要翻译：目的：通过引入单体，提供由于其高粘度和粘合性而导致的高导电性粉末的分散能力，涂布性能，储存稳定性和碱性水溶液中的快速显影时间的负型光致抗蚀剂组合物具有自我塑造。构成：用于分散细导电粉末的具有高粘度的碱溶性负型光致抗蚀剂组合物包括：（a）30-70重量％的由式1表示的丙烯酸酯共聚物，其结合具有自塑性的单体; （b）0.5-5重量％的用于光聚合的光引发剂; （c）10-30重量％的可光聚合单体; （d）0.1-5重量％的消泡剂; （e）流平剂0.1-2wt％; 和（f）0.05-3重量％的稳定剂。式1中，R 1为羧酸，芳香族，烷基的C 1-20，或包含羟基的单体的共聚物。 R2是乙基己基，异丁基，叔丁基，辛基，3-甲氧基丁基或甲氧基丙二醇基团; n1为8〜40的整数， n2为1或2的整数。该组合物的粘度为10000〜20000，分子量为15000〜50000。

26. 发明公开

KR1020030043190A 레지스트 제거용 신너 조성물 失效
标题翻译：用于去除电阻的薄膜组合物
公开(公告)号：KR1020030043190A
公开(公告)日：2003-06-02
申请号：KR1020010074243
申请日：2001-11-27
申请人： 주식회사 동진쎄미켐
发明人： 김길래 , 박춘호 , 김경아
IPC分类号： G03F7/32
CPC分类号： G03F7/322 , C11D3/044 , G03F7/063 , G03F7/30 , G03F7/34 , G03F7/425
摘要： PURPOSE: A thinner composition for removing resist is provided, which is used to remove the edge part of resist film coated on a substrate or an unnecessary film component formed on the back face of a substrate in manufacturing process of a TFT-LCD device or a semiconductor device. CONSTITUTION: The thinner composition comprises 0.1-10 wt% of an inorganic and/or organic alkali; 0.1-30 wt% of an organic solvent; 0.01-10 wt% of a nonionic surfactant; 50-99 wt% of water; and optionally 0.01-5 wt% of an anionic surfactant and/or 0.01-1.0 wt% of an antifoaming agent. Preferably the organic solvent is an organic amine-based solvent, an alcohol ether-based organic solvent, a nitrogen-containing organic solvent or a sulfur-containing organic solvent; the nonionic surfactant is selected from the group consisting of polyoxy ethyl ether, polyoxy propyl ether, polyoxy ethyl propyl ether, polyoxy ethyl alkyl phenyl ether, polyoxy propyl alkyl phenyl ether, polyoxy ethyl oxypropyl alkyl phenyl ether and their mixtures; and the anionic surfactant is selected from the group consisting of alkyl ether sulfate, alkyl sulfate, alkyl benzenesulfonic acid, alkyl benzenesulfonate, alkyl naphthalene sulfonate and their mixtures.
摘要翻译：目的：提供用于去除抗蚀剂的较薄组合物，其用于在TFT-LCD装置的制造过程中除去涂覆在基板上的抗蚀剂膜的边缘部分或形成在基板背面上的不需要的膜部件半导体器件。构成：较薄的组成包含0.1-10重量％的无机和/或有机碱; 0.1-30重量％的有机溶剂; 0.01-10重量％的非离子表面活性剂; 50-99重量％的水; 和0.01-5重量％的阴离子表面活性剂和/或0.01-1.0重量％的消泡剂。优选有机溶剂是有机胺类溶剂，醇醚类有机溶剂，含氮有机溶剂或含硫有机溶剂; 非离子表面活性剂选自聚氧乙基醚，聚氧丙基醚，聚氧乙基丙基醚，聚氧乙基烷基苯基醚，聚氧丙基烷基苯基醚，聚氧乙基氧丙基烷基苯基醚及其混合物; 阴离子表面活性剂选自烷基醚硫酸盐，烷基硫酸盐，烷基苯磺酸，烷基苯磺酸盐，烷基萘磺酸盐及其混合物。

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